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PHOTRONICS INC
US47 patents
Top patents by PatentIndex Score
US6472107B1Oct 29, 2002
Disposable hard mask for photomask plasma etching
PHOTRONICS INC100 citations98
US6828068B2Dec 7, 2004
Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
PHOTRONICS INC36 citations93
US7074530B2Jul 11, 2006
Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
PHOTRONICS INC13 citations90
US6996450B2Feb 7, 2006
Automated manufacturing system and method for processing photomasks
PHOTRONICS INC29 citations88
US6760640B2Jul 6, 2004
Automated manufacturing system and method for processing photomasks
PHOTRONICS INC30 citations88
US6524754B2Feb 25, 2003
Fused silica pellicle
PHOTRONICS INC39 citations88
US6406818B1Jun 18, 2002
Method of manufacturing photomasks by plasma etching with resist stripped
PHOTRONICS INC21 citations86
US9304334B2Apr 5, 2016
Microfluidic thermoptic energy processor
PHOTRONICS INC5 citations84
US7851110B2Dec 14, 2010
Secure photomask with blocking aperture
PHOTRONICS INC11 citations84
US6682861B2Jan 27, 2004
Disposable hard mask for phase shift photomask plasma etching
PHOTRONICS INC14 citations84
US6842881B2Jan 11, 2005
Rule based system and method for automatically generating photomask orders in a specified order format
PHOTRONICS INC29 citations83
US7356374B2Apr 8, 2008
Comprehensive front end method and system for automatically generating and processing photomask orders
PHOTRONICS INC11 citations82
US7473500B2Jan 6, 2009
Binary half tone photomasks and microscopic three-dimensional devices and method of fabricating the same
PHOTRONICS INC9 citations81
US7480539B2Jan 20, 2009
Automated manufacturing system and method for processing photomasks
PHOTRONICS INC8 citations79
US6472766B2Oct 29, 2002
Step mask
PHOTRONICS INC18 citations79
US11183410B2Nov 23, 2021
Pellicle removal tool
PHOTRONICS INC4 citations77
US7640529B2Dec 29, 2009
User-friendly rule-based system and method for automatically generating photomask orders
PHOTRONICS INC13 citations76
US6855463B2Feb 15, 2005
Photomask having an intermediate inspection film layer
PHOTRONICS INC12 citations75
US6908716B2Jun 21, 2005
Disposable hard mask for photomask plasma etching
PHOTRONICS INC7 citations74
US6749974B2Jun 15, 2004
Disposable hard mask for photomask plasma etching
PHOTRONICS INC12 citations74
US7790340B2Sep 7, 2010
Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
PHOTRONICS INC5 citations69
US6562549B2May 13, 2003
Method of manufacturing photomasks by plasma etching with resist stripped
PHOTRONICS INC11 citations68
US6567588B2May 20, 2003
Method for fabricating chirped fiber bragg gratings
PHOTRONICS INC11 citations65
US7396617B2Jul 8, 2008
Photomask reticle having multiple versions of the same mask pattern with different biases
PHOTRONICS INC6 citations64
US6537708B2Mar 25, 2003
Electrical critical dimension measurements on photomasks
PHOTRONICS INC6 citations63
US6360134B1Mar 19, 2002
Method for creating and improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations
PHOTRONICS INC3 citations60
US7910269B2Mar 22, 2011
Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
PHOTRONICS INC3 citations58
US6686103B2Feb 3, 2004
Fused silica pellicle
PHOTRONICS INC4 citations58
US12282257B2Apr 22, 2025
Pellicle for flat panel display photomask
PHOTRONICS INC0 citations57
US12013642B2Jun 18, 2024
Pellicle for flat panel display photomask
PHOTRONICS INC0 citations57
US11537050B2Dec 27, 2022
Pellicle for flat panel display photomask
PHOTRONICS INC0 citations57
US11119403B2Sep 14, 2021
Pellicle for flat panel display photomask
PHOTRONICS INC0 citations57
US7312004B2Dec 25, 2007
Embedded attenuated phase shift mask with tunable transmission
PHOTRONICS INC5 citations57
US7049034B2May 23, 2006
Photomask having an internal substantially transparent etch stop layer
PHOTRONICS INC5 citations56
US12249528B2Mar 11, 2025
Pellicle removal tool
PHOTRONICS INC0 citations55
US11948824B2Apr 2, 2024
Pellicle removal tool
PHOTRONICS INC0 citations55
US11682573B2Jun 20, 2023
Pellicle removal tool
PHOTRONICS INC0 citations55
US6868209B2Mar 15, 2005
Method for fabricating chirped fiber Bragg gratings
PHOTRONICS INC4 citations54
US7435533B2Oct 14, 2008
Method of forming a semiconductor layer using a photomask reticle having multiple versions of the same mask pattern with different biases
PHOTRONICS INC3 citations53
US9933611B2Apr 3, 2018
Microfluidic thermoptic energy processor
PHOTRONICS INC1 citations52
US7943273B2May 17, 2011
Photomask with detector for optimizing an integrated circuit production process and method of manufacturing an integrated circuit using the same
PHOTRONICS INC0 citations52
US7344824B2Mar 18, 2008
Alternating aperture phase shift photomask having light absorption layer
PHOTRONICS INC1 citations52
US6933084B2Aug 23, 2005
Alternating aperture phase shift photomask having light absorption layer
PHOTRONICS INC0 citations52
US6567719B2May 20, 2003
Method and apparatus for creating an improved image on a photomask by negatively and positively overscanning the boundaries of an image pattern at inside corner locations
PHOTRONICS INC1 citations49
US7351503B2Apr 1, 2008
Fused silica pellicle in intimate contact with the surface of a photomask
PHOTRONICS INC1 citations48
US12164225B2Dec 10, 2024
System, method, and program product for manufacturing a photomask
PHOTRONICS INC0 citations44
US7669167B2Feb 23, 2010
Rule based system and method for automatically generating photomask orders by conditioning information from a customer's computer system
PHOTRONICS INC0 citations42