Wafer transfer apparatus and substrate transfer apparatus

Abstract

A wafer transfer apparatus is provided. In a minimum transformed state where a robot arm is transformed such that a distance defined from a pivot axis to an arm portion, which is farthest in a radial direction relative to the pivot axis, is minimum, a minimum rotation radius R, is set to exceed ½ of a length B in the forward and backward directions of an interface space, the length B corresponding to a length between the front wall and the rear wall of the interface space forming portion, and is further set to be equal to or less than a subtracted value obtained by subtracting a distance L 0 in the forward and backward directions from the rear wall of the interface space forming portion to the pivot axis, from the length B in the forward and backward directions of the interface space (i.e., B/2<R≦B−L 0 ).

What is claimed is: 
     
       1. A wafer transfer apparatus for transferring a wafer, comprising:
 an interface space forming portion defining an interface space, the interface space forming portion having a front wall and a rear wall which are arranged at a predetermined interval in forward and backward directions, the front wall having a front opening formed therein, and the rear wall having a rear opening formed therein;   a FOUP opener configured to open and close the substrate container located adjacent to the interface space and the front opening of the interface space forming portion; and   a wafer carrying robot located in the interface space and configured to carry the wafer between the front opening and the rear opening,   wherein the wafer carrying robot includes:
 a base which is fixed to the interface space forming portion and at which a predetermined pivot axis is set; 
 a robot arm having a proximal end and a distal end, the robot arm including a plurality of link members connected with one another in succession in a direction from the proximal end to the distal end, the proximal end being connected with the base, the distal end being provided with a robot hand for holding the wafer, the robot arm being configured to be angularly displaced about the pivot axis; and 
 a drive unit configured to drive each of the link members of the robot arm so that the link members are angularly displaced, individually, about each corresponding axis, 
   wherein, in a minimum transformed state where the robot arm is transformed such that a distance defined from the pivot axis to an arm portion which is farthest in a radial direction relative to the pivot axis is minimum, a minimum rotation radius R, as the distance defined from the pivot axis to the arm portion which is the farthest in the radial direction relative to the pivot axis, is set to exceed ½ of a length B in the forward and backward directions of the interface space, the length B corresponding to a length between the front wall and the rear wall of the interface space forming portion, and is further set to be equal to or less than a subtracted value (B−L 0 ) to be obtained by subtracting a distance L 0  in the forward and backward directions from the rear wall of the interface space forming portion to the pivot axis, from the length B in the forward and backward directions of the interface space (i.e., B/2<R≦B−L 0 ), and   the minimum rotation radius R is set to be equal to or less than an allowable length (B−L 0 −E) to be obtained by subtracting the distance L 0  in the forward and backward directions from the rear wall of the interface space forming portion to the pivot axis and a length E of a robot invasion restricted region, which is set for the FOUP opener and is measured from the front wall in the forward and backward directions toward the rear wall, from the length B in the forward and backward directions of the interface space (i.e., R<B−L 0 −E).   
     
     
       2. The wafer transfer apparatus according to  claim 1 , wherein the robot arm includes:
 a first link member which is connected at its one end with the base, configured to be angularly displaced about the pivot axis, and at which a first joint axis is set in parallel to the pivot axis;   a second link member which is connected at its one end with an other end of the first link member, configured to be angularly displaced about the first joint axis, and at which a second pivot axis is set in parallel to the pivot axis; and   a third link member which is connected at its one end with an other end of the second link member, configured to be angularly displaced about the second joint axis, and includes the robot hand at an other end of the third link member for holding the wafer,   wherein a first link distance L 1  defined as a distance from the pivot axis to an end of the first link member, which is farthest in a radial direction toward the first joint axis relative to the pivot axis, is set to exceed ½ of the allowable length (B−L 0 −E) and to be equal to or less than the allowable length (B−L 0 −E) (i.e., ((B−L 0 −E)/2<L 1 ≦B−L 0 −E).   
     
     
       3. The wafer transfer apparatus according to  claim 2 ,
 wherein a first axis-to-axis distance L 11  from the pivot axis to the first joint axis and a second axis-to-axis distance L 12  from the first joint axis to the second joint axis are set to be equal to each other, and   wherein a second link distance L 2  defined as a distance from the second joint axis to an end of the second link member, which is farthest in a direction toward the first joint axis relative to the second joint axis, is set to exceed ½ of the allowable length (B−L 0 −E) and to be equal to or less than the allowable length (B−L 0 −E).   
     
     
       4. The wafer transfer apparatus according to  claim 3 , wherein a third link distance L 3  defined as a distance from the second joint axis to an end of the third link member or a portion of the wafer, which is farthest in a radial direction relative to the second joint axis, is set to exceed ½ of the allowable length (B−L 0 −E) and to be equal to or less than the allowable length (B−L 0 −E). 
     
     
       5. The wafer transfer apparatus according to  claim 4 , wherein the first link distance L 1 , the second link distance L 2  and the third link distance L 3  are respectively set to be equal to the allowable length (B−L 0 −E). 
     
     
       6. The wafer transfer apparatus according to  claim 1 ,
 wherein the front opening includes four openings which are formed in the interface space forming portion, the four openings being arranged in left and right directions orthogonal to both the forward and backward directions and a direction of the pivot axis, and   wherein the FOUP opener includes four openers which are provided in order to open and close the four openings, respectively.   
     
     
       7. A substrate transfer apparatus for transferring a substrate, relative to a substrate processing apparatus for processing the substrate, comprising:
 an interface space forming portion defining an interface space, the interface space forming portion having a front wall and a rear wall which are arranged in predetermined forward and backward directions at an interval, the front wall having a first transfer port formed therein, and the rear wall having a second transfer port formed therein;   an opening and closing unit configured to open and close the first transfer port of the interface space forming portion; and   a substrate carrying robot located in the interface space and configured to carry the substrate between the first transfer port and the second transfer port,   wherein the substrate carrying robot includes:
 a base which is fixed to the interface space forming portion and at which a predetermined pivot axis is set; 
 a first link member which is connected at its one end with the base, configured to be angularly displaced about the pivot axis, and at which a first joint axis is set in parallel to the pivot axis; 
 a second link member which is connected at its one end with an other end of the first link member, configured to be angularly displaced about the first joint axis, and at which a second pivot axis is set in parallel to the pivot axis; 
 a third link member which is connected at its one end with an other end of the second link member, configured to be angularly displaced about the second joint axis, and includes a robot hand at an other end thereof for holding the substrate; and 
 a drive unit configured to drive each of the link members so that the link members are angularly displaced, individually, about each corresponding axis, 
   wherein the pivot axis is located nearer to the rear wall than to the front wall or nearer to the front wall than to the rear wall in the forward and backward directions, and   wherein a first link distance L 1  defined as a distance from the pivot axis to an end of the first link member, which is farthest in a radial direction toward the first joint axis relative to the pivot axis, is set to exceed ½ of a length B in the forward and backward directions of the interface space, the length B corresponding to a length between the front wall and the rear wall of the interface space forming portion, and is further set to be equal to or less than a subtracted value (B−L 0 ) to be obtained by subtracting a distance L 0  in the forward and backward directions from the rear wall of the interface space forming portion to the pivot axis, from the length B in the forward and backward directions of the interface space (i.e., B/2<L 1 ≦B−L 0 ), and   the first link distance L 1  is set to be equal to or less than an allowable length (B−L 0 −E) to be obtained by subtracting the distance L 0  in the forward and backward directions from the rear wall of the interface space forming portion to the pivot axis and a length E of a robot invasion restricted region, which is set for the FOUP opener and is measured from the front wall in the forward and backward directions toward the rear wall, from the length B in the forward and backward directions of the interface space (i.e., L 1 ≦B−L 0 −E).   
     
     
       8. A wafer transfer apparatus for transferring a wafer, comprising:
 an interface space forming portion defining an interface space, the interface space forming portion having a front wall and a rear wall which are arranged at a predetermined interval in forward and backward directions, the front wall having a front opening formed therein, and the rear wall having a rear opening formed therein;   a FOUP opener configured to open and close the substrate container located adjacent to the interface space and the front opening of the interface space forming portion; and   a wafer carrying robot located in the interface space and configured to carry the wafer between the front opening and the rear opening,   wherein the wafer carrying robot includes:
 a base which is fixed to the interface space forming portion and at which a predetermined pivot axis is set; 
 a robot arm having a proximal end and a distal end, the robot arm including a plurality of link members connected with one another in succession in a direction from the proximal end to the distal end, the proximal end being connected with the base, the distal end being provided with a robot hand for holding the wafer, the robot arm being configured to be angularly displaced about the pivot axis; and 
 a drive unit configured to drive each of the link members of the robot arm so that the link members are angularly displaced, individually, about each corresponding axis, 
   wherein, in a minimum transformed state where the robot arm is transformed such that a distance defined from the pivot axis to an arm portion which is farthest in a radial direction relative to the pivot axis is minimum, a minimum rotation radius R, as the distance defined from the pivot axis to the arm portion which is the farthest in the radial direction relative to the pivot axis, is set to exceed ½ of a length B in the forward and backward directions of the interface space, the length B corresponding to a length between the front wall and the rear wall of the interface space forming portion, and is further set to be equal to or less than a subtracted value (B−L 0 ) to be obtained by subtracting a distance L 0  set to be greater by a predetermined gap length Q than a radius T 2  of an outer circumference of the first link member about the pivot axis (L 0 =T 2 +Q), from the length B in the forward and backward directions of the interface space (i.e., B/2<R≦B−L 0 ), and   the minimum rotation radius R is set to be equal to or less than an allowable length (B−L 0 −E) to be obtained by subtracting the distance L 0  set to be greater by the predetermined gap length Q than the radius T 2  of an outer circumference of the first link member about the pivot axis and a length E of a robot invasion restricted region, which is set for the FOUP opener and is measured from the front wall in the forward and backward directions toward the rear wall, from the length B in the forward and backward directions of the interface space (i.e., R<B−L 0 −E).   
     
     
       9. The wafer transfer apparatus according to  claim 8 , wherein the robot arm includes:
 a first link member which is connected at its one end with the base, configured to be angularly displaced about the pivot axis, and at which a first joint axis is set in parallel to the pivot axis;   a second link member which is connected at its one end with an other end of the first link member, configured to be angularly displaced about the first joint axis, and at which a second pivot axis is set in parallel to the pivot axis; and   a third link member which is connected at its one end with an other end of the second link member, configured to be angularly displaced about the second joint axis, and includes the robot hand at an other end of the third link member for holding the wafer,   wherein a first link distance L 1  defined as a distance from the pivot axis to an end of the first link member, which is farthest in a radial direction toward the first joint axis relative to the pivot axis, is set to exceed ½ of the allowable length (B−L 0 −E) and to be equal to or less than the allowable length (B−L 0 −E) (i.e., ((B−L 0 −E)/2<L 1 ≦B−L 0 −E).   
     
     
       10. The wafer transfer apparatus according to  claim 9 ,
 wherein a first axis-to-axis distance L 11  from the pivot axis to the first joint axis and a second axis-to-axis distance L 12  from the first joint axis to the second joint axis are set to be equal to each other, and   wherein a second link distance L 2  defined as a distance from the second joint axis to an end of the second link member, which is farthest in a direction toward the first joint axis relative to the second joint axis, is set to exceed ½ of the allowable length (B−L 0 −E) and to be equal to or less than the allowable length (B−L 0 −E).   
     
     
       11. The wafer transfer apparatus according to  claim 10 , wherein a third link distance L 3  defined as a distance from the second joint axis to an end of the third link member or a portion of the wafer, which is farthest in a radial direction relative to the second joint axis, is set to exceed ½ of the allowable length (B−L 0 −E) and to be equal to or less than the allowable length (B−L 0 −E). 
     
     
       12. The wafer transfer apparatus according to  claim 11 , wherein the first link distance L 1 , the second link distance L 2  and the third link distance L 3  are respectively set to be equal to the allowable length (B−L 0 −E). 
     
     
       13. The wafer transfer apparatus according to  claim 8 ,
 wherein the front opening includes four openings which are formed in the interface space forming portion, the four openings being arranged in left and right directions orthogonal to both the forward and backward directions and a direction of the pivot axis, and   wherein the FOUP opener includes four openers which are provided in order to open and close the four openings, respectively.   
     
     
       14. A substrate transfer apparatus for transferring a substrate, relative to a substrate processing apparatus for processing the substrate, comprising:
 an interface space forming portion defining an interface space, the interface space forming portion having a front wall and a rear wall which are arranged in predetermined forward and backward directions at an interval, the front wall having a first transfer port formed therein, and the rear wall having a second transfer port formed therein;   an opening and closing unit configured to open and close the first transfer port of the interface space forming portion; and   a substrate carrying robot located in the interface space and configured to carry the substrate between the first transfer port and the second transfer port,   wherein the substrate carrying robot includes:
 a base which is fixed to the interface space forming portion and at which a predetermined pivot axis is set; 
 a first link member which is connected at its one end with the base, configured to be angularly displaced about the pivot axis, and at which a first joint axis is set in parallel to the pivot axis; 
 a second link member which is connected at its one end with an other end of the first link member, configured to be angularly displaced about the first joint axis, and at which a second pivot axis is set in parallel to the pivot axis; 
 a third link member which is connected at its one end with an other end of the second link member, configured to be angularly displaced about the second joint axis, and includes a robot hand at an other end thereof for holding the substrate; and 
 a drive unit configured to drive each of the link members so that the link members are angularly displaced, individually, about each corresponding axis, 
   wherein the pivot axis is located nearer to the rear wall than to the front wall or nearer to the front wall than to the rear wall in the forward and backward directions, and   wherein a first link distance L 1  defined as a distance from the pivot axis to an end of the first link member, which is farthest in a radial direction toward the first joint axis relative to the pivot axis, is set to exceed ½ of a length B in the forward and backward directions of the interface space, the length B corresponding to a length between the front wall and the rear wall of the interface space forming portion, and is further set to be equal to or less than a subtracted value (B−L 0 ) to be obtained by subtracting a distance L 0  set to be greater by a predetermined gap length Q than a radius T 2  of an outer circumference of the first link member about the pivot axis (L 0 =T 2 +Q), from the length B in the forward and backward directions of the interface space (i.e., B/2<L 1 ≦B−L 0 ), and   the first link distance L 1  is set to be equal to or less than an allowable length (B−L 0 −E) to be obtained by subtracting the distance L 0  set to be greater by the predetermined gap length Q than the radius T 2  of an outer circumference of the first link member about the pivot axis and a length E of a robot invasion restricted region, which is set for the FOUP opener and is measured from the front wall in the forward and backward directions toward the rear wall, from the length B in the forward and backward directions of the interface space (i.e., L 1 ≦B−L 0 −E).   
     
     
       15. A wafer carrying robot configured to be used for a wafer transfer apparatus, the wafer transfer apparatus having a front wall, a rear wall and a FOUP opener, the front wall having a front opening, the FOUP opener being used for opening and closing the front opening, the wafer carrying robot comprising:
 a base on which a predetermined pivot axis is set;   a robot arm, the robot arm including a plurality of link members connected with one another in succession in a direction from a proximal end to a distal end, the proximal end being connected with the base, the distal end being configured to hold a robot hand that holds the wafer, the robot arm being configured to be angularly displaced about the pivot axis; and   a drive unit configured to drive the robot arm,   wherein, in a minimum transformed state where the robot arm is transformed such that a distance defined from the pivot axis to an arm portion which is farthest in a radial direction relative to the pivot axis is minimum, a minimum rotation radius R, as the distance defined from the pivot axis to the arm portion which is the farthest in the radial direction relative to the pivot axis, is set to exceed ½ of a length B, the length B corresponding to a length between the front wall and the rear wall (i.e., B/2<R), and   the minimum rotation radius R is set to be equal to or less than an allowable length (B−L0−E) to be obtained by subtracting the distance L0 in the forward and backward directions from the rear wall to the pivot axis and a length E of a robot invasion restricted region, which is determined by the FOUP opener and is measured from the front wall in the forward and backward directions toward the rear wall, from the length B (i.e., R≦B−L0−E).   
     
     
       16. A wafer carrying robot configured to be used for a wafer transfer apparatus, the wafer transfer apparatus having a front wall, a rear wall and a FOUP opener, the front wall having a front opening, the FOUP opener being used for opening and closing the front opening, the wafer carrying robot comprising:
 a base on which a predetermined pivot axis is set;   a robot arm, the robot arm including a plurality of link members connected with one another in succession in a direction from a proximal end to a distal end, the proximal end being connected with the base, the distal end being configured to hold a robot hand that holds the wafer, the robot arm being configured to be angularly displaced about the pivot axis; and   a drive unit configured to drive the robot arm,   wherein, the wafer carrying robot configured to be used with the pivot axis is located nearer to the rear wall than to the front wall or nearer to the front wall than to the rear wall in the forward and backward directions,   a first link distance L1 defined as a distance from the pivot axis to an end of the first link member, which is farthest in a radial direction toward the first joint axis relative to the pivot axis, is set to exceed ½ of a length B, the length B corresponding to a length between the front wall and the rear wall (i.e., B/2<L1), and   the first link distance L1 is set to be equal to or less than an allowable length (B−L0−E) to be obtained by subtracting the distance L0 in the forward and backward directions from the rear wall to the pivot axis and a length E of a robot invasion restricted region, which is determined by the FOUP opener and is measured from the front wall in the forward and backward directions toward the rear wall, from the length B (i.e., L1≦B−L0−E).   
     
     
       17. A wafer carrying robot configured to be used for a wafer transfer apparatus, the wafer transfer apparatus having a front wall, a rear wall and a FOUP opener, the front wall having a front opening, the FOUP opener being used for opening and closing the front opening, the wafer carrying robot comprising:
 a base on which a predetermined pivot axis is set;   a robot arm, the robot arm including a plurality of link members connected with one another in succession in a direction from a proximal end to a distal end, the proximal end being connected with the base, the distal end being configured to hold a robot hand that holds the wafer, the robot arm being configured to be angularly displaced about the pivot axis; and   a drive unit configured to drive the robot arm,   wherein, in a minimum transformed state where the robot arm is transformed such that a distance defined from the pivot axis to an arm portion which is farthest in a radial direction relative to the pivot axis is minimum, a minimum rotation radius R, as the distance defined from the pivot axis to the arm portion which is the farthest in the radial direction relative to the pivot axis, is set to exceed ½ of a length B, the length B corresponding to a length between the front wall and the rear wall (i.e., B/2<R),   the minimum rotation radius R is set to be equal to or less than an allowable length (B−L0−E) to be obtained by subtracting the distance L0 set to be greater by the predetermined gap length Q than the radius T2 of an outer circumference of the first link member about the pivot axis and a length E of a robot invasion restricted region, which is set for the FOUP opener and is measured from the front wall in the forward and backward directions toward the rear wall, from the length B in the forward and backward directions of the interface space (i.e., R≦B−L0−E), and   the predetermined gap length Q defines a space that is separate from a space defined by the length E of the robot invasion restricted region, and the predetermined gap length Q is sufficient to prevent interference that would be otherwise caused by the robot.   
     
     
       18. A wafer carrying robot configured to be used for a wafer transfer apparatus, the wafer transfer apparatus having a front wall, a rear wall and a FOUP opener, the front wall having a front opening, the FOUP opener being used for opening and closing the front opening, the wafer carrying robot comprising:
 a base on which a predetermined pivot axis is set;   a robot arm, the robot arm including a plurality of link members connected with one another in succession in a direction from a proximal end to a distal end, the proximal end being connected with the base, the distal end being configured to hold a robot hand that holds the wafer, the robot arm being configured to be angularly displaced about the pivot axis; and   a drive unit configured to drive the robot arm,   wherein, the wafer carrying robot configured to be used with the pivot axis is located nearer to the rear wall than to the front wall or nearer to the front wall than to the rear wall in the forward and backward directions,   a first link distance L1 defined as a distance from the pivot axis to an end of the first link member, which is farthest in a radial direction toward the first joint axis relative to the pivot axis, is set to exceed ½ of a length B, the length B corresponding to a length between the front wall and the rear wall (i.e., B/2<L1),   the first link distance L1 is set to be equal to or less than an allowable length (B−L0−E) to be obtained by subtracting the distance L0 set to be greater by the predetermined gap length Q than the radius T2 of an outer circumference of the first link member about the pivot axis and a length E of a robot invasion restricted region, which is set for the FOUP opener and is measured from the front wall in the forward and backward directions toward the rear wall, from the length B in the forward and backward directions of the interface space (i.e., L1≦B−L0−E), and   the predetermined gap length Q defines a space that is separate from a space defined by the length E of the robot invasion restricted region, and the predetermined gap length Q is sufficient to prevent interference that would be otherwise caused by the robot.   
     
     
       19. The wafer carrying robot according to claim 15, wherein
 the rear wall has a rear opening, and   the wafer carrying robot is configured to carry the wafer between the front opening and the rear opening.   
     
     
       20. The wafer carrying robot according to claim 15, wherein the drive unit is arranged in the robot arm. 
     
     
       21. The wafer carrying robot according to claim 15, wherein the front opening includes three or four openings. 
     
     
       22. The wafer carrying robot according to claim 15, wherein the wafer transfer apparatus has side walls, and the wafer transfer apparatus has wafer holding position in the side wall side. 
     
     
       23. The wafer carrying robot according to claim 15, wherein the link members include:
 a first link member,   a second link member which is connected to the first link member, and   a third link member which is connected to the second link member and includes the robot hand, and   the first link member and the second link member are projected toward the front wall or the rear wall which is farther to the base when the wafer carrying robot accesses to the wafer holding position.   
     
     
       24. The wafer carrying robot according to claim 15,
 wherein the link members include:
 a first link member, 
 a second link member which is connected to the first link member, and 
 a third link member which is connected to the second link member and includes the robot hand, and 
   the wafer carrying robot moves one end of the third link member from near position to the front wall to the near position to the rear wall while moves the another end of the third link member from near position to the rear wall side to the near position to the front wall to rotate the robot hand.   
     
     
       25. The wafer carrying robot according to claim 15, wherein the proximal end of the robot arm is located near the rear wall. 
     
     
       26. A wafer transfer apparatus which has the wafer carrying robot according to claim 15.