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FUJII KANA
JP6 patents
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US8647812B2Feb 11, 2014
Pattern forming method, chemical amplification resist composition and resist film
FUJII KANA5 citations71
US8877423B2Nov 4, 2014
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
FUJII KANA1 citations51
US9122151B2Sep 1, 2015
Resist composition, resist film therefrom and method of forming negative pattern using the composition
FUJII KANA1 citations50
US8795945B2Aug 5, 2014
Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
FUJII KANA1 citations49
US8642245B2Feb 4, 2014
Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same
FUJII KANA0 citations40
US8541161B2Sep 24, 2013
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method
FUJII KANA0 citations35