USRE50464EActiveUtilityPatentIndex 59
Modular plasma reformer treatment system
Est. expiryJul 28, 2037(~11.1 yrs left)· nominal 20-yr term from priority
Inventors:HILL GARRETT
F01N 2240/28B01D 2257/502B01D 2257/404F01N 2240/30F01N 2240/22B01D 2257/702F01N 3/01F01N 3/037B01D 53/261B01D 53/92F01N 3/0892Y02T10/12B01D 53/32
59
PatentIndex Score
0
Cited by
60
References
66
Claims
Abstract
A modular plasma treatment system has interchangeable and easily accessible inner and outer electrodes that concentrically nest within an outer housing of one or more plasma reformers. The inner and outer electrodes have self-centering features that allow for blind-fitting of the interchangeable inner and outer electrodes during electrode replacement and maintenance. A plurality of reformers that generate different types of plasmas are preferably arranged serially to allow for a mixture of separate plasmas within the same reaction area and to increase utilization of short-lived radicals.
Claims
exact text as granted — not AI-modifiedWhat is claimed is:
1. A modular plasma treatment system, comprising:
a first outer housing of a first plasma reformer having a first exhaust an inlet for receiving a first input gaseous stream and a first exhaust outlet for expelling a first output gaseous stream, wherein the first outer housing comprises;
a first plasma reformer situated within the first outer housing, and having a first outer electrode and a first inner electrode configured to produce a rotating glide arc plasma within a first housing inner receiving chamber;
a first outer electrode sized and dimensioned to abut first housing portions of the first housing inner receiving chamber such that the first outer electrode does not substantially move when set in place within the first housing inner receiving chamber, wherein the first outer electrode comprises a first electrode inner receiving chamber;
a second outer electrode sized and dimensioned to abut the first housing portions of the first housing inner receiving chamber such that the second outer electrode does not substantially move when set in place within the first housing inner receiving chamber, wherein the second outer electrode comprises a second electrode inner receiving chamber plasma reformer having a second outer electrode and a second inner electrode configured to produce a dielectric barrier discharge (DBD) plasma wherein the first and second plasma reformers are disposed serially such that the first inner and outer electrodes are configured to be coupled to the second inner and outer electrodes by a common reaction zone, and wherein at least two plasmas are present in the common reaction zone
a first inner electrode sized and dimensioned to abut first electrode portions of the first electrode inner receiving chamber such that the first inner electrode does not substantially move when set in place within the first electrode inner receiving chamber; and
a second inner electrode sized and dimensioned to abut second electrode portions of the second electrode inner receiving chamber such that the second inner electrode does not substantially move when set in place within the second electrode inner receiving chamber.
2. The modular plasma treatment system of claim 1 , wherein the first housing inner receiving chamber and a first exterior portion of the first outer electrode comprise self-centering features that center the first outer electrode with respect to the first outer housing as the first outer electrode is set in place within the first housing inner receiving chamber.
3. The modular plasma treatment system of claim 2 , wherein the self-centering features comprise a tapered wall of the first housing inner receiving chamber that centers the first and second outer electrodes when either is set in place within the first housing inner receiving chamber.
4. The modular plasma treatment system of claim 2 , wherein the self-centering features comprise a tapered exterior cross-section of the first outer electrode that widens against the first housing portions of the first housing inner receiving chamber as the first outer electrode is set in place within the first housing inner receiving chamber.
5. The modular plasma treatment system of claim 1 , wherein the first electrode housing inner receiving chamber and a first exterior portion of the first inner electrode comprise self-centering features that center the first inner electrode with respect to the first inner electrode housing inner receiving chamber as the first inner electrode is set in place within the first inner electrode housing inner receiving chamber.
6. The modular plasma treatment system of claim 5 , wherein the self-centering features comprise a tapered wall of the first electrode housing inner receiving chamber that centers the first inner electrode when the first inner electrode is set in place within the first electrode housing inner receiving chamber.
7. The modular plasma treatment system of claim 5 , wherein the self-centering features comprise a tapered exterior cross-section of the first inner electrode that widens against the first electrode portions of the first electrode housing inner receiving chamber as the first inner electrode is set in place within the first electrode housing inner receiving chamber.
8. The modular plasma treatment system of claim 1 , wherein the first outer electrode and the first inner electrode, when set in place within the first housing inner receiving chamber, are configured to provide a first plasma gap for a first plasma the rotating glide arc plasma; and wherein the second outer electrode and the second inner electrode, when set in place within the first housing inner receiving chamber, are configured to provide a second plasma gap for a second plasma different from the first the DBD plasma.
9. The modular plasma treatment system of claim 1 , wherein the first plasma reformer comprises a dielectric barrier discharge plasma reformer to generate a dielectric barrier discharge plasma.
10. The modular plasma treatment system of claim 9 1 , wherein the first outer electrode comprises interior conductive formertions projections to generate electric field gradients between points of the interior conductive projections.
11. The modular plasma treatment system of claim 10 , wherein the interior conductive projections comprise conductive screw tips screwed into holes of the first outer electrode.
12. The modular plasma treatment system of claim 10 , wherein at least two of the interior conductive projections comprise different dimensions from one another to provide different electric field gradients to precipitate particulate matter having different properties.
13. The modular plasma treatment system of claim 9 1 , wherein the first exhaust inlet comprises surface features that alter air pressure within an excitation chamber of the first plasma reformer the first housing inner receiving chamber to direct the first input gaseous stream in a cyclone motion to points of highest energy density inside the excitation chamber first housing inner receiving chamber.
14. The modular plasma treatment system of claim 13 ,
wherein the first plasma reformer comprises a rotating glide arc reformer and the second plasma reformer comprises a DBD plasma reformer, at least one of the first outer electrode and the first inner electrode rotate a textured surface to direct the first input gaseous stream in a cyclone motion to points of highest energy density inside an excitation chamber of the rotating glide arc reformer.
15. The modular plasma treatment system of claim 14 1 , further comprising coaxial electrodes that discharge into each of the rotating glide-arc plasma and the DBD plasma.
16. The modular plasma treatment system of claim 1 , further comprising:
a second outer housing of a second plasma reformer having a second exhaust inlet for receiving a second input gaseous stream and a second exhaust outlet for expelling a second output gaseous stream, wherein the second outer housing comprises a second housing inner receiving chamber; a third outer electrode sized and dimensioned to abut second housing portions of the second housing inner receiving chamber such that the third outer electrode does not substantially move when set in place within the second housing inner receiving chamber, wherein the third outer electrode comprises a third electrode inner receiving chamber; a fourth outer electrode sized and dimensioned to abut the second housing portions of the second housing inner receiving chamber such that the fourth outer electrode does not substantially move when set in place within the second housing inner receiving chamber, wherein the fourth outer electrode comprises a fourth electrode inner receiving chamber; a third inner electrode sized and dimensioned to abut third electrode portions of the third electrode inner receiving chamber such that the third inner electrode does not substantially move when set in place within the third electrode inner receiving chamber; and a fourth inner electrode sized and dimensioned to abut fourth electrode portions of the fourth electrode inner receiving chamber such that the fourth inner electrode does not substantially move when set in place within the fourth electrode inner receiving chamber,
wherein the first output gaseous stream feeds the second input gaseous stream.
17. The modular plasma treatment system of claim 16 , wherein the rotating glide arc reformer generates a glide-arc plasma and the DBD plasma reformer generates a DBD plasma.
18. The modular plasma treatment system of claim 17 1 , further comprising a magnetic field generator that generates a magnetic field around the co-axial electrodes.
19. The modular plasma treatment system of claim 18 , wherein the first outer housing of the first plasma reformer is disposed above a particulate filter expelling the first output gaseous stream to transfer waste heat from the first output gaseous stream to an oxidant conduit.
20. The modular plasma treatment system of claim 19 , wherein the an air source comprises at least one of a blower and an on-board turbocharger.
21. The modular plasma treatment system of claim 1 , wherein the plasma treatment system oxidizes particulate matter in a the common reaction zone between the first inner electrode and the first outer electrode.
22. The modular plasma treatment system of claim 21 1 , wherein the an air dryer uses a desiccant to remove water vapor from the intake air.
23. The modular plasma treatment system of claim 1 , further comprising an air drier that receives intake air from an air source and outputs dried air, wherein the first exhaust inlet receives the dried air and outputs oxidants to the first output gaseous stream.
24. The modular plasma treatment system of claim 1 , further comprising a voltage transformer integrated with a feedthrough of the first plasma reformer to deliver power from the voltage power transformer to the first outer electrode and the first inner electrode.
25. The modular plasma treatment system of claim 1 , further comprising a fuel injector that injects a fuel into the first input gaseous stream.
26. The modular plasma treatment system of claim 25 , wherein the first plasma reformer comprises at least one of a DBD reformer and a rotating glide-arc reformer.
27. The modular plasma treatment system of claim 1 , further comprising a microwave generator that generates microwaves directed towards the first outer housing.
28. A plasma system comprising:
a plasma reformer having an inlet fluidly coupled to a receiving chamber; a first reformer comprising a first outer electrode arranged serially to the receiving chamber, wherein the first outer electrode comprises a first electrode receiving chamber; a second reformer comprising a second outer electrode arranged serially to the receiving chamber, wherein the second outer electrode comprises a second electrode receiving chamber; a first inner electrode at least partially within the first electrode receiving chamber, and configured to cooperate with the first outer electrode to produce a first plasma; and a second inner electrode at least partially within the second electrode receiving chamber, and configured to cooperate with the second outer electrode to produce a second plasma different from the first plasma; and the first and second reformers disposed serially to one another such that the first inner and outer electrodes are configured to be coupled to the second inner and outer electrodes by a common reaction zone, and wherein at least two plasmas are present in the common reaction zone.
29. The plasma system of claim 28 , wherein each of the receiving chamber and an exterior portion of the first outer electrode comprise self-centering features that center the first outer electrode with respect to the receiving chamber.
30. The plasma system of claim 29 , wherein the self-centering features comprise a tapered wall of the receiving chamber.
31. The plasma system of claim 29 , wherein the self-centering features comprise a tapered exterior cross-section of the first outer electrode that widens against the receiving chamber.
32. The plasma system of claim 28 , wherein each of the first electrode receiving chamber and the first inner electrode comprise self-centering features that center the first inner electrode with respect to the first electrode receiving chamber.
33. The plasma system of claim 32 , wherein the self-centering features comprise a tapered wall of the first electrode inner receiving chamber.
34. The plasma system of claim 32 , wherein the self-centering features comprise a tapered exterior cross-section of the first inner electrode that widens against the first electrode receiving chamber.
35. The plasma system of claim 28 , wherein the first outer electrode and the first inner electrode are oriented to provide a first plasma gap for the first plasma, and wherein the second outer electrode and the second inner electrode are oriented to provide a second plasma gap for the second plasma.
36. The plasma system of claim 28 , wherein the first reformer comprises a dielectric barrier discharge plasma reformer.
37. The plasma system of claim 36 , wherein the first outer electrode comprises interior conductive projections.
38. The plasma system of claim 37 , wherein the interior conductive projections comprise conductive screw tips screwed into holes of the first outer electrode.
39. The plasma system of claim 37 , wherein at least two of the interior conductive projections comprise different dimensions from one another to provide different electric field gradients.
40. The plasma system of claim 28 , wherein the inlet is configured to receive a gaseous stream, the inlet having surface features that alter air pressure within the common reaction zone to direct the gaseous stream in a cyclone motion.
41. The plasma system of claim 28 , further comprising:
a third reformer arranged serially to the second reformer, having a third outer electrode and a third inner electrode at least partially within a third electrode receiving chamber; and an outlet directing an output gaseous stream from the common reaction zone to an inlet of the third reformer.
42. The plasma system of claim 28 , wherein the first reformer comprises a rotating glide arc reformer, and the second reformer comprises a DBD plasma reformer, and wherein at least one of the first outer electrode and the first inner electrode have a textured surface directing an input gaseous stream in the first reformer in a cyclone motion.
43. The plasma system of claim 42 , wherein the rotating glide arc reformer generates a glide-arc plasma and the DBD plasma reformer generates a DBD plasma.
44. The plasma system of claim 42 , wherein the first and second outer electrodes are co-axial.
45. The plasma system of claim 44 , further comprising a magnetic field generator that generates a magnetic field around the co-axial electrodes.
46. The plasma system of claim 28 , wherein the plasma system oxidizes particulate matter in the common reaction zone.
47. The plasma system of claim 46 , wherein the plasma reformer is disposed above a particulate filter.
48. The plasma system of claim 28 , further comprising an air drier that receives intake air from an air source and outputs dried air, wherein the inlet of the plasma reformer receives the dried air.
49. The plasma system of claim 28 , further comprising a voltage transformer integrated with a feedthrough of the plasma reformer to deliver power from the voltage transformer to the first outer electrode and the first inner electrode.
50. The plasma system of claim 28 , wherein the first outer electrode is grounded to the plasma reformer.
51. The plasma system of claim 28 , wherein the first inner electrode does not move with respect to the first outer electrode.
52. The plasma system of claim 28 , wherein the first outer electrode is disposed with a housing, wherein the first inner electrode is slidable with respect to the first outer electrode.
53. A plasma system, comprising:
a first reaction zone comprising first and second co-axial electrodes, wherein the second electrode is nested within the first electrode; a second reaction zone comprising third and fourth co-axial electrodes; the first and second reaction zones disposed serially to one another such that the first or second co-axial electrode is configured to be coupled to the third or fourth co-axial electrode by a common reaction zone; and a microwave guide directed toward at least a portion of one or more of the first reaction zone, the second reaction zone, and the common reaction zone.
54. The plasma system of claim 53 , wherein the first reaction zone generates a dielectric barrier discharge plasma and the second reaction zone generates a glide-arc plasma.
55. The plasma system of claim 54 , wherein the first reaction zone is upstream in a flow path from the second reaction zone.
56. The plasma system of claim 53 , wherein the first reaction zone and second reaction zone are coextensive.
57. The plasma system of claim 53 , wherein the first reaction zone is separated from the second reaction zone.
58. The plasma system of claim 53 , wherein the microwave guide is directed at a portion of the first reaction zone.
59. The plasma system of claim 53 , wherein the microwave guide is directed between the first and third electrodes.
60. The plasma system of claim 53 , wherein the microwave guide is directed at the flow path downstream of the first reaction zone.
61. A plasma reformer, comprising:
a receiving chamber; a first outer electrode arranged serially to the receiving chamber, a first inner electrode cooperatively coupled with the first outer electrode to produce a first plasma within a first electrode receiving chamber, wherein the first inner electrode is nested within the first outer electrode; a second outer electrode arranged serially to the receiving chamber, a second inner electrode cooperatively coupled with the second outer electrode to produce a second plasma within a second electrode receiving chamber, the second plasma different from the first plasma; the first and second receiving chambers disposed serially to one another such that at least one of the first outer electrode or the first inner electrode is configured to be coupled to at least one of the second outer electrode or the second inner electrode by a common reaction zone; and a microwave generator that is configured to generate microwaves directed towards the plasma reformer.
62. The plasma reformer of claim 61 , wherein, in use, the generated microwaves are directed toward an inlet of the plasma reformer.
63. The plasma reformer of claim 61 , wherein, in use, the generated microwaves are directed toward an outlet of the plasma reformer.
64. The plasma reformer of claim 61 , wherein, in use, the generated microwaves are directed toward the common reaction zone.
65. The plasma reformer of claim 61 , further comprising a waveguide coupled to the microwave generator.
66. The plasma reformer of claim 65 , wherein the waveguide is configured to direct the generated microwaves toward the plasma reformer.Cited by (0)
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