Exposure apparatus having catadioptric projection optical system

Abstract

To use a beam splitting optical system smaller than the conventional beam splitters and to set a longer optical path between a concave, reflective mirror and an image plane. A light beam from an object surface travels through a first converging group to enter a beam splitter, and a light beam reflected by the beam splitter is reflected by a concave, reflective mirror to form an image of patterns on the object surface inside the concave, reflective mirror. A light beam from the image of the patterns passes through the beam splitter and thereafter forms an image of the patterns through a third converging group on an image plane.

What is claimed is:  
     
       1. A catadioptric optical system, for forming an image of a first object onto a second object, comprising: 
       a first image-forming optical system having a first group with positive refractive power and a second group including a concave mirror;  
       a second image-forming optical system, arranged on an optical path between a mirror and the second object, having at least a refractive lens element, wherein said second image-forming optical system is a dioptric optical system; and  
       the mirror arranged in one of spaces respectively by a virtual plane, said virtual plane including one of an optical axis of said first image-forming optical system and an optical axis of said second image-forming optical system, said spaces positioned between said first group and said second group.  
     
     
       2. A system according to  claim 1 , wherein an intermediate image of the first object is formed on an optical path between said first-image forming optical system and said second-image forming optical system. 
     
     
       3. A system according to  claim 2 , wherein the intermediate image is formed in the space in which said partial mirror is arranged. 
     
     
       4. A system according to  claim 1 , wherein the light from said first group reaches said second group without passing through said partial mirror. 
     
     
       5. A system according to  claim 4 , wherein an intermediate image of the first object is formed in the space in which said partial mirror is arranged an on an optical path between said first-image forming optical system and said second-image forming optical system. 
     
     
       6. A system according to  claim 1 , wherein said partial mirror is arranged so as to be oblique to the optical axis of said first image-forming optical system. 
     
     
       7. An exposure apparatus comprising: 
       an illuminating optical system having a light source;  
       a catadioptric optical system according to  claim 1 ; and  
       a stage, arranged on an optical path between said illuminating optical system and said catadioptric optical system, for supporting a mask as a first object;  
     
     
       8. An apparatus according to  claim 7 , wherein said illuminating optical system forms illumination area spreaded unidirectionally, onto the mask. 
     
     
       9. A fabricating method comprising: 
       preparing a mask with a predetermined pattern;  
       illuminating the mask with exposure light having a predetermined wavelength; and  
       projecting a secondary image of said pattern onto a photosensitive substrate through a catadioptric optical system according to  claim 1 .  
     
     
       10. A catadioptric optical system, for forming an image of a first object onto a second object, comprising: 
       a first image-forming optical system having a first group including at least a lens element and a second group including a concave mirror;  
       a second image-forming optical system, arranged on an optical path between a mirror and the second object, having at least a refractive lens element;  
       said mirror arranged in one side of multiple spaces separated by a virtual plane, said virtual plane including one of an optical axis of said first image-forming optical system and an optical axis of said second image-forming optical system, and arranged between said lens element of the first group and said second group; and  
       wherein an intermediate image of the first object is formed in the space in which said mirror is arranged and on an optical path between said first image-forming optical system and said second image-forming optical system,  
       and wherein said second image-forming optical system is a dioptric optical system.  
     
     
       11. A system according to  claim 10 , wherein the light from said first group reaches said second group without passing through said partial mirror. 
     
     
       12. A system according to  claim 10 , wherein said partial mirror is arranged so as to be oblique to the optical axis of said first image-forming optical system. 
     
     
       13. A system according to  claim 10 , wherein said first group of said first image-forming optical system has refractive power. 
     
     
       14. A system according to  claim 10 , wherein the following conditions are satisfied: 
       
         
           0.1≦|β 12 |≦0.5,  
         
       
       
         
           0.25≦|β 3 |≦2,  
         
       
       and 
       
         
           0.1≦|β|≦0.5 0.1≦|β|≦0.5  
         
       
       wherein β 12  is a magnification of from the first object to the intermediate image, β 3  is a magnification of from the intermediate image to the image on the second object, and β is a magnification of from the first object to the second object. 
     
     
       15. An exposure apparatus comprising: 
       an illuminating optical system having a light source;  
       a catadioptric optical system according to  claim 10 ; and  
       a stage, arranged on an optical path between said illuminating optical system and said catadioptric optical system, for supporting a mask as the first object.  
     
     
       16. An apparatus according to  claim 15 , wherein said illuminating optical system forms illumination area spreaded unidirectionally, onto the mask. 
     
     
       17. A fabricating method comprising: 
       preparing a mask with a predetermined pattern;  
       illuminating the mask with exposure light having a predetermined wavelength; and  
       projecting a secondary image of the pattern onto a photosensitive substrate through a catadioptric optical system according to  claim 10 .  
     
     
       18. A catadioptric optical system for forming a reduced image of a first object onto a second object, comprising: 
       a catadioptric optical sub-system having a first reduction magnification;  
       a dioptric optical sub-system, arranged in an optical path between said catadioptric optical sub-system and said second object, having a second reduction magnification;  
       wherein an intermediate image of said first object is formed on an optical path between said catadioptric optical sub-system and said dioptric optical sub-system; and  
       wherein said dioptric optical sub-system forms an image of said intermediate image on the second object.  
     
     
       19. A catadioptric optical system according to  claim 18 , wherein said dioptric optical sub-system includes an aperture stop. 
     
     
       20. A catadioptric optical system according to  claim 19 , wherein said aperture stop is capable of controlling a coherence factor. 
     
     
       21. A catadioptric optical system according to  claim 18 , wherein said catadioptric optical sub-system includes a concave mirror, and wherein a principal ray crosses an optical axis of the catadioptric optical sub-system at a position between said concave mirror and the first object. 
     
     
       22. A catadioptric optical system according to  claim 18 , wherein said catadioptric optical sub-system and said dioptric optical sub-system are constructed independently of each other. 
     
     
       23. A catadioptric optical system according to  claim 22 , wherein an optical axis of said catadioptric optical sub-system and an optical axis of said dioptric optical sub-system cross vertically. 
     
     
       24. A catadioptric optical system according to  claim 18 , further comprising a reflective mirror at an optical path between said catadioptric optical sub-system and said dioptric optical sub-system. 
     
     
       25. An exposure method comprising: 
       preparing a mask with a predetermined pattern at a first surface;  
       illuminating the mask with exposure light having a predetermined wavelength; and  
       projecting a secondary image of the pattern of the mask onto a photosensitive substrate, arranged at a second surface, through the catadioptric optical system of  claim 18 .  
     
     
       26. An exposure method according to  claim 25 , further comprising the step wherein said mask and said photosensitive substrate move in synchronization. 
     
     
       27. An exposure method according to  claim 26 , wherein a best image region of the catadioptric optical system is a slit eccentric from an optical axis of the catadioptric optical system. 
     
     
       28. An exposure apparatus, comprising: 
       an illumination optical system having a light source;  
       a first stage, capable of holding a mask, adjacent said illumination optical system;  
       a catadioptric optical system of  claim 18  arranged adjacent said first stage; and  
       a second stage, arranged adjacent said catadioptric optical system opposite said first stage, and capable of holding a photosensitive substrate.  
     
     
       29. A catadioptric optical system for forming a reduced image of a first object onto a second object, comprising: 
       a catadioptric optical sub-system having a first reduction magnification;  
       a dioptric optical sub-system, arranged in an optical path between said catadioptric optical sub-system and said second object, having an aperture stop and a second reduction magnification;  
       wherein an intermediate image of said first object is formed on an optical path between said catadioptric optical sub-system and said dioptric optical sub-system;  
       wherein a secondary image of said first object is formed on the second object; and  
       wherein said aperture stop is capable of controlling a coherence factor.  
     
     
       30. An exposure method comprising: 
       preparing a mask with a predetermined pattern at a first surface;  
       illuminating the mask with exposure light having a predetermined wavelength;  
       projecting a secondary image of the pattern of the mask onto a photosensitive substrate, arranged at a second surface, through the catadioptric optical system of  claim 29 .  
     
     
       31. An exposure apparatus, for exposing a pattern of a mask onto a photosensitive substrate, comprising: 
       an illumination optical system having a light source;  
       a first stage, capable of holding the mask, adjacent said illumination optical system;  
       a catadioptric optical system of  claim 29  arranged adjacent said first stage; and  
       a second stage, arranged adjacent said catadioptric optical system opposite the first stage, and capable of holding the photosensitive substrate.  
     
     
       32. A catadioptric imaging optical system used in a projection optical system that transfers a pattern on a mask onto a substrate, comprising: 
         from the mask to an intermediate image, a catadioptric imaging optical sub - system arranged in an optical path between the mask and the substrate;    
         from the intermediate image to a second image, a dioptric imaging optical sub - system arranged in an optical path between the catadioptric imaging optical sub - system and the substrate, the dioptric imaging optical sub - system comprising a dioptric axis along a straight line and a plurality of lenses; and    
       
         an aperture stop arranged in the optical path between the mask and the substrate to control a coherence factor of the catadioptric imaging optical system.  
       
     
     
       33. A catadioptric imaging optical system according to  claim 32 , wherein said catadioptric imaging optical sub- system comprises an optical group including    
       
         a concave mirror, and  
       
       
         a group optical axis,  
       
       
         wherein the group optical axis intersects the dioptric optical axis.  
       
     
     
       34. A catadioptric imaging optical system according to  claim 33 , further comprising an optical path deflecting member arranged between said catadioptric imaging optical sub- system and said dioptric imaging optical sub - system.    
     
     
       35. A catadioptric imaging optical system according to  claim 34 , wherein said optical path deflecting member comprises a reflection surface inclined with respect to the dioptric optical axis.  
     
     
       36. A catadioptric imaging optical system according to  claim 32 , wherein said catadioptric imaging optical sub- system is closer to the mask than said dioptric imaging optical sub - system and is on the optical path between the mask and the substrate.    
     
     
       37. A catadioptric imaging optical system according to  claim 32 , wherein said catadioptric imaging optical sub- system comprises a catadioptric optical axis along a straight line, and the catadioptric optical axis and the dioptric optical axis intersect.    
     
     
       38. A catadioptric imaging optical system according to  claim 37 , wherein said catadioptric imaging optical sub- system is closer to the mask than said dioptric imaging optical sub - system and is on the optical path between the mask and the substrate.    
     
     
       39. A catadioptric imaging optical system used in a projection optical system that transfers a pattern on a mask onto a substrate, comprising: 
         from the mask to an intermediate image, a catadioptric imaging optical sub - system arranged in an optical path between the mask and the substrate; and    
         from the intermediate image to a second image, a dioptric imaging optical sub - system arranged between the catadioptric imaging optical sub - system and the substrate, the dioptric imaging optical sub - system comprising a dioptric optical axis along a straight line,    
         wherein the dioptric imaging optical sub - system further comprises an aperture stop, wherein the aperture stop controls a coherence factor of the dioptric imaging optical sub - system.    
     
     
       40. A catadioptric imaging optical system according to  claim 32 , wherein the catadioptric imaging optical system forms an image in an area of the substrate that is off the dioptric optical axis.  
     
     
       41. A projection exposure apparatus that transfers a pattern off a mask onto a substrate, comprising: 
       
         a catadioptric imaging optical system according to  
         claim 32 
         ,  
       
         wherein said catadioptric imaging optical system forms an exposure area at a position off of the dioptric optical axis of the dioptric imaging object sub - system.    
     
     
       42. A projection exposure apparatus according to  claim 41 , wherein the mask and the substrate are scanned at different speeds corresponding to a magnification of said catadioptric imaging optical system.  
     
     
       43. A method of imaging a pattern on a mask onto a substrate using a catadioptric imaging optical system, the method comprising: 
         guiding a light from the mask to a catadioptric imaging optical sub - system to form an intermediate image;    
         guiding the light from the intermediate image after the catadioptric imaging optical sub - system to a dioptric imaging optical sub - system that comprises a dioptric optical axis along a straight line and a plurality of lenses;    
         forming a final image of the mask on the substrate using the light from the dioptric imaging optical sub - system, the dioptric imaging optical sub - system being from the intermediate image to the final image; and    
       
         controlling a coherence factor of the catadioptric imaging optical system.  
       
     
     
       44. A method according to  claim 43 , wherein the catadioptric imaging optical sub- system is closer to the mask than the dioptric imaging optical sub - system and is on an optical path between the mask and the substrate.    
     
     
       45. A method according to  claim 43 , wherein the catadioptric imaging optical sub- system comprises a catadioptric optical axis along a straight line, and the dioptric optical axis and the catadioptric optical axis intersect.    
     
     
       46. A method according to  claim 45 , wherein the catadioptric imaging optical sub- system is closer to the mask than the dioptric imaging optical sub - system and is on an optical path between the mask and the substrate.    
     
     
       47. A method according to  claim 45 , wherein said guiding the light from the catadioptric imaging optical sub- system to the dioptric imaging optical sub - system further comprises reflecting the light using a concave mirror of the catadioptric imaging optical sub - system, wherein an optical group including the concave mirror has a group optical axis that intersects the dioptric optical axis.    
     
     
       48. A method according to  claim 43 , wherein said forming the final image comprises forming the first image in an area on the substrate off the dioptric optical axis.  
     
     
       49. A projection optical system for forming an image of a first object onto a second object, comprising: 
         a catadioptric sub - system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and    
         a dioptric imaging sub - system arranged in an optical path between the catadioptric sub - system and the second object,    
       
         wherein:  
       
         an intermediate image of the first object is formed in the optical path between the catadioptric sub - system and the dioptric imaging sub - system,    
         the lenses in the catadioptric sub - system include at least one lens arranged in an optical path between the optical path changing mirror and the concave mirror,    
         for each of the lenses in the catadioptric sub - system including the at least one lens disposed between the optical path changing mirror and the concave mirror, a distance from each lens to the optical path changing mirror is greater than a corresponding distance from each lens to the concave mirror, and    
         the dioptric imaging sub - system forms a second image and is from the intermediate image to the second image.    
     
     
       50. A projection optical system for forming an image of a first object onto a second object, comprising: 
         a catadioptric sub - system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and    
         a dioptric imaging sub - system arranged in an optical path between the catadioptric sub - system and the second object,    
       
         wherein:  
       
         an intermediate image of the first object is formed in the optical path between the catadioptric sub - system and the dioptric imaging sub - system,    
         the catadioptric sub - system has at least one positive lens disposed in an optical path between the first object and the optical path changing mirror,    
       
         not more than one positive and not more than three negative lenses are arranged between the optical path changing mirror and the concave mirror,  
       
         the dioptric imaging sub - system forms a second image and is from the intermediate image to the second image, and    
       
         the projection optical system is both side telecentric.  
       
     
     
       51. A projection optical system for forming an image of a first object onto a second object, comprising: 
         a catadioptric sub - system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and    
         a dioptric imaging sub - system arranged in an optical path between the catadioptric sub - system and the second object,    
       
         wherein:  
       
         an intermediate image of the first object is formed in the optical path between the catadioptric sub - system and the dioptric imaging sub - system,    
         the dioptric imaging sub - system, in the order from the intermediate side, has a positive lens group, a negative lens group, a positive lens group, a negative lens group, and a positive lens group,    
         the dioptric imaging sub - system forms a second image and is from the intermediate image to the second image, and    
       
         the projection optical system is both side telecentric.  
       
     
     
       52. A projection optical system for forming an image of a first object onto a second object, comprising: 
         a catadioptric sub - system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and    
         a dioptric imaging sub - system arranged in an optical path between the catadioptric sub - system and the second object,    
       
         wherein:  
       
         an intermediate image of the first object is formed in the optical path between the catadioptric sub - system and the dioptric imaging sub - system,    
         the dioptric imaging sub - system has at least one negative - positive doublet with a negative power lens and a positive power lens in the sequence from the first object side,    
         the dioptric imaging sub - system forms a second image and is from the intermediate image to the second image, and    
       
         the projection optical system is both side telecentric.  
       
     
     
       53. A projection optical system for forming an image of a first object onto a second object, comprising: 
         a catadioptric sub - system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and    
         a dioptric imaging sub - system arranged in an optical path between the catadioptric sub - system and the second object,    
       
         wherein:  
       
         an intermediate image of the first object is formed in the optical path between the catadioptric sub - system and the dioptric imaging sub - system,    
         the dioptric imaging sub - system has a first group of lenses, a second group of lenses, and a third group of lenses,    
         the dioptric imaging sub - system forms a second image and is from the intermediate image to the second image, and    
       
         the projection optical system is both side telecentric.  
       
     
     
       54. A projection optical system for forming an image of a first object onto a second object, comprising: 
         a catadioptric sub - system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and    
         a dioptric sub - system arranged in an optical path between said catadioptric sub - system and the second object,    
       
         wherein:  
       
       
         an intermediate image of the first object is formed in the optical path,  
       
         lenses in said catadioptric sub - system including at least one lens arranged between the optical path changing mirror and the concave mirror,    
         a distance from each lens of the lenses in said catadioptric sub - system including said at least one lens to the optical path changing mirror is greater than a corresponding distance from each lens to the concave mirror, and    
         said dioptric sub - system comprises a pair of meniscus lenses including an intermediate - side meniscus lens and an image - side meniscus lens, wherein    
         a convex surface of the intermediate - side meniscus lens faces the intermediate image, and    
         a convex surface of the image - side meniscus lens faces the image.    
     
     
       55. A projection optical system for forming an image of a first object onto a second object, comprising: 
         a catadioptric sub - system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and    
         a dioptric imaging sub - system arranged in an optical path between the catadioptric sub - system and the second object,    
       
         wherein:  
       
         an intermediate image of the first object is formed in the optical path between the catadioptric sub - system and the dioptric imaging sub - system,    
         the catadioptric sub - system has at least one positive lens disposed between the first object and the optical path changing mirror,    
       
         not more than one positive lens and not more than three negative lenses are arranged between the optical path changing mirror and the concave mirror,  
       
       
         the system is both sides telecentric,  
       
         the dioptric imaging sub - system forms a second image and is from the intermediate image to the second image, and    
         the dioptric imaging sub - system comprises a pair of meniscus lenses including an intermediate - side meniscus lens and an image - side meniscus lens, wherein    
         a convex surface of the intermediate - side meniscus lens faces the intermediate image, and    
         a convex surface of the image - side meniscus lens faces the second image.    
     
     
       56. A projection optical system for forming an image of a first object onto a second object, comprising: 
         a catadioptric sub - system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and    
         a dioptric imaging sub - system arranged in an optical path between the catadioptric sub - system and the second object,    
       
         wherein:  
       
         an intermediate image of the first object is formed in the optical path between the catadioptric sub - system and the dioptric imaging sub - system,    
         the dioptric imaging sub - system, in the order from the intermediate side, has a positive lens group, a negative lens group, a positive lens group, a negative lens group, and a positive lens group,    
         the dioptric imaging sub - system forms a second image and is from the intermediate image to the second image, and    
         the dioptric imaging sub - system comprises a pair of meniscus lenses including an intermediate - side meniscus lens and an image - side meniscus lens, wherein    
         a convex surface of the intermediate - side meniscus lens faces the intermediate image, and    
         a convex surface of the image - side meniscus lens faces the second image.    
     
     
       57. A projection optical system for forming an image of a first object onto a second object, comprising: 
         a catadioptric sub - system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and    
         a dioptric imaging sub - system arranged in an optical path between the catadioptric sub - system and the second object,    
       
         wherein:  
       
         an intermediate image of the first object is formed in the optical path between the catadioptric sub - system and the dioptric imaging sub - system,    
         the dioptric imaging sub - system has at least one negative - positive doublet with a negative power lens and a positive power lens in the sequence from the first object side,    
         the dioptric imaging sub - system forms a second image and is from the intermediate image to the second image, and    
         the dioptric sub - system comprises a pair of meniscus lenses including an intermediate - side meniscus lens and an image - side meniscus lens, wherein    
         a convex surface of the intermediate - side meniscus lens faces the intermediate image, and    
         a convex surface of the image - side meniscus lens faces the second image.    
     
     
       58. A projection optical system for forming an image of a first object onto a second object, comprising: 
         a catadioptric sub - system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and    
         a dioptric imaging sub - system arranged in an optical path between the catadioptric sub - system and the second object,    
       
         wherein:  
       
         an intermediate image of the first object is formed in the optical path between the catadioptric sub - system and the dioptric imaging sub - system,    
         the dioptric imaging sub - system has a first group of lenses, a second group of lenses, and a third group of lenses,    
         the dioptric imaging sub - system forms a second image and is from the intermediate image to the second image, and    
         the dioptric imaging sub - system comprises a pair of meniscus lenses including an intermediate - side meniscus lens and an image - side meniscus lens, wherein    
         a convex surface of the intermediate - side meniscus lens faces the intermediate image, and    
         a convex surface of the image - side meniscus lens faces the image.    
     
     
       59. A projection optical system according to  claim 54 , wherein said dioptric sub- system comprises first, second, and third groups of lenses, and wherein the pair of meniscus lenses are in the second group of lenses.    
     
     
       60. A projection optical system according to  claim 55 , wherein said dioptric sub- system comprises first, second, and third groups of lenses, and wherein the pair of meniscus lenses are in the second group of lenses.    
     
     
       61. A projection optical system according to  claim 56 , wherein the pair of meniscus lenses are in the second positive and negative lens groups.  
     
     
       62. A projection optical system according to  claim 57 , wherein said dioptric sub- system comprises first, second, and third groups of lenses, and wherein the pair of meniscus lenses are in the second group of lenses.    
     
     
       63. A projection optical system according to  claim 58 , wherein the pair of meniscus lenses is arranged in the second group of lenses.  
     
     
       64. A projection optical system according to  claim 52 , wherein said dioptric optical sub- system has a first group of lenses, a second group of lenses, and a third group of lenses, and wherein the negative - positive doublet lens is arranged in the third group of lenses.    
     
     
       65. A projection optical system according to  claim 53 , wherein said dioptric sub- system has at least one negative - positive doublet lens with a negative power lens and a positive power lens in the sequence from the first object side, and wherein the negative - positive doublet lens is arranged in the third group of lenses.    
     
     
       66. A projection optical system for forming an image of a first object onto a second object, comprising: 
         a catadioptric sub - system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and    
         a dioptric imaging sub - system arranged in an optical path between the catadioptric sub - system and the second object,    
       
         wherein:  
       
       
         an intermediate image of the first object is formed in the optical path,  
       
         the lenses in the catadioptric sub - system include at least one lens arranged between the optical path changing mirror and the concave mirror,    
         for each of the lenses in the catadioptric sub - system including the at least one lens disposed between the optical path changing mirror and the concave mirror, a distance from each lens to the optical path changing mirror is greater than a corresponding distance from each lens to the concave mirror, and    
         the catadioptric sub - system has no more than five lenses.    
     
     
       67. A projection optical system according to  claim 50 , wherein said catadioptric sub-system has no more than five lenses.  
     
     
       68. A projection optical system according to  claim 51 , wherein said catadioptric sub- system has no more than five lenses.    
     
     
       69. A projection optical system according to  claim 52 , wherein said catadioptric sub- system has no more than five lenses.    
     
     
       70. A projection optical system according to  claim 53 , wherein said catadioptric sub- system has no more than five lenses.    
     
     
       71. A projection optical system according to  claim 64 , wherein said catadioptric sub- system has no more than five lenses.    
     
     
       72. A projection optical system according to  claim 65 , wherein said catadioptric sub- system has no more than five lenses.    
     
     
       73. A projection optical system for forming an image of a first object onto a second object, comprising: 
         from the first object to an intermediate image, a catadioptric sub - system, arranged in an optical path between the first and the second object, having an optical path changing mirror, lenses, and a concave mirror; and    
         from the intermediate image to the second object, a dioptric imaging sub - system arranged in an optical path between said catadioptric sub - system and the second object,    
       
         wherein:  
       
       
         the intermediate image of the first object is formed in the optical path,  
       
         lenses in said catadioptric sub - system including at least one lens arranged between the optical path changing mirror and the concave mirror,    
         a distance from each lens of the lenses of said catadioptric sub - system including said at least one lens to the optical path changing mirror is greater than a corresponding distance from each lens to the concave mirror, and    
       
         the projection optical system is both side telecentric.  
       
     
     
       74. A projection optical system according to  claim 52 , wherein the negative- positive doublet lens is behind a last beam waist.    
     
     
       75. A projection exposure apparatus comprising: 
       
         a laser light source;  
       
       
         an illumination system;  
       
       
         a mask holding system;  
       
       
         a projection optical system according to  
         claim 49 
         ; and  
       
       
         a wafer holding system.  
       
     
     
       76. A projection exposure apparatus comprising: 
       
         a laser light source;  
       
       
         an illumination system;  
       
       
         a mask holding system;  
       
       
         a projection optical system according to  
         claim 50 
         ; and  
       
       
         a wafer holding system.  
       
     
     
       77. A projection exposure apparatus comprising: 
       
         a laser light source;  
       
       
         an illumination system;  
       
       
         a mask holding system;  
       
       
         a projection optical system according to  
         claim 51 
         ; and  
       
       
         a wafer holding system.  
       
     
     
       78. A projection exposure apparatus comprising: 
       
         a laser light source;  
       
       
         an illumination system;  
       
       
         a mask holding system;  
       
       
         a projection optical system according to  
         claim 52 
         ; and  
       
       
         a wafer holding system.  
       
     
     
       79. A projection exposure apparatus comprising: 
       
         a laser light source;  
       
       
         an illumination system;  
       
       
         a mask holding system;  
       
       
         a projection optical system according to  
         claim 53 
         ; and  
       
       
         a wafer holding system.  
       
     
     
       80. A method of producing a device by projection exposure making use of a projection exposure apparatus according to  claim 75 .  
     
     
       81. A method of producing a device by projection exposure making use of a projection exposure apparatus according to  claim 76 .  
     
     
       82. A method of producing a device by projection exposure making use of a projection exposure apparatus according to  claim 77 .  
     
     
       83. A method of producing a device by projection exposure making use of a projection exposure apparatus according to  claim 78 .  
     
     
       84. A method of producing a device by projection exposure making use of a projection exposure apparatus according to  claim 79 .  
     
     
       85. A method according to  claim 80 , wherein the projection exposure apparatus is a step- and - repeat type, or a step - and - scanning type.    
     
     
       86. A method according to  claim 81 , wherein the projection exposure apparatus is a step- and - repeat type, or a step - and - scanning type.    
     
     
       87. A method according to  claim 82 , wherein the projection exposure apparatus is a step- and - repeat type, or a step - and - scanning type.    
     
     
       88. A method according to  claim 83 , wherein the projection exposure apparatus is a step- and - repeat type, or a step - and - scanning type.    
     
     
       89. A method according to  claim 84 , wherein the projection exposure apparatus is a step- and - repeat type, or a step - and - scanning type.    
     
     
       90. The catadioptric imaging optical system of  claim 32 , wherein said catadioptric imaging optical sub- system further comprises    
       
         a first group with positive refractive power,  
       
       
         a second group including a concave mirror, and  
       
       
         a mirror between the first and second group.  
       
     
     
       91. The method of  claim 43 , wherein the catadioptric imaging optical sub- system further comprises    
       
         a first group with positive refractive power,  
       
       
         a second group including a concave mirror, and  
       
       
         a mirror between the first and second groups.  
       
     
     
       92. The projection optical system of  claim 49 , wherein the lenses of said catadioptric sub- system comprises a first group with positive refractive power and a second group with the concave mirror, and an optical path changing mirror between the first group and the second group.    
     
     
       93. The projection optical system of  claim 50 , wherein the lenses of said catadioptric sub- system comprises a first group with positive refractive power and a second group with the concave mirror.    
     
     
       94. The projection optical system of  claim 51 , wherein the lenses of said catadioptric sub- system comprises a first group with positive refractive power and a second group with the concave mirror.    
     
     
       95. The projection optical system of  claim 52 , wherein the lenses of said catadioptric sub- system comprises a first group with positive refractive power and a second group with the concave mirror.    
     
     
       96. The projection optical system of  claim 53 , wherein the lenses of said catadioptric sub- system comprises a first group with positive refractive power and a second group with the concave mirror.