Assignee
HISHIRO YOSHIKI
US·3 granted patents·1 pending application·7 citations·filing 2007–2012
Top patents by PatentIndex Score
4 records- 0181US8163468B2Method of reducing photoresist defects during fabrication of a semiconductor deviceHISHIRO YOSHIKI·Filed 2008·Granted Apr 24, 2012·6 cites·8 claims
- 0267US8859195B2Methods of lithographically patterning a substrateHISHIRO YOSHIKI·Filed 2012·Granted Oct 14, 2014·1 cites·14 claims
- 0351US8309297B2Methods of lithographically patterning a substrateHISHIRO YOSHIKI·Filed 2007·Granted Nov 13, 2012·0 cites·23 claims
- 0447US2011042622A1Resist pattern and reflow technologyHISHIRO YOSHIKI·Filed 2010·Application pending·0 cites
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