Assignee
TEL FSI INC
US·29 granted patents·6 pending applications·67 citations·filing 2012–2019
Top patents by PatentIndex Score
35 records- 0190US10843236B2Systems and methods for rotating and translating a substrate in a process chamberTEL FSI INC·Filed 2018·Granted Nov 24, 2020·5 cites·14 claims
- 0290US10062596B2Systems and methods for treating substrates with cryogenic fluid mixturesTEL FSI INC·Filed 2015·Granted Aug 28, 2018·5 cites·18 claims
- 0390US10020217B2Systems and methods for treating substrates with cryogenic fluid mixturesTEL FSI INC·Filed 2015·Granted Jul 10, 2018·5 cites·20 claims
- 0490US10014191B2Systems and methods for treating substrates with cryogenic fluid mixturesTEL FSI INC·Filed 2016·Granted Jul 3, 2018·5 cites·15 claims
- 0586US10991610B2Systems and methods for treating substrates with cryogenic fluid mixturesTEL FSI INC·Filed 2015·Granted Apr 27, 2021·4 cites·19 claims
- 0686US10418270B2Wafer edge lift pin design for manufacturing a semiconductor deviceTEL FSI INC·Filed 2017·Granted Sep 17, 2019·6 cites·16 claims
- 0784US9564378B2Detection of lost wafer from spinning chuckTEL FSI INC·Filed 2014·Granted Feb 7, 2017·7 cites·13 claims
- 0881US10910253B2Magnetically levitated and rotated chuck for processing microelectronic substrates in a process chamberTEL FSI INC·Filed 2017·Granted Feb 2, 2021·5 cites·17 claims
- 0980US9831107B2Processing system and method for providing a heated etching solutionTEL FSI INC·Filed 2014·Granted Nov 28, 2017·4 cites·13 claims
- 1080US9666456B2Method and apparatus for treating a workpiece with arrays of nozzlesTEL FSI INC·Filed 2015·Granted May 30, 2017·2 cites·11 claims
- 1179US11241720B2Pressure control strategies to provide uniform treatment streams in the manufacture of microelectronic devicesTEL FSI INC·Filed 2019·Granted Feb 8, 2022·2 cites·9 claims
- 1276US11545387B2Magnetic integrated lift pin system for a chemical processing chamberTEL FSI INC·Filed 2019·Granted Jan 3, 2023·2 cites·17 claims
- 1376US10625280B2Apparatus for spraying cryogenic fluidsTEL FSI INC·Filed 2017·Granted Apr 21, 2020·3 cites·20 claims
- 1474US10748789B2Systems and methods for treating substrates with cryogenic fluid mixturesTEL FSI INC·Filed 2018·Granted Aug 18, 2020·1 cites·8 claims
- 1572US8859435B2Process for removing material from substratesTEL FSI INC·Filed 2012·Granted Oct 14, 2014·2 cites·3 claims
- 1671US9490138B2Method of substrate temperature control during high temperature wet processingTEL FSI INC·Filed 2014·Granted Nov 8, 2016·2 cites·19 claims
- 1771US9412639B2Method of using separate wafer contacts during wafer processingTEL FSI INC·Filed 2014·Granted Aug 9, 2016·2 cites·7 claims
- 1867US9321087B2Apparatus and method for scanning an object through a fluid sprayTEL FSI INC·Filed 2013·Granted Apr 26, 2016·2 cites·9 claims
- 1964US10020207B2Apparatus and method for scanning an object through a fluid streamTEL FSI INC·Filed 2016·Granted Jul 10, 2018·1 cites·8 claims
- 2062US8871108B2Process for removing carbon material from substratesTEL FSI INC·Filed 2013·Granted Oct 28, 2014·1 cites·29 claims
- 2161US9887107B2Methodologies for rinsing tool surfaces in tools used to process microelectronic workpiecesTEL FSI INC·Filed 2016·Granted Feb 6, 2018·1 cites·8 claims
- 2257US11207715B2System and method for monitoring treatment of microelectronic substrates with fluid sprays such as cryogenic fluid spraysTEL FSI INC·Filed 2019·Granted Dec 28, 2021·0 cites·21 claims
- 2357US2015075569A1Barrier structure and nozzle device for use in tools used to process microelectronic workpieces with one or more treatment fluidsTEL FSI INC·Filed 2014·Application pending·0 cites
- 2455US9039840B2Tools and methods for processing microelectronic workpieces using process chamber designs that easily transition between open and closed modes of operationTEL FSI INC·Filed 2013·Granted May 26, 2015·0 cites·5 claims
- 2551US9911631B2Processing system and method for providing a heated etching solutionTEL FSI INC·Filed 2014·Granted Mar 6, 2018·0 cites·20 claims
- 2648US9017568B2Process for increasing the hydrophilicity of silicon surfaces following HF treatmentTEL FSI INC·Filed 2014·Granted Apr 28, 2015·0 cites·20 claims
- 2745US2020148534A1Method for achieving stiction-free high-aspect-ratio microstructures after wet chemical processingTEL FSI INC·Filed 2019·Application pending·0 cites
- 2843US2014332034A1Process comprising water vapor for haze elimination and residue removalTEL FSI INC·Filed 2014·Application pending·0 cites
- 2941US9299570B2Process for silicon nitride removal selective to SiGexTEL FSI INC·Filed 2013·Granted Mar 29, 2016·0 cites·19 claims
- 3039US2018190517A1Recipe selectable dispense system and method of operatingTEL FSI INC·Filed 2017·Application pending·0 cites
- 3138US10748788B2System and method for monitoring treatment of microelectronic substrates with fluid sprays such as cryogenic fluid spraysTEL FSI INC·Filed 2018·Granted Aug 18, 2020·0 cites·19 claims
- 3238US2018025904A1Systems and Methods for Treating Substrates with Cryogenic Fluid MixturesTEL FSI INC·Filed 2017·Application pending·0 cites
- 3336US9691628B2Process for silicon nitride removal selective to SiGexTEL FSI INC·Filed 2015·Granted Jun 27, 2017·0 cites·17 claims
- 3430US2016284535A1Method for wet stripping silicon-containing organic layersTEL FSI INC·Filed 2015·Application pending·0 cites
- 3524US9982664B2Systems and methods for metering a dose volume of fluid used to treat microelectronic substratesTEL FSI INC·Filed 2015·Granted May 29, 2018·0 cites·16 claims
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