USD700333SActiveUtility
Intraspinous process spacer implant
Est. expiryJan 31, 2033(~6.5 yrs left)· nominal 20-yr term from priority
Inventors:Richard G. Fessler
32
PatentIndex Score
1
Cited by
7
References
1
Claims
Claims
exact text as granted — not AI-modifiedCLAIM
The ornamental design for an intraspinous process spacer implant, as shown and described.Join the waitlist — get patent alerts
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