Assignee
NISHIYAMA HIDETOSHI
JP·7 granted patents·5 pending applications·10 citations·filing 2006–2012
Top patents by PatentIndex Score
12 records- 0180US8975582B2Method and apparatus for reviewing defectsNISHIYAMA HIDETOSHI·Filed 2011·Granted Mar 10, 2015·3 cites·29 claims
- 0279US8467048B2Pattern defect inspection apparatus and methodNISHIYAMA HIDETOSHI·Filed 2012·Granted Jun 18, 2013·2 cites·15 claims
- 0378US8254662B2System for monitoring foreign particles, process processing apparatus and method of electronic commerceNISHIYAMA HIDETOSHI·Filed 2011·Granted Aug 28, 2012·2 cites·14 claims
- 0472US8233145B2Pattern defect inspection apparatus and methodNISHIYAMA HIDETOSHI·Filed 2010·Granted Jul 31, 2012·1 cites·25 claims
- 0570US8119994B2Apparatus and method for inspecting sampleNISHIYAMA HIDETOSHI·Filed 2009·Granted Feb 21, 2012·2 cites·22 claims
- 0662US2009194690A1Inspection Method And Inspection System Using Charged Particle BeamNISHIYAMA HIDETOSHI·Filed 2009·Application pending·0 cites
- 0757US8072597B2Method and its apparatus for inspecting particles or defects of a semiconductor deviceNISHIYAMA HIDETOSHI·Filed 2008·Granted Dec 6, 2011·0 cites·14 claims
- 0853US8093557B2Method and apparatus for reviewing defectsNISHIYAMA HIDETOSHI·Filed 2009·Granted Jan 10, 2012·0 cites·7 claims
- 0953US2012062890A1Method and Its Apparatus for Inspecting Particles or Defects of a Semiconductor DeviceNISHIYAMA HIDETOSHI·Filed 2011·Application pending·0 cites
- 1048US2011221886A1Pattern defect inspecting apparatus and methodNISHIYAMA HIDETOSHI·Filed 2009·Application pending·0 cites
- 1145US2006290930A1Method and apparatus for inspecting pattern defectsNISHIYAMA HIDETOSHI·Filed 2006·Application pending·0 cites
- 1239US2011284745A1Sample Holder, Inspection Apparatus, and Inspection MethodNISHIYAMA HIDETOSHI·Filed 2011·Application pending·0 cites
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