Polythiophenes, block copolymers made therefrom, and methods of forming the same

Abstract

The present invention relates to polythiophenes, particularly regioregular head-to-tail poly(3-alkylthiophenes) (HT-PATs), block copolymers made therefrom, and their methods of formation. The present invention provides HT-PATs with well-defined, specific end-groups, functionalization of the defined HT-PATs, and incorporation of end group functionalized HT-PATs into block copolymers with structural polymers. The intrinsically conductive diblock and triblock copolymers, formed from the HT-PATs, have excellent conductivity and low polydispersities that are useful in a number of applications. The block copolymers of the present invention have been found to exhibit conductivities that range from a low of 10 −8 S/cm for certain applications to as high as several hundred S/cm or more.

1. A polythiophene polymer, the polymer having the structure: 
                 
 
       wherein R is a substituent selected from the group consisting of alkyl, polyether, and aryl, X is a halogen, and n is greater than 1,
 the polymer being formed from a polymerization reaction in major amounts of at least 90%  about  75 % by weight.  
 
     
     
       2. The polythiophene polymer of  claim 1 , wherein R is an alkyl group. 
     
     
       3. The polythiophene polymer of  claim 1 , wherein R is an alkyl group having from 1 to 15 carbon atoms. 
     
     
       4. The polythiophene polymer of  claim 1 , wherein R is an alkyl group having from 4 to 15 carbon atoms. 
     
     
       5. The polythiophene polymer of  claim 1 , wherein R is an alkyl group having from 4 to 12 carbon atoms. 
     
     
       6. The polythiophene polymer of  claim 1 , wherein R is an alkyl group selected from the group consisting of butyl, hexyl, octyl, and dodecyl. 
     
     
       7. The polythiophene polymer of  claim 1 , wherein X is a halogen selected from the group consisting of Cl, Br, and I. 
     
     
       8. The polythiophene polymer of  claim 1 , wherein X is Br. 
     
     
       9. The polythiophene polymer of  claim 1 , wherein the polymer is formed from the polymerization reaction in major amounts of at least 95% by weight. 
     
     
       10. A method of forming a polymer, comprising:
 combining a soluble thiophene monomer with an amide base and a divalent metal halide; and  
 adding an effective amount of a Ni(II) catalyst to initiate a polymerization reaction to form at least 90%  about  75 % by weight of the polymer having the structure 
                 
 
 wherein R is a substituent selected from the group consisting of alkyl, polyether, and aryl, X is a halogen, and n is greater than 1.  
 
     
     
       11. The method of  claim 10 , wherein the amide base is lithium diisopropylamide. 
     
     
       12. The method of  claim 11 , wherein the lithium diisopropylamide and divalent metal halide are added to the thiophene monomer at a temperature ranging from −78° C. to −60° C. 
     
     
       13. The method of  claim 10 , wherein the divalent metal halide is zinc chloride. 
     
     
       14. The method of  claim 10 , wherein the Ni(II) catalysts  catalyst  is selected from the group consisting of 1,3-diphenylphosphinopropane nickel(II) chloride and 1,2-bis(diphenylphosphino)ethane nickel(II)chloride. 
     
     
       15. The method of  claim 10 , wherein R is an alkyl group. 
     
     
       16. The method of  claim 10 , wherein R is an alkyl group having 1 to 15 carbon atoms. 
     
     
       17. The method of  claim 10 , wherein R is an alkyl group having 4 to 15 carbon atoms. 
     
     
       18. The method of  claim 10 , wherein R is an alkyl group having 4 to 12 carbon atoms. 
     
     
       19. The method of  claim 10 , wherein R is an alkyl group selected from the group consisting of butyl, hexyl, octyl, and dodecyl. 
     
     
       20. The method of  claim 10 , wherein X is a halogen selected from the group consisting of Cl, Br, and I. 
     
     
       21. The method of  claim 20 , wherein X is Br. 
     
     
       22. The method of  claim 10 , further comprising quenching the reaction to form the polymer. 
     
     
       23. The method of  claim 10 , wherein the polymer is formed from the polymerization reaction in major amounts of at least 95% by weight. 
     
     
       24. A method of forming a polymer, comprising:
 combining a soluble thiophene monomer with an amide base and zinc chloride at a temperature ranging from −78° C. to −60° C.; and  
 adding an effective amount of a Ni(II) catalyst to initiate a polymerization reaction.  
 
     
     
       25. The method of  claim 24 , wherein the polymer has the structure: 
                 
 
       wherein R is a substituent selected from the group consisting of alkyl, polyether, and aryl, X is a halogen, and n is greater than 1. 
     
     
       26. The method of  claim 25 , wherein the polymer is at least 90%  about  75 % by weight of a reaction product of the reaction. 
     
     
       27. The method of  claim 25 , wherein R is an alkyl group. 
     
     
       28. The method of  claim 25 , wherein R is an alkyl group having 1 to 15 carbon atoms. 
     
     
       29. The method of  claim 25 , wherein R is an alkyl group having 4 to 15 carbon atoms. 
     
     
       30. The method of  claim 25 , wherein R is an alkyl group having 4 to 12 carbon atoms. 
     
     
       31. The method of  claim 25 , wherein R is an alkyl group selected from the group consisting of butyl, hexyl, octyl, and dodecyl. 
     
     
       32. The method of  claim 25 , wherein X is a halogen selected from the group consisting of Cl, Br, and I. 
     
     
       33. The method of  claim 32 , wherein X is Br. 
     
     
       34. The method of  claim 24 , wherein the polymer is formed from the polymerization reaction in major amounts of at least 95% by weight. 
     
     
       35. The method of  claim 24 , wherein the amide base is lithium diisopropylamide. 
     
     
       36. The method of  claim 24 , wherein the Ni(II) catalyst is selected from the group consisting of 1,3-diphenylphosphinopropane nickel(II) chloride and 1,2-bis(diphneylphosphino)ethane nickel(II) chloride. 
     
     
       37. The method of  claim 24 , further comprising quenching the reaction to form the polymer. 
     
     
       38. A method of forming a polymer, comprising:
 combining a soluble thiophenemonomer with an amide base and a divalent metal halide;  
 adding an effective amount of a first Ni(II) catalyst to initiate a polymerization reaction to form at least 90%  about  75 % by weight of an intermediate polymer having the structure: 
                 
 
 wherein R is a substituent selected from the group consisting of alkyl, polyether, and aryl, X is a halogen, and n is greater than 1;  
 adding a derivative compound represented by the formula PFG-A-MX′ and a second Ni(II) catalyst to the intermediate polymer to form a protected thiophene polymer, wherein PFG is a protected hydroxyl or amine functional group, A is selected from the group consisting of alkyl and aromatic, M is a selected from the group consisting to Zn and Mg, and X′ is a halogen; and  
 deprotecting the protected thiophene polymer in an acid environment to form the deprotected polymer having one functional end group.  
 
     
     
       39. The method of  claim 38 , wherein the amide base is lithium diisopropylamide. 
     
     
       40. The method of  claim 39 , wherein the lithium diisopropylamide and divalent metal halide are added to the thiophene monomer at a temperature ranging from −78° C. to −60° C. 
     
     
       41. The method of  claim 38 , wherein the divalent metal halide is zinc chloride. 
     
     
       42. The method of  claim 38 , wherein the first and the second Ni(II) catalyst are selected from the group consisting of 1,3-diphenylphosphinopropane nickel(II) chloride and 1,2-bis(diphenylphosphino)ethane nickel(II) chloride. 
     
     
       43. The method of  claim 38 , wherein A is selected from the group consisting of benzene and thiophene, X′ is selected from the group consisting of Br and Cl, and PFG is selected from the group consisting of —CH 2 CH 2 O(tetrahydropyran), —CH 2 CH 2 O(trimethylsilane), and 
                 
 
     
     
       44. The method of  claim 38 , wherein deprotecting the protected thiophene polymer comprises adding acid agents with a refluxing solvent. 
     
     
       45. The method of  claim 44 , wherein the acid agents include hydrochloric acid, and the refluxing solvent is tetrahydrofuran. 
     
     
       46. A method of forming a polymer, comprising:
 combining a soluble thiophene monomer with an amide base and zinc chloride at a temperature ranging from −78° C. to −60° C.;  
 adding an effective amount of a first Ni(II) catalyst to initiate a polymerization reaction and form an intermediate polymer;  
 adding a derivative compound represented by the formula PFG-A-MX′ and a second Ni(II) catalyst to the intermediate polymer to form a protected thiophene polymer, wherein PFG is a protected hydroxyl or amine functional group, A is selected from the group consisting of alkyl and aromatic, M is a selected from the group consisting of Zn and Mg, and X′ is a halogen; and  
 deprotecting the protected thiophene polymer in an acid environment to form the deprotected polymer having one functional end group.  
 
     
     
       47. The method of claim  41   46 , wherein the intermediate polymer has the structure: 
                 
 
       wherein R is a substituent selected from the group consisting of alkyl, polyether, and aryl, X is a halogen, and n is greater than 1. 
     
     
       48. The method of  claim 46 , wherein the amide base is lithium diisopropylamide. 
     
     
       49. The method of  claim 46 , wherein the first and the second Ni(II) catalyst are selected from the group consisting of 1,3diphenylphosphinopropane nickel(II) chloride and 1,2-bis(diphenylphosphino)ethane nickel(II) chloride. 
     
     
       50. The method of  claim 46 , wherein A is selected from the group consisting of benzene and thiophene, X′ is selected from the group consisting of Br and Cl, and PFG is selected from the group consisting of —CH 2 CH 2 O(tetrahydropyran), —CH 2 CH 2 O(trimethylsilane), and 
                 
 
     
     
       51. The method of  claim 46 , wherein deprotecting the protected thiophene polymer comprises adding acid agents with a refluxing solvent. 
     
     
       52. The method of  claim 51 , wherein the acid agents include hydrochloric acid, and the refluxing solvent is tetrahydrofuran. 
     
     
       53. A protected thiophene polymer having the structure: 
                 
 
       wherein PFG is a protected hydroxyl or amine functional group, and A is selected from the group consisting of alkyl and aromatic, the protected thiophene polymer formed from the polymer of  claim 1 . 
     
     
       54. The protected thiophene polymer of  claim 53 , wherein A is selected from the group consisting of benzene and thiophene, and PFG is selected from the group consisting of —CH 2 CH 2 O(tetrahydropyran), —CH 2 CH 2 O (trimethylsilane), and 
                 
 
     
     
       55. A deprotected polymer having one functional end group having the structure: 
                 
 
       wherein R is selected from the group consisting of alkyl, polyester, and aryl; n is greater than 1; A is selected from the group consisting of alkyl and aromatic, and FG is a functional group selected from the group consisting of primary alkyl amine and primary alcohol,
 the deprotected polymer formed from the polymer of  claim 1 .  
 
     
     
       56. The deprotection polymer of  claim 55 , wherein A is selected from the group consisting of benzene and thiophene; and FG is a functional group selected from the group consisting of carboxylic acid, —CH 2 CH 2 OH, and —CH 2 CH 2 CH 2 NH 2 . 
     
     
       57. A method of forming a poly-(3-substituted) thiophene diol, comprising:
 combining a soluble thiophene with an organomagnesium reagent, wherein the organomagnesium reagent has the formula R′MgX′ and R′ is a substituent selected from the group consisting of alkyl, vinyl and phenyl and X′ is a halogen, to form at least 90% by weight of a polythiophene intermediate polymer having the structure: 
                 
 
 
       wherein R is a subsistent selected from the group consisting of alkyl, polyether, and aryl, and n is greater than 1;
 introducing aldehyde groups to both ends of a chain of the intermediate polymer; and  
 reducing the aldehyde groups to yield the poly-(3-substituted) thiophene diol.  
 
     
     
       58. The method of  claim 57 , further comprising adding an amount of tetrahydrofuran with the organomagnesium reagent. 
     
     
       59. The method of  claim 57  wherein X′ is a halogen selected from the group consisting of Br and I. 
     
     
       60. The method of  claim 57 , wherein R′ is an alkyl group. 
     
     
       61. The method of  claim 57 , wherein the Ni(II) catalyst is one of 1,3-diphenylphosphinopropane nickel(II) chloride and 1,2-bis(diphenylphosphino)ethane nickel(II) chloride. 
     
     
       62. The method of  claim 57 , wherein R and R′ are an alkyl group. 
     
     
       63. The method of  claim 57 , wherein the polymer is formed from the polymerization reaction in major amounts of at least 95% by weight. 
     
     
       64. The method of  claim 57 , wherein the polymer is formed from the polymerization reaction in major amounts of at least 99% by weight. 
     
     
       65. The method of  claim 57 , wherein essentially all of a product from the polymerization reaction is the thiophene diol. 
     
     
       66. The method of  claim 57 , wherein the introducing aldehyde groups of both ends of the chain of the intermediate polymer includes adding POCl 3  and N-methylformanilide to the intermediate polymer. 
     
     
       67. The method of  claim 57 , wherein reducing the aldehyde groups comprises adding LiAlH 4  to yield the poly-(3-substituted) thiophene diol. 
     
     
       68. A method of forming a diblock copolymer, comprising:
 combining a soluble thiophene monomer with an amide base and zinc chloride at a temperature ranging from −78° C. to −60° C.;  
 adding an effective amount of a first Ni(II) catalyst to initiate a polymerization reaction and form an intermediate polymer;  
 adding a derivative compound represented by the formula PFG-A-MX′ and a second Ni(II) catalyst to the intermediate polymer to form a protected thiophene polymer, wherein PFG is a protected hydroxyl or amine functional group, A is selected from the group consisting of alkyl and aromatic, M is a selected from the group consisting of Zn or Mg, and X is a halogen; and  
 deprotecting the protected thiophene polymer in an acid environment to form a deprotected polymer having one functional end group;  
 adding an ATRP initiator and a base to the deprotected polymer to form a ATRP macroinitiator; and  
 adding CuBr, at least one ATRP ligand, and at least one radically polymerizable monomer to the ATRP macroinitiator to form the diblock copolymer.  
 
     
     
       69. The method of  claim 68 , wherein the ATRP initiator 2-bromopropionyl bromide. 
     
     
       70. The method of  claim 68 , wherein the ATRP ligand is pentamethyldiethylenetriamine. 
     
     
       71. The method of  claim 68 , wherein the radically polymerizable monomer is selected from the group consisting of styrenes, substituted styrenes, and acrylates. 
     
     
       72. A method of forming a diblock copolymer, comprising:
 providing a deprotected polymer having one functional end group having the structure: 
                 
 
 wherein R is selected from the group consisting of alkyl, polyether, and aryl; n is greater than 1; A is selected from the group consisting of alkyl and aromatic, and FG is a functional group selected from the group consisting of primary alkyl amine and primary alcohol;  
 adding an ATRP (atom-transfer-radical-polymerization) initiator and a base to the deprotected polymer to form an ATRP macroinitiator; and  
 adding CuBr, at least one ATRP ligand, and at least one radially polymerizable monomer to the ATRP macroinitiator to form the diblock copolymer.  
 
     
     
       73. The method of  claim 72 , wherein the ATRP initiator 2-bromopropionyl bromide. 
     
     
       74. The method of  claim 72 , wherein the ATRP ligand is pentamethyldiethylenetriamine. 
     
     
       75. The method of  claim 72 , wherein the radically polymerizable monomer is selected from the group consisting of styrenes, substituted styrenes, and acrylates. 
     
     
       76. A method of forming a triblock copolymer, comprising
 combining a soluble thiophene with an organomagnesium reagent, wherein said organomagnesium reagent has the formula R′MgX′ and R′ is a substituent selected from the group consisting of alkyl, vinyl and phenyl and X′ is a halogen, to form at least 90% by weight of a polythiophene intermediate polymer having the structure: 
                 
 
 wherein R is a substituent selected from the group consisting of alkyl, polyether, and aryl, and n is greater than 1;  
 introducing aldehyde groups of both ends of a chain of the intermediate polymer;  
 reducing the aldehyde groups to yield a poly-(3-substituted) thiophene diol;  
 adding an ATRP (atom-transfer-radical-polymerization) initiator and a base to the diol to form a ATRP macroinitiator; and  
 adding CuBr, at least one ATRP ligand, and at least one radically polymerizable monomer to the ATRP macroinitiator to form the triblock copolymer.  
 
     
     
       77. The method of  claim 76 , wherein the ATRP initiator 2-bromopropionyl bromide. 
     
     
       78. The method of  claim 76 , wherein the ATRP ligand is pentamethyldiethylenetriamine. 
     
     
       79. The method of  claim 76 , wherein the radically polymerizable monomer is selected from the group consisting of styrenes, substituted styrenes, and acrylates. 
     
     
       80. A method of forming a triblock copolymer, comprising,
 providing a poly-(3-substituted) thiophene diol having the structure: 
                 
 
 wherein R is a substituent selected from the group consisting of alkyl, polyether, and aryl, and n is greater than 1,  
 adding an ATRP (atom-transfer-radical-polymerization) initiator and a base to the diol to form a ATRP macroinitiator; and  
 adding CuBr, at least one ATRP ligand, and at least one radically polymerizable monomer to the ATRP macroinitiator to form the triblock copolymer.  
 
     
     
       81. The method of  claim 80 , wherein the ATRP initiator 2-bromopropionyl bromide. 
     
     
       82. The method of  claim 80 , wherein the ATRP ligand is pentamethyldiethylenetriamine. 
     
     
       83. The method of  claim 80 , wherein the radically polymerizable monomer is selected from the group consisting of styrenes, substituted styrenes, and acrylates. 
     
     
       84. A method of forming a polyurethane copolymer, comprising
 combining a soluble thiophene with an organomagnesium reagent, wherein said organomagnesium reagent has the formula R′MgX′ and R′ is a substitute selected from the group consisting of alkyl, vinyl and phenyl and X′ is a halogen, to form at least 90% by weight of a polythiophene intermediate polymer having the structure: 
                 
 
 wherein R is a substituent selected from the group consisting of alkyl, polyether, and aryl, and n is greater than 1;  
 introducing aldehyde groups to both ends of a chain of the,  intermediate polymer;  
 reducing the aldehyde groups to yield a poly-(3-substituted) thiophene diol;  
 adding at least one dihydroxyl functional compound and at least one polyisocyanate to the diol to form the polyurethane copolymer.  
 
     
     
       85. A method of forming a polyurethane copolymer, comprising,
 providing a poly-(3-substituted) thiophene diol having the structure: 
                 
 
 
       wherein R is a substituent selected from the group consisting of alkyl, polyether, and aryl, and n is greater than 1;
 adding at least one dihydroxyl functional compound and at least one polyisocyanate to the diol to form the polyurethane copolymer.  
 
     
     
       86. An electrically conductive or optically sensitive polymeric material formed from the method of  claim 68 . 
     
     
       87. An electrically conductive or optically sensitive polymeric material formed from the method of  claim 72 . 
     
     
       88. An electrically conductive or optically sensitive polymeric material formed from the method of  claim 76 . 
     
     
       89. An electrically conductive or optically sensitive polymeric material formed from the method of  claim 80 . 
     
     
       90. An electrically conductive or optically sensitive polymeric material formed from the method of claim  89   84 . 
     
     
       91. An electrically conductive or optically sensitive polymeric material formed from the method of  claim 85 .