USD352910SExpiredUtility

Processing machine for electron beam lithography system

Assignee: HITACHI LTDPriority: Nov 27, 1992Filed: Feb 8, 1993Granted: Nov 29, 1994
Est. expiryNov 27, 2012(expired)· nominal 20-yr term from priority
52
PatentIndex Score
7
Cited by
0
References
1
Claims

Claims

exact text as granted — not AI-modified
The ornamental design for a processing machine for electron beam lithography system, as shown.

Join the waitlist — get patent alerts

Track USD352910S — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.