Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same

Abstract

An actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin that contains a repeating unit represented by formula (I) as defined in the specification, a repeating unit represented by formula (II) as defined in the specification and a repeating unit represented by formula (III-a) or (III-b) as defined in the specification; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and (C) a solvent, wherein the solvent (C) contains ethyl lactate, and a film and a pattern forming method using the composition are provided.

The invention claimed is: 
     
       1. An actinic ray-sensitive or radiation-sensitive resin composition, comprising:
 (A) a resin that contains a repeating unit represented by the following formula (I), a repeating unit represented by the following formula (II) and a repeating unit represented by the following formula (III-a); 
 (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and 
 (C) a solvent, 
 wherein the solvent (C) contains ethyl lactate: 
 
       
         
           
           
               
               
           
         
         wherein in formula (II), each of R 1  and R 2  independently represents a hydrogen atom, an alkyl group or a cycloalkyl group, and R 3  represents an alkyl group; and 
         in formula (III-a), each of R 1  and R 2  independently represents a hydrogen atom, an alkyl group or a cycloalkyl group, and R 4  represents a group containing a cycloalkyl group. 
       
     
     
       2. The actinic ray-sensitive or radiation-sensitive resin composition according to  claim 1 ,
 wherein in formula (II), either one of R 1  and R 2  is a hydrogen atom; and 
 in formula (III-a), either one of R 1  and R 2  is a hydrogen. 
 
     
     
       3. The actinic ray-sensitive or radiation-sensitive resin composition according to  claim 1 ,
 wherein the repeating unit represented by formula (III-a) is a repeating unit represented by the following formula (III-a′): 
 
       
         
           
           
               
               
           
         
         wherein in formula (III-a′), each of R 1  and R 2  independently represents a hydrogen atom, an alkyl group or a cycloalkyl group, R 7  represents a cycloalkyl group, and q represents an integer of 0 to 2. 
       
     
     
       4. The actinic ray-sensitive or radiation-sensitive resin composition according to  claim 1 ,
 wherein the ratio of the repeating unit represented by formula (III-a) is from 1 to 30 mol % based on all repeating units of the resin (A). 
 
     
     
       5. The actinic ray-sensitive or radiation-sensitive resin composition according to  claim 1 ,
 wherein the ratio of ethyl lactate is from 10 to 40 mass % based on the entire amount of the solvent (C). 
 
     
     
       6. The actinic ray-sensitive or radiation-sensitive resin composition according to  claim 1 ,
 wherein the compound (B) contains at least either one of a diazodisulfone compound and a sulfonium salt. 
 
     
     
       7. A film that is formed from the actinic ray-sensitive or radiation-sensitive resin composition according to  claim 1 . 
     
     
       8. A pattern forming method, comprising:
 forming a film from the actinic ray-sensitive or radiation-sensitive resin composition according to  claim 1 ; and 
 exposing and developing the film. 
 
     
     
       9. The actinic ray-sensitive or radiation-sensitive resin composition according to  claim 1 , wherein the compositional ratio of the repeating unit represented by formula (I) in the resin (A) is from 55 to 85 mol % based on all repeating units in the resin (A). 
     
     
       10. The actinic ray-sensitive or radiation-sensitive resin composition according to  claim 1 , wherein the compositional ratio of the repeating unit represented by formula (II) in the resin (A) is from 14 to 40 mol % based on all repeating units in the resin (A). 
     
     
       11. The actinic ray-sensitive or radiation-sensitive resin composition according to  claim 1 , wherein R 4  in formula (III-a) contains a monocyclic cycloalkyl group. 
     
     
       12. The actinic ray-sensitive or radiation-sensitive resin composition according to  claim 1 , wherein the content of the resin (A) in the composition is from 80 to 99 mass %, based on the entire solids content of the composition. 
     
     
       13. The actinic ray-sensitive or radiation-sensitive resin composition according to  claim 1 , wherein the composition further contains an ammonium salt.