USD1053230SActiveUtility

Sputter target for a physical vapor deposition chamber

88
Assignee: APPLIED MATERIALS INCPriority: May 19, 2022Filed: May 19, 2022Granted: Dec 3, 2024
Est. expiryMay 19, 2042(~15.8 yrs left)· nominal 20-yr term from priority
Inventors:Siew Kit HoiJay Min SohMengxue WuPalaniappan Chidambaram
88
PatentIndex Score
17
Cited by
152
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for a sputter target for a physical vapor deposition chamber, as shown and described.

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