Charged particle beam writing method

Abstract

A writing method includes emitting a first charged particle beam formed to be a first shape by passing through a first shaping aperture and a second shaping aperture, onto a target workpiece; and emitting a second charged particle beam formed to be a second shape by passing through the first shaping aperture and the second shaping aperture, wherein the second charged particle beam is superimposed onto a same position exposed by the first charged particle beam and is formed by using an opposite sides of respective first and second shaping apertures to those used for the first shape.

What is claimed is: 
     
       1. A writing method comprising:
 emitting a plurality of first charged particle beam beams formed to be a first shape by passing through a first shaping aperture and a second shaping aperture, onto a target workpiece so that the plurality of first charged particle beams are placed in line next onto the target workpiece; and 
 emitting, after emitting the plurality of first charged particle beams, a plurality of second charged particle beam beams formed to be a second shape by passing through the first shaping aperture and the second shaping aperture, wherein the second charged particle beam is superimposed so that the plurality of second charged particle beams are placed in line next onto a same position exposed by the plurality of first charged particle beam beams and is formed by using an opposite sides of respective first and second shaping apertures to those used for the first shape. 
 
     
     
       2. The method according to  claim 1 , wherein the first shape and the second shape are squares. 
     
     
       3. The method according to  claim 1 , wherein each of the first shape and the second shape includes a first side formed by the first shaping aperture and a second side formed by the second shaping aperture. 
     
     
       4. The method according to  claim 3 , wherein the first charged particle beam and the second charged particle beam are emitted so that the first side included in the first shape overlaps with the second side included in the second shape. 
     
     
       5. The method according to  claim 1 , wherein a beam profile of the first shape and a beam profile of the second shape are combined to be symmetrical. 
     
     
       6. A writing method comprising:
 emitting a first charged particle beam formed to be a first shape by passing through both a first shaping aperture and a second shaping aperture, onto a target workpiece; and   emitting a second charged particle beam formed to be a second shape by passing through both the first shaping aperture and the second shaping aperture, in such a way the second shape is positioned adjacent to the first shape, but with corresponding sides which are sides of respective shapes formed by one same aperture of the first shaping aperture and the second shaping aperture, face each other.   
     
     
       7. The method according to  claim 6 , wherein the first charged particle beam and the second charged particle beam are emitted so that they partly overlap each other. 
     
     
       8. The method according to  claim 6 , wherein the first charged particle beam and the second charged particle beam are emitted so that they have a space therebetween. 
     
     
       9. The method according to  claim 6 , wherein the second charged particle beam is emitted onto a position adjacent to another position irradiated by the first charged particle beam, in order that a side of the first shape and a side of the second shape formed by the second shaping aperture become outer sides.