Assignee
D2S INC
US·101 granted patents·57 pending applications·679 citations·filing 2005–2025
Top patents by PatentIndex Score
158 records- 0198US11301610B2Methods for modeling of a design in reticle enhancement technologyD2S INC·Filed 2021·Granted Apr 12, 2022·6 cites·12 claims
- 0298US10909294B2Modeling of a design in reticle enhancement technologyD2S INC·Filed 2020·Granted Feb 2, 2021·8 cites·14 claims
- 0398US9372391B2Method and system for forming patterns using charged particle beam lithography with variable pattern dosageD2S INC·Filed 2015·Granted Jun 21, 2016·10 cites·25 claims
- 0498US8828628B2Method and system for design of a reticle to be manufactured using variable shaped beam lithographyD2S INC·Filed 2013·Granted Sep 9, 2014·21 cites·21 claims
- 0598US7901850B2Method and system for design of a reticle to be manufactured using variable shaped beam lithographyD2S INC·Filed 2009·Granted Mar 8, 2011·76 cites·25 claims
- 0698US7754401B2Method for manufacturing a surface and integrated circuit using variable shaped beam lithographyD2S INC·Filed 2009·Granted Jul 13, 2010·76 cites·25 claims
- 0797US12019973B2Method for reticle enhancement technology of a design pattern to be manufactured on a substrateD2S INC·Filed 2023·Granted Jun 25, 2024·3 cites·17 claims
- 0896US11062878B2Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2020·Granted Jul 13, 2021·5 cites·15 claims
- 0996US8354207B2Method, device, and system for forming circular patterns on a surfaceD2S INC·Filed 2011·Granted Jan 15, 2013·21 cites·22 claims
- 1096US8017289B2Method for manufacturing a surface and integrated circuit using variable shaped beam lithographyD2S INC·Filed 2011·Granted Sep 13, 2011·16 cites·25 claims
- 1196US7759026B2Method and system for manufacturing a reticle using character projection particle beam lithographyD2S INC·Filed 2008·Granted Jul 20, 2010·25 cites·16 claims
- 1296US7759027B2Method and system for design of a reticle to be manufactured using character projection lithographyD2S INC·Filed 2008·Granted Jul 20, 2010·48 cites·20 claims
- 1395US11783110B2Method for reticle enhancement technology of a design pattern to be manufactured on a substrateD2S INC·Filed 2021·Granted Oct 10, 2023·3 cites·5 claims
- 1495US10444629B2Bias correction for lithographyD2S INC·Filed 2017·Granted Oct 15, 2019·11 cites·12 claims
- 1595US8900778B2Method for forming circular patterns on a surfaceD2S INC·Filed 2013·Granted Dec 2, 2014·18 cites·12 claims
- 1695US8719739B2Method and system for forming patterns using charged particle beam lithographyD2S INC·Filed 2013·Granted May 6, 2014·22 cites·33 claims
- 1795US8039176B2Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithographyD2S INC·Filed 2009·Granted Oct 18, 2011·33 cites·25 claims
- 1894US9038003B2Method and system for critical dimension uniformity using charged particle beam lithographyD2S INC·Filed 2013·Granted May 19, 2015·12 cites·29 claims
- 1994US7799489B2Method for design and manufacture of a reticle using variable shaped beam lithographyD2S INC·Filed 2009·Granted Sep 21, 2010·33 cites·25 claims
- 2094US7745078B2Method and system for manufacturing a reticle using character projection lithographyD2S INC·Filed 2008·Granted Jun 29, 2010·17 cites·9 claims
- 2193US10657213B2Modeling of a design in reticle enhancement technologyD2S INC·Filed 2017·Granted May 19, 2020·10 cites·19 claims
- 2293US9715169B2Method and system for forming a pattern on a reticle using charged particle beam lithographyD2S INC·Filed 2016·Granted Jul 25, 2017·7 cites·6 claims
- 2393US9343267B2Method and system for dimensional uniformity using charged particle beam lithographyD2S INC·Filed 2014·Granted May 17, 2016·12 cites·13 claims
- 2493US7747977B1Method and system for stencil design for particle beam writingD2S INC·Filed 2005·Granted Jun 29, 2010·19 cites·12 claims
- 2593US7579606B2Method and system for logic design for cell projection particle beam lithographyD2S INC·Filed 2006·Granted Aug 25, 2009·19 cites·61 claims
- 2692US9625809B2Method and system for forming patterns using charged particle beam lithography with variable pattern dosageD2S INC·Filed 2016·Granted Apr 18, 2017·5 cites·18 claims
- 2792US8916315B2Method for fracturing and forming a pattern using shaped beam charged particle beam lithographyD2S INC·Filed 2013·Granted Dec 23, 2014·5 cites·25 claims
- 2892US2025363280A1Methods for modeling of a design in reticle enhancement technologyD2S INC·Filed 2025·Application pending·0 cites
- 2991US11756765B2Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2021·Granted Sep 12, 2023·2 cites·16 claims
- 3091US9043734B2Method and system for forming high accuracy patterns using charged particle beam lithographyD2S INC·Filed 2013·Granted May 26, 2015·13 cites·8 claims
- 3191US2025371241A1Computing parasitic values for semiconductor designsD2S INC·Filed 2025·Application pending·0 cites
- 3290US10748744B1Method and system for determining a charged particle beam exposure for a local pattern densityD2S INC·Filed 2019·Granted Aug 18, 2020·5 cites·14 claims
- 3390US9274412B2Method and system for design of a reticle to be manufactured using variable shaped beam lithographyD2S INC·Filed 2014·Granted Mar 1, 2016·3 cites·21 claims
- 3489US12412017B2Methods for modeling of a design in reticle enhancement technologyD2S INC·Filed 2024·Granted Sep 9, 2025·0 cites·10 claims
- 3589US9612530B2Method and system for design of enhanced edge slope patterns for charged particle beam lithographyD2S INC·Filed 2016·Granted Apr 4, 2017·4 cites·16 claims
- 3689US9341936B2Method and system for forming a pattern on a reticle using charged particle beam lithographyD2S INC·Filed 2014·Granted May 17, 2016·9 cites·25 claims
- 3789US9323140B2Method and system for forming a pattern on a reticle using charged particle beam lithographyD2S INC·Filed 2014·Granted Apr 26, 2016·8 cites·26 claims
- 3889US8512919B2Method and system for design of a reticle to be manufactured using variable shaped beam lithographyD2S INC·Filed 2012·Granted Aug 20, 2013·4 cites·16 claims
- 3987US12340164B2Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrateD2S INC·Filed 2024·Granted Jun 24, 2025·0 cites·17 claims
- 4087US12248242B2Methods and systems for reticle enhancement technology of a design pattern to be manufactured on a substrateD2S INC·Filed 2024·Granted Mar 11, 2025·0 cites·20 claims
- 4187US9268900B1Lithography mask functional optimization and spatial frequency analysisD2S INC·Filed 2014·Granted Feb 23, 2016·5 cites·8 claims
- 4287US8017286B2Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithographyD2S INC·Filed 2009·Granted Sep 13, 2011·12 cites·11 claims
- 4386US9859100B2Method and system for dimensional uniformity using charged particle beam lithographyD2S INC·Filed 2016·Granted Jan 2, 2018·3 cites·12 claims
- 4486US7985514B2Method for fracturing a pattern for writing with a shaped charged particle beam writing system using dragged shotsD2S INC·Filed 2009·Granted Jul 26, 2011·12 cites·25 claims
- 4585US2025068058A1Iterative mask optimization biased towards critical regions of layoutD2S INC·Filed 2024·Application pending·0 cites
- 4685US2026073106A1Computing and displaying a predicted overlap shape in an ic design based on predicted manufacturing contoursD2S INC·Filed 2025·Application pending·0 cites
- 4785US2025068052A1Mask optimization for layer based on comparison of components in layer to components in other layersD2S INC·Filed 2024·Application pending·0 cites
- 4885US2025068051A1Mask optimization for first layer that accounts for other layersD2S INC·Filed 2024·Application pending·0 cites
- 4985US2025068053A1Mask optimization accounting for more critical and less critical overlap regionsD2S INC·Filed 2024·Application pending·0 cites
- 5085US2025068056A1Mask optimization for layer accounting for overlap with other layersD2S INC·Filed 2024·Application pending·0 cites
Showing the top 50 of 158 patent records by PatentIndex Score.
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