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ASM JAPAN
JP159 patents
Top patents by PatentIndex Score
US9171716B2Oct 27, 2015
Method of forming metal oxide hardmask
ASM JAPAN531 citations99
US8041450B2Oct 18, 2011
Position sensor system for substrate transfer robot
ASM JAPAN531 citations99
US8003174B2Aug 23, 2011
Method for forming dielectric film using siloxane-silazane mixture
ASM JAPAN521 citations99
USD643055SAug 9, 2011
Heater block for use in a semiconductor processing tool
ASM JAPAN524 citations99
US7972980B2Jul 5, 2011
Method of forming conformal dielectric film having Si-N bonds by PECVD
ASM JAPAN563 citations99
US7955650B2Jun 7, 2011
Method for forming dielectric film using porogen gas
ASM JAPAN464 citations99
US7919416B2Apr 5, 2011
Method of forming conformal dielectric film having Si-N bonds by PECVD
ASM JAPAN598 citations99
US7842622B1Nov 30, 2010
Method of forming highly conformal amorphous carbon layer
ASM JAPAN524 citations99
US7807566B2Oct 5, 2010
Method for forming dielectric SiOCH film having chemical stability
ASM JAPAN464 citations99
US7781352B2Aug 24, 2010
Method for forming inorganic silazane-based dielectric film
ASM JAPAN480 citations99
US7651959B2Jan 26, 2010
Method for forming silazane-based dielectric film
ASM JAPAN589 citations99
US7622369B1Nov 24, 2009
Device isolation technology on semiconductor substrate
ASM JAPAN604 citations99
US7618226B2Nov 17, 2009
Semiconductor substrate transfer apparatus and semiconductor substrate processing apparatus equipped with the same
ASM JAPAN538 citations99
US7021881B2Apr 4, 2006
Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections
ASM JAPAN545 citations99
US6955741B2Oct 18, 2005
Semiconductor-processing reaction chamber
ASM JAPAN380 citations99
US6899507B2May 31, 2005
Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections
ASM JAPAN561 citations99
US6662817B2Dec 16, 2003
Gas-line system for semiconductor-manufacturing apparatus
ASM JAPAN496 citations99
US6630413B2Oct 7, 2003
CVD syntheses of silicon nitride materials
ASM JAPAN162 citations99
US6458718B1Oct 1, 2002
Fluorine-containing materials and processes
ASM JAPAN275 citations99
US6455445B2Sep 24, 2002
Silicone polymer insulation film on semiconductor substrate and method for forming the film
ASM JAPAN645 citations99
US6435798B1Aug 20, 2002
Semiconductor processing apparatus with substrate-supporting mechanism
ASM JAPAN641 citations99
US6410463B1Jun 25, 2002
Method for forming film with low dielectric constant on semiconductor substrate
ASM JAPAN615 citations99
US6159301ADec 12, 2000
Substrate holding apparatus for processing semiconductor
ASM JAPAN303 citations99
US7963736B2Jun 21, 2011
Wafer processing apparatus with wafer alignment device
ASM JAPAN539 citations98
US7825040B1Nov 2, 2010
Method for depositing flowable material using alkoxysilane or aminosilane precursor
ASM JAPAN545 citations98
US7789965B2Sep 7, 2010
Method of cleaning UV irradiation chamber
ASM JAPAN527 citations98
US7763869B2Jul 27, 2010
UV light irradiating apparatus with liquid filter
ASM JAPAN507 citations98
US7632549B2Dec 15, 2009
Method of forming a high transparent carbon film
ASM JAPAN520 citations98
US7582575B2Sep 1, 2009
Method for forming insulation film
ASM JAPAN467 citations98
US7501292B2Mar 10, 2009
Method for managing UV irradiation for curing semiconductor substrate
ASM JAPAN525 citations98
US7425350B2Sep 16, 2008
Apparatus, precursors and deposition methods for silicon-containing materials
ASM JAPAN88 citations98
US7408225B2Aug 5, 2008
Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms
ASM JAPAN406 citations98
US7354873B2Apr 8, 2008
Method for forming insulation film
ASM JAPAN479 citations98
US7273526B2Sep 25, 2007
Thin-film deposition apparatus
ASM JAPAN90 citations98
US7234476B2Jun 26, 2007
Method of cleaning CVD equipment processing chamber
ASM JAPAN523 citations98
US6949456B2Sep 27, 2005
Method for manufacturing semiconductor device having porous structure with air-gaps
ASM JAPAN89 citations98
US6921556B2Jul 26, 2005
Method of film deposition using single-wafer-processing type CVD
ASM JAPAN256 citations98
US6432846B1Aug 13, 2002
Silicone polymer insulation film on semiconductor substrate and method for forming the film
ASM JAPAN125 citations98
US6383955B1May 7, 2002
Silicone polymer insulation film on semiconductor substrate and method for forming the film
ASM JAPAN857 citations98
US6352945B1Mar 5, 2002
Silicone polymer insulation film on semiconductor substrate and method for forming the film
ASM JAPAN718 citations98
US6187691B1Feb 13, 2001
Method of forming film on semiconductor substrate in film-forming apparatus
ASM JAPAN538 citations98
US7833353B2Nov 16, 2010
Liquid material vaporization apparatus for semiconductor processing apparatus
ASM JAPAN562 citations97
US7712435B2May 11, 2010
Plasma processing apparatus with insulated gas inlet pore
ASM JAPAN426 citations97
US7691205B2Apr 6, 2010
Substrate-supporting device
ASM JAPAN521 citations97
US7690881B2Apr 6, 2010
Substrate-processing apparatus with buffer mechanism and substrate-transferring apparatus
ASM JAPAN523 citations97
US7504344B2Mar 17, 2009
Method of forming a carbon polymer film using plasma CVD
ASM JAPAN419 citations97
US7064088B2Jun 20, 2006
Method for forming low-k hard film
ASM JAPAN62 citations96
US6740602B1May 25, 2004
Method of forming low-dielectric constant film on semiconductor substrate by plasma reaction using high-RF power
ASM JAPAN65 citations96
US6631692B1Oct 14, 2003
Plasma CVD film-forming device
ASM JAPAN73 citations96
US6559520B2May 6, 2003
Siloxan polymer film on semiconductor substrate
ASM JAPAN87 citations96
Showing the top 50 of 159 patents by PatentIndex Score.