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D2S INC
US101 patents
Top patents by PatentIndex Score
US7901850B2Mar 8, 2011
Method and system for design of a reticle to be manufactured using variable shaped beam lithography
D2S INC76 citations99
US7754401B2Jul 13, 2010
Method for manufacturing a surface and integrated circuit using variable shaped beam lithography
D2S INC76 citations98
US8039176B2Oct 18, 2011
Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography
D2S INC33 citations96
US7759027B2Jul 20, 2010
Method and system for design of a reticle to be manufactured using character projection lithography
D2S INC48 citations94
US8900778B2Dec 2, 2014
Method for forming circular patterns on a surface
D2S INC18 citations93
US8828628B2Sep 9, 2014
Method and system for design of a reticle to be manufactured using variable shaped beam lithography
D2S INC21 citations93
US8354207B2Jan 15, 2013
Method, device, and system for forming circular patterns on a surface
D2S INC21 citations93
US7799489B2Sep 21, 2010
Method for design and manufacture of a reticle using variable shaped beam lithography
D2S INC33 citations93
US9043734B2May 26, 2015
Method and system for forming high accuracy patterns using charged particle beam lithography
D2S INC13 citations92
US8017289B2Sep 13, 2011
Method for manufacturing a surface and integrated circuit using variable shaped beam lithography
D2S INC16 citations92
US7759026B2Jul 20, 2010
Method and system for manufacturing a reticle using character projection particle beam lithography
D2S INC25 citations92
US7745078B2Jun 29, 2010
Method and system for manufacturing a reticle using character projection lithography
D2S INC17 citations92
US7579606B2Aug 25, 2009
Method and system for logic design for cell projection particle beam lithography
D2S INC19 citations92
US8719739B2May 6, 2014
Method and system for forming patterns using charged particle beam lithography
D2S INC22 citations90
US7747977B1Jun 29, 2010
Method and system for stencil design for particle beam writing
D2S INC19 citations90
US11301610B2Apr 12, 2022
Methods for modeling of a design in reticle enhancement technology
D2S INC6 citations85
US10909294B2Feb 2, 2021
Modeling of a design in reticle enhancement technology
D2S INC8 citations84
US10657213B2May 19, 2020
Modeling of a design in reticle enhancement technology
D2S INC10 citations84
US10444629B2Oct 15, 2019
Bias correction for lithography
D2S INC11 citations84
US9715169B2Jul 25, 2017
Method and system for forming a pattern on a reticle using charged particle beam lithography
D2S INC7 citations84
US9625809B2Apr 18, 2017
Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
D2S INC5 citations84
US9372391B2Jun 21, 2016
Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
D2S INC10 citations84
US9343267B2May 17, 2016
Method and system for dimensional uniformity using charged particle beam lithography
D2S INC12 citations84
US9341936B2May 17, 2016
Method and system for forming a pattern on a reticle using charged particle beam lithography
D2S INC9 citations84
US9323140B2Apr 26, 2016
Method and system for forming a pattern on a reticle using charged particle beam lithography
D2S INC8 citations84
US9274412B2Mar 1, 2016
Method and system for design of a reticle to be manufactured using variable shaped beam lithography
D2S INC3 citations84
US9268900B1Feb 23, 2016
Lithography mask functional optimization and spatial frequency analysis
D2S INC5 citations84
US8916315B2Dec 23, 2014
Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
D2S INC5 citations84
US8017286B2Sep 13, 2011
Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography
D2S INC12 citations84
US8017288B2Sep 13, 2011
Method for fracturing circular patterns and for manufacturing a semiconductor device
D2S INC11 citations84
US7985514B2Jul 26, 2011
Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shots
D2S INC12 citations84
US7772575B2Aug 10, 2010
Stencil design and method for cell projection particle beam lithography
D2S INC10 citations84
US11062878B2Jul 13, 2021
Method and system for determining a charged particle beam exposure for a local pattern density
D2S INC5 citations83
US10748744B1Aug 18, 2020
Method and system for determining a charged particle beam exposure for a local pattern density
D2S INC5 citations83
US9038003B2May 19, 2015
Method and system for critical dimension uniformity using charged particle beam lithography
D2S INC12 citations83
US9400857B2Jul 26, 2016
Method and system for forming patterns using charged particle beam lithography
D2S INC5 citations81
US12019973B2Jun 25, 2024
Method for reticle enhancement technology of a design pattern to be manufactured on a substrate
D2S INC3 citations74
US8512919B2Aug 20, 2013
Method and system for design of a reticle to be manufactured using variable shaped beam lithography
D2S INC4 citations74
US11783110B2Oct 10, 2023
Method for reticle enhancement technology of a design pattern to be manufactured on a substrate
D2S INC3 citations73
US9859100B2Jan 2, 2018
Method and system for dimensional uniformity using charged particle beam lithography
D2S INC3 citations73
US10460071B2Oct 29, 2019
Shaped beam lithography including temperature effects
D2S INC4 citations72
US9612530B2Apr 4, 2017
Method and system for design of enhanced edge slope patterns for charged particle beam lithography
D2S INC4 citations72
US8959463B2Feb 17, 2015
Method and system for dimensional uniformity using charged particle beam lithography
D2S INC5 citations72
US11756765B2Sep 12, 2023
Method and system for determining a charged particle beam exposure for a local pattern density
D2S INC2 citations71
US10031413B2Jul 24, 2018
Method and system for forming patterns using charged particle beam lithography
D2S INC3 citations70
US10317790B2Jun 11, 2019
Sub-resolution assist features in semiconductor pattern writing
D2S INC2 citations64
US12541634B2Feb 3, 2026
Routing non-preferred direction wiring layers of an integrated circuit by minimizing vias between these layers
D2S INC0 citations63
US10290467B2May 14, 2019
Method and system for forming a pattern on a surface using multi-beam charged particle beam lithography
D2S INC1 citations63
US9268214B2Feb 23, 2016
Method for forming circular patterns on a surface
D2S INC1 citations63
US8612901B2Dec 17, 2013
Method and system for forming patterns using charged particle beam lithography with multiple exposure passes
D2S INC1 citations63
Showing the top 50 of 101 patents by PatentIndex Score.