Assignee
CHANG CHING-YU
TW·21 granted patents·5 pending applications·517 citations·filing 2003–2012
Top patents by PatentIndex Score
26 records- 0199US9256133B2Apparatus and method for developing processCHANG CHING-YU·Filed 2012·Granted Feb 9, 2016·169 cites·19 claims
- 0299US9213234B2Photosensitive material and method of lithographyCHANG CHING-YU·Filed 2012·Granted Dec 15, 2015·169 cites·8 claims
- 0399US8841058B2Photolithography material for immersion lithography processesCHANG CHING-YU·Filed 2010·Granted Sep 23, 2014·49 cites·9 claims
- 0497US8415091B2Water mark defect prevention for immersion lithographyCHANG CHING-YU·Filed 2011·Granted Apr 9, 2013·14 cites·12 claims
- 0597US8202680B2TARC material for immersion watermark reductionCHANG CHING-YU·Filed 2011·Granted Jun 19, 2012·16 cites·20 claims
- 0696US8518628B2Surface switchable photoresistCHANG CHING-YU·Filed 2006·Granted Aug 27, 2013·34 cites·8 claims
- 0794US8658532B2Method and material for forming a double exposure lithography patternCHANG CHING-YU·Filed 2012·Granted Feb 25, 2014·12 cites·20 claims
- 0894US8564759B2Apparatus and method for immersion lithographyCHANG CHING-YU·Filed 2007·Granted Oct 22, 2013·20 cites·20 claims
- 0983US8222149B2Method for photoresist pattern removalCHANG CHING-YU·Filed 2009·Granted Jul 17, 2012·7 cites·21 claims
- 1082US8258056B2Method and material for forming a double exposure lithography patternCHANG CHING-YU·Filed 2010·Granted Sep 4, 2012·4 cites·20 claims
- 1181US9261786B2Photosensitive material and method of photolithographyCHANG CHING-YU·Filed 2012·Granted Feb 16, 2016·3 cites·13 claims
- 1281US8153350B2Method and material for forming high etch resistant double exposure patternsCHANG CHING-YU·Filed 2008·Granted Apr 10, 2012·5 cites·30 claims
- 1380US8178287B2Photoresist composition and method of forming a resist patternCHANG CHING-YU·Filed 2007·Granted May 15, 2012·5 cites·18 claims
- 1475US8597870B2TARC material for immersion watermark reductionCHANG CHING-YU·Filed 2012·Granted Dec 3, 2013·1 cites·20 claims
- 1574US8125611B2Apparatus and method for immersion lithographyCHANG CHING-YU·Filed 2007·Granted Feb 28, 2012·3 cites·20 claims
- 1668US8183162B2Method of forming a sacrificial layerCHANG CHING-YU·Filed 2009·Granted May 22, 2012·2 cites·20 claims
- 1767US8163655B2Method for forming a sacrificial sandwich structureCHANG CHING-YU·Filed 2009·Granted Apr 24, 2012·3 cites·21 claims
- 1852US9122164B2Lithography material and lithography processCHANG CHING-YU·Filed 2011·Granted Sep 1, 2015·0 cites·16 claims
- 1948US8137895B2Structure and method for improving photoresist pattern adhesionCHANG CHING-YU·Filed 2006·Granted Mar 20, 2012·0 cites·20 claims
- 2048US8101340B2Method of inhibiting photoresist pattern collapseCHANG CHING-YU·Filed 2007·Granted Jan 24, 2012·0 cites·20 claims
- 2145US7094662B2Overlay mark and method of fabricating the sameCHANG CHING-YU·Filed 2004·Granted Aug 22, 2006·1 cites·12 claims
- 2243US2014017615A1Apparatus and method for resist coating and developingCHANG CHING-YU·Filed 2012·Application pending·0 cites
- 2340US2005250054A1Development of photolithographic masks for semiconductorsCHANG CHING-YU·Filed 2004·Application pending·0 cites
- 2439US2012108040A1Vaporizing polymer spray deposition systemCHANG CHING-YU·Filed 2010·Application pending·0 cites
- 2539US2004197710A1Method for defining ring patternCHANG CHING-YU·Filed 2003·Application pending·0 cites
- 2638US2004121537A1[mask rom structure and manufacturing method thereof]CHANG CHING-YU·Filed 2004·Application pending·0 cites
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