USD783351SActiveUtility

Gas nozzle substrate processing apparatus

Assignee: HITACHI INT ELECTRIC INCPriority: May 28, 2015Filed: Nov 9, 2015Granted: Apr 11, 2017

Est. expiryMay 28, 2035(~8.9 yrs left)· nominal 20-yr term from priority

PatentIndex Score

473

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References

Claims

exact text as granted — not AI-modified

CLAIM 
     
       We claim the ornamental design for a gas nozzle substrate processing apparatus, as shown and described.

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