USD495150SExpiredUtility

Apertured continuous filament fabric

Assignee: POLYMER GROUP INCPriority: Nov 24, 2003Filed: Nov 24, 2003Granted: Aug 31, 2004
Est. expiryNov 24, 2023(expired)· nominal 20-yr term from priority
79
PatentIndex Score
24
Cited by
12
References
1
Claims

Claims

exact text as granted — not AI-modified
The ornamental design for an apertured continuous filament fabric, substantially as shown and described.

Join the waitlist — get patent alerts

Track USD495150S — get alerts on status changes and closely related new filings.

We store only your email — no account needed. See our privacy policy.