Reduced striae extreme ultra violet elements

Abstract

Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.

1. An extreme ultraviolet lithographic element comprising:
 a titania-containing silica having a titania content in the range of 5-10 wt. %, a polished and shaped surface, and an rms striae level less than 0.05 mega Pascals.  
 
     
     
       2. The lithography element of  claim 1 , wherein the element has a peak to valley striae level less than 0.2 mega Pascals. 
     
     
       3. The lithography element of  claim 2 , wherein the glass has a coefficient of thermal expansion in the range of +30 ppb/° C. to −30 ppb/° C. between 20° C. and 35° C. 
     
     
       4. The lithography element of  claim 2 , wherein the glass contains between 6 weight % titania and 8 weight % titania and has a homogeneous CTE in the range of +20 ppb/° C. to −20 ppb/° C. between about 20° C. and 35° C. 
     
     
       5. A glass bottle suitable for making extreme ultraviolet optical elements, said boule comprising a titania-silica glass having a titania content in the range of 5-10 wt. striae, a rms striae level less than 0.05 mega Pascals. 
     
     
       6. A glass boule according to  claim 5 , wherein said boule has a peak to valley striae level of less than 0.2 mega Pascals. 
     
     
       7. The boule according to  claim 5 , wherein said boule has a rms striae level of less than 0.04 mega Pascals. 
     
     
       8. The glass boule according to  claim 5 , wherein the titania content is in the range of 6 to 8 wt %. 
     
     
       9. The glass boule according to  claim 5 , wherein the titania content is in the range of 6 to 8 wt %. 
     
     
       10. The glass boule according to  claim 5 , wherein the glass has a coefficient of thermal expansion in the range of +30 ppb/° C. to −30 ppb/° C. between 20° C. and 35° C. 
     
     
       11. The glass boule according to  claim 5 , wherein the glass has a homogeneous CTE in the range of +20 ppb/° C. to −20 ppb/° C. between about 20° C. and 35° C. 
     
     
       12. An extreme ultraviolet lithographic element comprising:
   a titania - containing silica glass having a titania content in the range of  5   -   10  wt.  % , a polished and shaped surface, and a peak to valley striae level less than  0 . 2  mega Pascals.     
     
     
       13. The lithography element of  claim 12 , wherein the glass has a coefficient of thermal expansion in the range of + 30  ppb/° C. to − 30  ppb/° C. between  20 ° C. and  35 ° C. 
     
     
       14. The lithography element of  claim 12 , wherein the glass contains between  6  weight %  titania and  8  weight  %  titania and has a homogenous CTE in the range of + 20  ppb/° C. to − 20  ppb/° C. between about  20 ° C. and  35 ° C.   
     
     
       15. A glass boule suitable for making extreme ultraviolet optical elements, said boule comprising a titania- silica glass having a titania content in the range of  5   -   10  wt.  % and a peak to valley striae level of less than 0.2 mega Pascals. 
     
     
       16. The boule according to  claim 15 , wherein said boule has a rms striae level of less than  0 . 04  mega Pascals. 
     
     
       17. The glass boule according to  claim 15 , wherein the titania content is in the range of  6  to  8  wt %. 
     
     
       18. The glass boule according to  claim 15 , wherein the glass has a coefficient of thermal expansion in the range of + 30  ppb/° C. to − 30  ppb/° C. between  20 ° C. and  35 ° C. 
     
     
       19. The glass boule according to  claim 15 , wherein the glass has a homogeneous CTE in the range of + 20  ppb/° C. to − 20  ppb/° C. between about  20 ° C. and  35 ° C.