Oxide substrate with a strongly adherent gold film of 10 to 40 nm in thickness on the substrate

Abstract

An adherent gold film is deposited onto an oxide substrate by cleaning thexide surface so as to remove all contaminants and then vacuum depositing onto the clean oxide surface a gold film of up to 40 nm in thickness.

What is claimed is: 
     
       1. An oxide substrate with a strongly adherent gold film of 10 to 40 nm in thickness on the substrate. 
     
     
       2. An oxide substrate according to claim 1 wherein the oxide substrate is selected from the group consisting of a quartz substrate, a silicon wafer, a glass substrate and aluminum oxide. 
     
     
       3. An oxide substrate according to claim 2 wherein the oxide substrate is quartz. 
     
     
       4. An oxide substrate according to claim 2 wherein the oxide substrate is a silicon wafer. 
     
     
       5. An oxide substrate according to claim 2 wherein the oxide substrate is a glass substrate. 
     
     
       6. An oxide substrate according to claim 2 wherein the oxide substrate is aluminum oxide.