USD703160SActiveUtility

Grounded electrode for a plasma processing apparatus

Assignee: TANIMURA HIDENOBUPriority: Jan 27, 2011Filed: Jul 14, 2011Granted: Apr 22, 2014
Est. expiryJan 27, 2031(~4.5 yrs left)· nominal 20-yr term from priority
76
PatentIndex Score
29
Cited by
13
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       I claim the ornamental design for a grounded electrode for a plasma processing apparatus, as shown.

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