Aqueous developer solution having hydroxy-alkyl piperidine for positive-working photoresists

Abstract

An aqueous developer solution contains, as a water-soluble basic compound, a compound of the general formula (I) <IMAGE> (I) where R1 to R5 are identical or different and are each H, OH, hydroxyalkyl, alkoxy or alkyl. It is suitable for developing positive-working photoresists.

We claim: 
     
       1. A method for developing a positive-working photoresist based on novolak/o-quinonediazide, the resist being applied to a substrate, exposed imagewise and brought into contact with developer solution to form the positive resist image, wherein the developer solution used is an aqueous developer solution, which contains one or more water-soluble basic compounds, wherein the said compound is a compound of the formula (I) ##STR5## where R 1  to R 5  are identical or different and are each H, OH, hydroxyalkyl of 1 to 4 carbon atoms, alkoxy of 1 to 4 carbon atoms or alkyl of 1 to 4 carbon atoms and x is from 1 to 5. 
     
     
       2. A method .Iadd.according to claim 1 .Iaddend.for developing a positive-working photoresist based on novolak/o-quinonediazide, the resist being applied to a substrate, exposed imagewise and brought into contact with developer solution to form the positive resist image, wherein the developer solution used is an aqueous developer solution . .as set forth in claim 1.!. .Iadd.wherein a hydroxyalkylpiperidine selected from the group consisting of N-hydroxymethylpiperidine, N-hydroxyethylpiperidine and N-hydroxypropylpiperidine is used as the compound of the formula (I).Iaddend.. 
     
     
       3. A method .Iadd.according to claim 1 .Iaddend.for developing a positive-working photoresist based on novolak/o-quinonediazide, the resist being applied to a substrate, exposed imagewise and brought into contact with developer solution to form the positive resist image, wherein the developer solution used . .is an aqueous developer solution as set forth in claim 1.!. .Iadd.contains from 5 to 50% by weight, based on the total amount of the developer solution, of hydroxyethylpiperidine which is a compound of formula I.Iaddend.. 
     
     
       4. A method for developing a positive-working photoresist based on poly-(p-hydroxystyrene)/sulfonium salt, the resist being applied to a substrate, exposed imagewise and brought into contact with developer solution to form the positive resist image, wherein the developer solution used is an aqueous developer solution set forth in claim 1. 
     
     
       5. A method for developing a positive-working photoresist based on poly-(p-hydroxystyrene)/sulfonium salt, the resist being applied to a substrate, exposed imagewise and brought into contact with developer solution to form the positive resist image, wherein the developer solution used is an aqueous developer solution .Iadd.in which N-hydroxyethylpiperidine is used as the compound of the formula (I) .Iaddend.as set forth in claim 1.