Assignee
YONEDA IKUO
JP·6 granted patents·9 pending applications·42 citations·filing 2007–2012
Top patents by PatentIndex Score
15 records- 0192US8419995B2Imprint methodYONEDA IKUO·Filed 2009·Granted Apr 16, 2013·19 cites·13 claims
- 0289US8202463B2Imprint methodYONEDA IKUO·Filed 2009·Granted Jun 19, 2012·13 cites·14 claims
- 0382US8227267B2Template inspection method and manufacturing method for semiconductor deviceYONEDA IKUO·Filed 2009·Granted Jul 24, 2012·7 cites·8 claims
- 0468US8946080B2Pattern transfer methodYONEDA IKUO·Filed 2012·Granted Feb 3, 2015·2 cites·19 claims
- 0565US8282868B2Semiconductor device fabrication method and pattern formation moldYONEDA IKUO·Filed 2010·Granted Oct 9, 2012·1 cites·9 claims
- 0660US2009045539A1Pattern forming method and pattern forming apparatusYONEDA IKUO·Filed 2008·Application pending·0 cites
- 0750US8206895B2Method for forming pattern and method for manufacturing semiconductor deviceYONEDA IKUO·Filed 2008·Granted Jun 26, 2012·0 cites·5 claims
- 0849US2009315223A1Template and pattern forming methodYONEDA IKUO·Filed 2009·Application pending·0 cites
- 0947US2010022036A1Method for forming pattern, and templateYONEDA IKUO·Filed 2008·Application pending·0 cites
- 1045US2008090170A1Pattern forming template and pattern forming methodYONEDA IKUO·Filed 2007·Application pending·0 cites
- 1142US2013221581A1Pattern formation apparatus, pattern formation method and a method for producing semiconductor devicesYONEDA IKUO·Filed 2012·Application pending·0 cites
- 1242US2014072668A1Mold and mold blank substrateYONEDA IKUO·Filed 2012·Application pending·0 cites
- 1340US2012164346A1Method and device for forming patternYONEDA IKUO·Filed 2011·Application pending·0 cites
- 1439US2010264113A1Template, method of manufacturing the same, and method of forming patternYONEDA IKUO·Filed 2010·Application pending·0 cites
- 1538US2011237086A1Template and method of manufacturing the same, and semiconductor device manufacturing method using the templateYONEDA IKUO·Filed 2011·Application pending·0 cites
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Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →