USD915082SActiveUtility

M.O.L.L.E. system material with cut pattern

41
Assignee: POINT BLANK ENTPR INCPriority: Jun 29, 2018Filed: Jun 29, 2018Granted: Apr 6, 2021
Est. expiryJun 29, 2038(~12 yrs left)· nominal 20-yr term from priority
Inventors:Randall Jered Lemarbe
41
PatentIndex Score
3
Cited by
50
References
1
Claims

Claims

exact text as granted — not AI-modified
CLAIM 
     
       The ornamental design for a M.O.L.L.E. system material with cut pattern, as shown and described.

Cited by (0)

No later patents cite this yet.

References (0)

No backward citations on record.