Positive photosensitive compositions

Abstract

A positive photosensitive composition comprising (A) a compound capable of generating a fluorine-substituted alkanesulfonic acid having 2 to 4 carbon atoms by irradiation of actinic rays or radiation, (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase solubility in an alkali developer, (C) a basic compound, and (D) a fluorine and/or silicon surfactant.

1. A positive photosensitive composition comprising:
 (A) a compound capable of generating a fluorine-substituted alkanesulfonic acid having 2 to 4 carbon atoms by irradiation of actinic rays or radiation, two kinds of compounds capable of generating a fluorine-substituted alkanesulfonic acid having 2 to 4 carbon atoms by irradiation of actinic rays or radiation; or a compound capable of generating a fluorine-substituted alkanesulfonic acid having 2 to 4 carbon atoms by irradiation of actinic rays or radiation and a compound capable of generating an acid by irradiation of actinic rays or radiation which is different from the compound capable of generating a fluorine-substituted alkanesulfonic acid having 2 to 4 carbon atoms by irradiation of actinic rays or radiation, 
 (B) a resin having a monocyclic or polycyclic alicyclic hydrocarbon structure and being decomposed by the action of an acid to increase solubility in an alkali developer, 
 (C) a basic compound, and 
 (D) a fluorine and/or silicon surfactant. 
 
     
     
       2. The positive photosensitive composition according to  claim 1 , further comprising (E) a mixture of a hydroxyl-containing solvent and a hydroxyl-free solvent. 
     
     
       3. The positive photosensitive composition according to  claim 2 , wherein the hydroxyl-containing solvent is selected from propylene glycol monomethyl ether and ethyl lactate. 
     
     
       4. The positive photosensitive composition according to  claim 2 , wherein the hydroxyl-free solvent is selected from a solvent containing a ketone group or an ester group. 
     
     
       5. The positive photosensitive composition according to  claim 2 , wherein the hydroxyl-free solvent is selected from propylene glycol monomethyl ether acetate, ethyl ethoxypropionate, 2-heptanone, γ-butyrolactone, cyclohexanone and butyl acetate. 
     
     
       6. The positive photosensitive composition according to  claim 2 , wherein the mixture of a hydroxyl-containing solvent and a hydroxyl-free solvent is a mixture of propylene glycol monomethyl ether and propylene glycol monomethyl ether acetate. 
     
     
       7. The positive photosensitive composition according to  claim 1 , wherein the resin (B) further has a structural unit represented by the following formula (I) or (II): 
       
         
           
           
               
               
           
         
       
       wherein R 1  to R 4  each independently represents a hydrogen atom, a carboxyl group, a hydroxyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxycarbonyl group or a group having an acid decomposable group; and n stands for 0 or 1. 
     
     
       8. The positive photosensitive composition according to  claim 1 , wherein the resin (B) has a (meth)acrylate structural unit. 
     
     
       9. The positive photosensitive composition according to  claim 1 , wherein the basic compound (C) is a compound having a structure represented by the following formulas (A) to (E): 
       
         
           
           
               
               
           
         
       
       wherein, R 250 , R 251  and R 252  each independently represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an aminoalkyl group having 1 to 6 carbon atoms, a hydroxyalkyl group having 1 to 6 carbon atoms or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, or R 250  and R 251  may be bonded to each other to form a ring; 
       
         
           
           
               
               
           
         
       
       wherein, R 253 , R 254 , R 255  and R 256  each independently represents an alkyl group having 1 to 6 carbon atoms. 
     
     
       10. The positive photosensitive composition according to  claim 1 , wherein the basic compound (C) is a compound having a structure selected from an imidazole structure, a diazabicyclo structure, an onium hydroxide structure and an onium carboxylate structure. 
     
     
       11. The positive photosensitive composition according to claim  1  10, wherein an onium of the onium hydroxide structure is selected from sulfonium, iodonium and ammonium. 
     
     
       12. The positive photosensitive composition according to claim  1  10, wherein an onium of the onium carboxylate structure is selected from sulfonium, iodonium and ammonium. 
     
     
       13. The positive photosensitive composition according to claim 1, wherein the component (A) comprises two kinds of sulfonium salts capable of generating a fluorine-substituted alkanesulfonic acid having 2 to 4 carbon atoms by irradiation of actinic rays or radiation and being different from each other in the number of aromatic rings included therein. 
     
     
       14. The positive photosensitive composition according to claim 13, wherein an amount of the sulfonium salt greater in the number of aromatic rings is 50% by weight or less based on a total weight of the two kinds of sulfonium salts. 
     
     
       15. The positive photosensitive composition according to claim 1, wherein the component (A) comprises a compound capable of generating a fluorine-substituted alkanesulfonic acid having 2 to 4 carbon atoms by irradiation of actinic rays or radiation and a compound capable of generating an acid by irradiation of actinic rays or radiation represented by the following formula (PAG4A): 
       
         
           
           
               
               
           
         
       
       wherein R 100 , R 101 , R 102  each independently represents a substituted or unsubstituted alkyl or a substituted or unsubstituted aryl group in which two of R 100 , R 101 , R 102  may be bonded with each other via a single bond or a substituent, and Za −  represents CF 3 SO 3   − . 
     
     
       16. The positive photosensitive composition according to claim 1, wherein a molar ratio of an amount of the compound capable of generating a fluorine-substituted alkanesulfonic acid having 2 to 4 carbon atoms by irradiation of actinic rays or radiation to an amount of the compound capable of generating an acid by irradiation of actinic rays or radiation which is different from the compound capable of generating a fluorine-substituted alkanesulfonic acid having 2 to 4 carbon atoms by irradiation of actinic rays or radiation is 100/0 to 50/50. 
     
     
       17. The positive photosensitive composition according to claim 1, wherein the component (D) is a fluorine surfactant. 
     
     
       18. The positive photosensitive composition according to claim 1, wherein the component (B) is a resin comprising a main chain consisting of a (meth)acrylate structural unit. 
     
     
       19. The positive photosensitive composition according to claim 1, wherein the resin (B) is contained in an amount of 50 to 99.5% by weight in the solid of the composition.