Multiple testing bars for testing liquid crystal display and method thereof

Abstract

A plurality of gate lines are formed on an insulating substrate in the horizontal direction, a gate shorting bar connected to the data lines is formed in the vertical direction and a gate insulating film is formed thereon. A plurality of data lines intersecting the gate lines are formed on the gate insulating film in the vertical direction, and a data shorting bar connected to the data lines is formed outside the display region. A first shorting bar is formed on the gate insulating film, located between the gate lines and the gate shorting bar, and connected to the odd gate lines. A second secondary shorting bar is formed parallel to the first shorting bar and connected to the even gate lines.

1. A thin film panel comprising:
 a plurality of gate lines formed on the  a substrate and extending in a horizontal direction, the plurality of gate lines comprising a first group and a second group;  
 a gate insulating film formed on the plurality of gate lines and having  comprising a plurality of first contact holes exposing portions of the plurality of gate lines;  
 a plurality of data lines formed on the gate insulating film, extending in a vertical direction and intersecting the plurality of gate lines;  
 a first testing bar formed on the gate insulating film, extending in the vertical direction;  
 a second testing bar formed on the gate insulating film and substantially parallel to the first testing bar;  
 a passivation film formed on the plurality of data lines, the first testing bar and the second testing bar, and having  comprising a plurality of second contact holes exposing the plurality of first contact holes and a plurality of third contact holes and a plurality of fourth contact holes exposing the first testing bars and the second testing bars, respectively;  
 a plurality of first connecting members formed on the passivation film and in direct contact with the first group of the gate lines through the plurality of first contact holes and the plurality of second contact holes and with the first testing bar through the plurality of third contact holes; and  
 a plurality of second connecting members formed on the passivation film and in direct contact with the second group of the gate lines through the plurality of first contact holes and the plurality of second contact holes and with the second testing bar through the plurality of fourth contact holes.  
 
     
     
       2. The thin film panel of  claim 1 , further comprising:
 a third, a fourth and a fifth testing bars formed on the substrate and extending in the horizontal direction;  
 a third, a fourth and a fifth connecting members formed on the passivation film,  
 wherein the third, the fourth and the fifth connecting members respectively connect the data fines to the third, the fourth and the fifth testing bars.  
 
     
     
       3. The thin film panel of  claim 2 , wherein the passivation film has fifth contact holes exposing the data lines, and the passivation film and the gate insulating film has sixth, seventh and the eighth contact holes respectively exposing the third, the fourth and the fifth testing bars, wherein the third, the fourth and the fifth connecting members are respectively connected to the data lines through the fifth contact holes, and to the third, the fourth and the fifth testing bars through the sixth, the seventh and the eighth contact holes. 
     
     
       4. The thin film panel of  claim 1 , further comprising a gate shorting bar formed on the substrate and connected to the gate lines. 
     
     
       5. The thin film panel of  claim 4 , further comprising a data shorting bar formed on the gate insulating film and connected to the data lines. 
     
     
       6. The thin film panel of  claim 5 , wherein the data shorting bar is electrically connected to the gate shorting bar. 
     
     
       7. The thin film panel of  claim 5 , wherein the data shorting bar is electrically connected to the gate shorting bar. 
     
     
       8. The thin film panel of  claim 7 , further comprising a data shorting bar formed on the gate insulating film, extending in the horizontal direction, located opposite the data lines with respect to the third, the fourth and the fifth shorting bars and separated from the data lines. 
     
     
       9. The thin film panel of  claim 8 , wherein the data shorting bar is electrically connected to the gate shorting bar. 
     
     
       10. The thin film panel comprising:
 a plurality of gate lines formed on the substrate and extending in a horizontal direction;  
 a first testing bar formed on the substrate and extending in the horizontal direction;  
 a second testing bar formed on the substrate substantially parallel to the first testing bar;  
 a gate insulating film formed on the gate lines and the first and the second testing bars, and having  comprising a first contact hole and a second contact hole exposing the first testing bar and the second testing bar, respectively;  
 a plurality of data lines formed on the gate insulating film, extending in a vertical direction, and intersecting the gate lines;  
 a passivation film covering the data lines and the first testing bar and the second testing bar, and having  comprising a third contact hole and a fourth contact hole on the first contact hole and the second contact hole, respectively, and fifth contact holes exposing the data lines;  
 a first connecting member formed on the passivation film and in direct contact with a first group of the data lines through one of the first and the third  fifth contact holes and with the first testing bar through the fifth  first and the third contact hole  holes; and  
 a second connecting member formed on the passivation film and in direct contact with a second group of the data lines, which are not connected to the first connecting member, through another one of the second and the fourth  fifth contact holes, and with the second testing bar through the fifth  second and the fourth contact hole  holes.  
 
     
     
       11. The thin film panel of  claim 10 , further comprising a gate shorting bar formed on the substrate and connected to the gate lines. 
     
     
       12. The thin film panel of  claim 11 , further comprising a data shorting bar formed on the gate insulating film and connected to the data lines. 
     
     
       13. The thin film panel of  claim 12 , wherein the data shorting bar is electrically connected to the gate shorting bar. 
     
     
       14. The thin film panel of  claim 10 , further comprising a data shorting bar formed on the gate insulating film, extending in the horizontal direction, located opposite the data lines with respect to the first and the second shorting  testing bars and separated from the data lines. 
     
     
       15. The thin film panel of  claim 14 , further comprising a gate shorting bar formed on the substrate, extending in the vertical direction and separated from the gate lines. 
     
     
       16. The thin film panel of  claim 15 , wherein the gate shorting bar is electrically connected to the data shorting bar. 
     
     
       17. A manufacturing method of a thin film panel, the method comprising:
 depositing a metal layer on a substrate;  
 patterning the metal layer to form gate lines;  
 forming a gate insulating film on the gate lines;  
 forming data lines and a first and a second shorting bars for testing the gate lines on the gate insulating film;  
 depositing a passivation film;  
 etching the passivation film and the gate insulating film to form first contact holes and a second contact hole and a third contact holes  hole respectively exposing the gate lines and the first and the second shorting bars;  
 depositing a conductive layer; and  
 patterning the conductive layer to form a pixel electrode, a first connecting member connected to one of the gate lines and the first shorting bar through one of the first contact holes and the second contact holes, and a second connecting member connected to another one of the gate line  lines and the second shorting bar through another one of the first contact holes and the third contact holes.  
 
     
     
       18. The manufacturing method of a thin film panel of  claim 17 , further comprising forming a third  gate shorting bar for electrostatic discharge protection connected to the gate lines by patterning the metal layer. 
     
     
       19. The manufacturing method of a thin film panel of  claim 18 , further comprising disconnecting the third  gate shorting bar from the gate lines after forming the first and the second connecting members. 
     
     
       20. A manufacturing method of a thin film panel, the method comprising:
 forming gate lines, a first, a second and a third shorting bars for testing data lines on a substrate;  
 forming a gate insulating film;  
 depositing a metal layer on the gate insulating film;  
 patterning the metal layer to form data lines;  
 depositing a passivation film;  
 etching the passivation film and the gate insulating film to form first, second, third and fourth contact holes exposing the data line, the first, the second and the third shorting bars;  
 depositing a conductive layer; and  
 patterning the conductive layer to form a pixel electrode and connecting members, the connecting members connected to the data lines through the first contact holes and to the first, the second and the third shorting bars through the second, the third and the fourth contact holes.  
 
     
     
       21. The manufacturing method of a thin film panel of  claim 20 , further comprising forming a fourth  data shorting bar for electrostatic discharge protection connected to the data lines by patterning the metal layer. 
     
     
       22. The manufacturing method of a thin film panel of  claim 21 , further comprising disconnecting the fourth  data shorting bar from the data lines after forming the first, the second and the third connecting members. 
     
     
       23. A manufacturing method of a thin film panel, the method comprising the steps of:
 forming a wire including a plurality of gate lines, a plurality of data lines, a main shorting bar for electrostatic discharge protection which is connected to the gate lines and the data lines, a first and a second shorting bars for testing the gate lines, a third and a fourth shorting bars for testing the data lines, wherein the first and the second shorting bars are alternately connected to the gate lines and the third and the fourth shorting bars are respectively connected to the every other data lines;    separating the main shorting bar from the gate and the data lines; and    applying voltages to the first, the second, the third and the fourth shorting bars for detecting defects of the data lines and the gate lines.    
     
     
       24. The manufacturing method of a thin film panel of  claim 23 , wherein the voltages applied to the first shorting bar and the second shorting bar are different. 
     
     
       25. The manufacturing method of a thin film panel of  claim 23 , wherein the voltages applied to the third shorting bar and the fourth shorting bar are different. 
     
     
       26. The manufacturing method of a thin film panel of  claim 23 , further comprising removing the first, the second, the third and the fourth shorting bars after the step of applying voltages. 
     
     
       27. A thin film panel comprising:
 a plurality of first signal lines transmitting first signals and extending in a direction substantially parallel to each other;  
 a plurality of second signal lines transmitting second signals and extending substantially parallel to the first signal lines;  
 a first testing bar located near one ends of the first signal lines;  
 a second testing bar located near one ends of the second signal lines, substantially parallel to the first testing bar, and separated from the first testing bar;  
 a plurality of first conductive extensions connected between the first testing bar and the first signal lines, respectively; and  
 a plurality of second conductive extensions connected between the second testing bar and the second signal lines, respectively,  
 wherein the first and the second conductive extensions have cutouts for electrical disconnection.  
 
     
     
       28. The panel of  claim 27 , wherein the first testing bar is located opposite the first and the second signal lines with respect to the second testing bar. 
     
     
       29. The panel of  claim 28 , wherein the first and the second signal lines and the first and the second conductive extensions include  comprise a first layer, and the first and the second testing bars include  comprise a second layer different from the first layer. 
     
     
       30. The panel of  claim 29 , further comprising:
 a plurality of first connecting members connecting the first conductive extensions and the first testing bar; and  
 a plurality of second connecting members connecting the second conductive extensions and the second testing bar,  
 wherein the first and the second connecting members include  comprise a third layer different from the first and the second layer.