Inventor
FUJII KANA
JP17 patents
⚠️ This page may combine multiple inventors who share the name “FUJII KANA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJII KANA
6 patentsUS8647812B2Feb 11, 2014
Pattern forming method, chemical amplification resist composition and resist film
FUJII KANA5 citations71
US8877423B2Nov 4, 2014
Actinic ray-sensitive or radiation-sensitive resin composition and pattern forming method using the same
FUJII KANA1 citations51
US9122151B2Sep 1, 2015
Resist composition, resist film therefrom and method of forming negative pattern using the composition
FUJII KANA1 citations50
US8795945B2Aug 5, 2014
Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the same
FUJII KANA1 citations49
US8642245B2Feb 4, 2014
Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the same
FUJII KANA0 citations40
US8541161B2Sep 24, 2013
Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the same and pattern forming method
FUJII KANA0 citations35
FUJIFILM CORP
5 patentsUS9897922B2Feb 20, 2018
Method of forming pattern and developer for use in the method
FUJIFILM CORP10 citations83
US10248019B2Apr 2, 2019
Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition and resist film
FUJIFILM CORP1 citations62
US9482958B2Nov 1, 2016
Method of forming pattern and developer for use in the method
FUJIFILM CORP2 citations62
US8859192B2Oct 14, 2014
Negative pattern forming method and resist pattern
FUJIFILM CORP0 citations41
US8349535B2Jan 8, 2013
Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern therewith
FUJIFILM CORP0 citations40