Assignee
DNF CO LTD
KR·23 granted patents·9 pending applications·32 citations·filing 2014–2025
Top patents by PatentIndex Score
32 records- 0193US9245740B2Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the sameDNF CO LTD·Filed 2014·Granted Jan 26, 2016·18 cites·3 claims
- 0287US11390635B2Composition for depositing silicon-containing thin film and method for producing silicon-containing thin film using the sameDNF CO LTD·Filed 2018·Granted Jul 19, 2022·3 cites·14 claims
- 0384US9809608B2Cyclodisilazane derivative, method for preparing the same and silicon-containing thin film using the sameDNF CO LTD·Filed 2015·Granted Nov 7, 2017·4 cites·12 claims
- 0482US9586979B2Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the sameDNF CO LTD·Filed 2014·Granted Mar 7, 2017·3 cites·6 claims
- 0570US10894799B2Composition for depositing silicon-containing thin film including disilylamine compound and method for manufacturing silicon-containing thin film using the sameDNF CO LTD·Filed 2018·Granted Jan 19, 2021·1 cites·13 claims
- 0669US11749522B2Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin using the sameDNF CO LTD·Filed 2022·Granted Sep 5, 2023·0 cites·7 claims
- 0765US12473647B2Composition for depositing antimony-containing thin film and method for manufacturing antimony-containing thin film using the sameDNF CO LTD·Filed 2022·Granted Nov 18, 2025·0 cites·14 claims
- 0865US10202407B2Trisilyl amine derivative, method for preparing the same and silicon-containing thin film using the sameDNF CO LTD·Filed 2015·Granted Feb 12, 2019·1 cites·12 claims
- 0965US9916974B2Amino-silyl amine compound and the manufacturing method of dielectric film containing Si—N bond by using atomic layer depositionDNF CO LTD·Filed 2015·Granted Mar 13, 2018·1 cites·16 claims
- 1063US12304924B2Silylcyclodisilazane compound and method for manufacturing silicon-containing thin film using the sameDNF CO LTD·Filed 2020·Granted May 20, 2025·0 cites·14 claims
- 1162US12384805B2Iodine-containing metal compound and composition for depositing thin film including the sameDNF CO LTD·Filed 2023·Granted Aug 12, 2025·0 cites·16 claims
- 1261US11319333B2Disilylamine compound, method for preparing the same, and composition for depositing silicon-containing thin film including the sameDNF CO LTD·Filed 2018·Granted May 3, 2022·0 cites·11 claims
- 1359US10214610B2Polymer and composition containing sameDNF CO LTD·Filed 2014·Granted Feb 26, 2019·1 cites·11 claims
- 1458US12518963B2Composition for depositing silicon-containing thin film and method for manufacturing silicon-containing thin film using the sameDNF CO LTD·Filed 2022·Granted Jan 6, 2026·0 cites·13 claims
- 1557US12459959B2Indium compound, method of producing the same, composition for depositing indium-containing thin film, and indium-containing thin filmDNF CO LTD·Filed 2022·Granted Nov 4, 2025·0 cites·12 claims
- 1656US11358974B2Silylamine compound, composition for depositing silicon-containing thin film containing the same, and method for manufacturing silicon-containing thin film using the compositionDNF CO LTD·Filed 2018·Granted Jun 14, 2022·0 cites·11 claims
- 1756US2025289834A1Silicon compound and method of producing silicon-containing thin film using the sameDNF CO LTD·Filed 2025·Application pending·0 cites
- 1854US11459653B2Method for manufacturing molybdenum-containing thin film and molybdenum-containing thin film manufactured therebyDNF CO LTD·Filed 2019·Granted Oct 4, 2022·0 cites·13 claims
- 1954US2025313483A1Method for preparing diiodosilaneDNF CO LTD·Filed 2025·Application pending·0 cites
- 2053US11393676B2Composition for depositing silicon-containing thin film containing bis(aminosilyl)alkylamine compound and method for manufacturing silicon-containing thin film using the sameDNF CO LTD·Filed 2018·Granted Jul 19, 2022·0 cites·14 claims
- 2153US10913755B2Transition metal compound, preparation method therefor, and composition for depositing transition metal-containing thin film, containing sameDNF CO LTD·Filed 2017·Granted Feb 9, 2021·0 cites·7 claims
- 2252US2025250462A1Silicon-bearing encapsulation film composition including silazane compound and method for manufacturing silicon-bearing encapsulation film using sameDNF CO LTD·Filed 2023·Application pending·0 cites
- 2351US12398459B2Silicon metal oxide encapsulation film comprising metal or metal oxide in thin film, and manufacturing method thereforDNF CO LTD·Filed 2020·Granted Aug 26, 2025·0 cites·15 claims
- 2451US11447859B2Metal triamine compound, method for preparing the same, and composition for depositing metal-containing thin film including the sameDNF CO LTD·Filed 2018·Granted Sep 20, 2022·0 cites·15 claims
- 2550US2020111665A1Composition for depositing silicon-containing thin film and method for manufacturing silicon-containing thin film using the sameDNF CO LTD·Filed 2018·Application pending·0 cites
- 2648US2025289833A1Cyclosilazane compound and method of producing silicon-containing thin film using the sameDNF CO LTD·Filed 2025·Application pending·0 cites
- 2746US2025215559A1Indium compound, indium-containing thin film deposition composition comprising same, and indium-containing thin film manufacturing methodDNF CO LTD·Filed 2023·Application pending·0 cites
- 2846US2025199396A1Method for manufacturing pellicle for forming metal silicide capping layer and pellicle manufactured therefromDNF CO LTD·Filed 2023·Application pending·0 cites
- 2944US11230492B2Anti-glare glass and manufacturing method thereforDNF CO LTD·Filed 2016·Granted Jan 25, 2022·0 cites·7 claims
- 3043US11827650B2Method of manufacturing ruthenium-containing thin film and ruthenium-containing thin film manufactured therefromDNF CO LTD·Filed 2018·Granted Nov 28, 2023·0 cites·6 claims
- 3136US2019249296A1Method for manufacturing silicon nitride thin film using plasma atomic layer depositionDNF CO LTD·Filed 2017·Application pending·0 cites
- 3235US2018230591A1Method for manufacturing silicon nitride thin film using plasma atomic layer deposition methodDNF CO LTD·Filed 2016·Application pending·0 cites
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