USD703160SActiveUtility
Grounded electrode for a plasma processing apparatus
Est. expiryJan 27, 2031(~4.5 yrs left)· nominal 20-yr term from priority
Inventors:Hidenobu Tanimura
76
PatentIndex Score
29
Cited by
13
References
1
Claims
Claims
exact text as granted — not AI-modifiedCLAIM
I claim the ornamental design for a grounded electrode for a plasma processing apparatus, as shown.Join the waitlist — get patent alerts
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