Method and system for high speed photolithography

Abstract

A method and system for modification of a pattern on a semiconductor subste, comprising the application of an electrical current through a liquid medium having a series of individual pixels controlled by a computer, thereby causing the clear liquid to change to opaque in selected areas.

Having described our invention, we claim: 
     
       1. A system for the production of an intergrated circuit comprising: a computer,   a programmable mask,   a computer controller designed to feed a mask design into the programmable mask,   a work piece aligned with the programmable mask, and   means for exposing the work piece through the programmable mask.   
     
     
       2. A system in accordance with claim 1, wherein the programmable mask comprises a top and bottom component composed of a clear plastic,   a clear liquid encompassed within the programmable mask at the midsection thereof,   a series of pixels positioned in the interior of the bottom component of the programmable mask so as to react with the liquid on command from the computer.   
     
     
       3. A method for the production of intergrated circuits for the production of intergrated circuits comprising the steps of: entering a mask design into a computer controller,   feeding mask from the computer controller into a programmable mask,   aligning the programmable mask with a work piece, and   exposing the work piece through the programmable mask.