Assignee
HEMPEL KLAUS
DE·4 granted patents·2 pending applications·23 citations·filing 2010–2012
Top patents by PatentIndex Score
6 records- 0190US8247281B2Technique for exposing a placeholder material in a replacement gate approach by modifying a removal rate of stressed dielectric overlayersHEMPEL KLAUS·Filed 2010·Granted Aug 21, 2012·13 cites·18 claims
- 0278US8735236B2High-k metal gate electrode structure formed by removing a work function on sidewalls in replacement gate technologyHEMPEL KLAUS·Filed 2011·Granted May 27, 2014·5 cites·17 claims
- 0375US8664103B2Metal gate stack formation for replacement gate technologyHEMPEL KLAUS·Filed 2011·Granted Mar 4, 2014·4 cites·27 claims
- 0459US8716120B2High-k metal gate electrode structures formed by reducing a gate fill aspect ratio in replacement gate technologyHEMPEL KLAUS·Filed 2012·Granted May 6, 2014·1 cites·21 claims
- 0542US2011101470A1High-k metal gate electrode structures formed by separate removal of placeholder materials in transistors of different conductivity typeHEMPEL KLAUS·Filed 2010·Application pending·0 cites
- 0637US2012238086A1Reducing equivalent thickness of high-k dielectrics in field effect transistors by performing a low temperature annealHEMPEL KLAUS·Filed 2012·Application pending·0 cites
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →