Assignee
KAMEI MASAYUKI
JP·2 granted patents·1 pending application·3 citations·filing 2005–2013
Top patents by PatentIndex Score
3 records- 0160US8237205B2Semiconductor device and method for fabricating the sameKAMEI MASAYUKI·Filed 2009·Granted Aug 7, 2012·3 cites·12 claims
- 0254US8900419B2Method of switching magnetic flux distributionKAMEI MASAYUKI·Filed 2013·Granted Dec 2, 2014·0 cites·3 claims
- 0350US2007209927A1Magnetron Sputtering Device In which Two Modes Of Magnetic Flux Distribution (Balanced Mode/Unbalanced Mode) Can Be Switched From One To The Other And Vice Versa, A Film Formation Method For Forming A Film From An Inorganic Film Formation Material Using The Device, And A Dual Mode Magnetron Sputtering Device And Film Formation Method For Forming A Film From An Inorganic Film Formation Material At A Low Temperature Using The DeviceKAMEI MASAYUKI·Filed 2005·Application pending·0 cites
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