USD796458SActiveUtility

Gas flow control plate for semiconductor manufacturing apparatus

98
Assignee: ASM IP HOLDING BVPriority: Jan 8, 2016Filed: Mar 22, 2016Granted: Sep 5, 2017
Est. expiryJan 8, 2036(~9.5 yrs left)· nominal 20-yr term from priority
Inventors:Hyun Soo JangJeong Ho LeeYoung-Hoon KimYoung Hyo Jeon
98
PatentIndex Score
504
Cited by
13
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for a gas flow control plate for a semiconductor manufacturing apparatus, as shown and described.

Cited by (0)

No later patents cite this yet.

References (0)

No backward citations on record.