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Exhaust flow control ring for semiconductor deposition apparatus

95
Assignee: ASM IP HOLDING BVPriority: Apr 3, 2017Filed: May 15, 2017Granted: Feb 25, 2020
Est. expiryApr 3, 2037(~10.7 yrs left)· nominal 20-yr term from priority
Inventors:Julll LeeSung Hoon JunDong Rak JungSeung Wook Kim
95
PatentIndex Score
393
Cited by
875
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for an exhaust flow control ring for semiconductor deposition apparatus, as shown and described.

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