Assignee
ADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI
CN·15 granted patents·11 pending applications·123 citations·filing 2013–2018
Top patents by PatentIndex Score
26 records- 0196US9633884B2Performance enhancement of coating packaged ESC for semiconductor apparatusADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Granted Apr 25, 2017·32 cites·17 claims
- 0296US9534724B2Gas showerhead, method for making the same and thin film growth reactorADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Granted Jan 3, 2017·49 cites·9 claims
- 0395US9617633B2Coating packaged chamber parts for semiconductor plasma apparatusADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Granted Apr 11, 2017·28 cites·12 claims
- 0485US10593520B2Temperature adjusting apparatus and method for a focus ringADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2016·Granted Mar 17, 2020·5 cites·9 claims
- 0578US10240231B2Chemical vapor deposition apparatus and its cleaning methodADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2016·Granted Mar 26, 2019·3 cites·16 claims
- 0676US12062524B2Plasma reactor having a variable coupling of low frequency RF power to an annular electrodeADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2018·Granted Aug 13, 2024·2 cites·10 claims
- 0773US10529577B2Device of changing gas flow pattern and a wafer processing method and apparatusADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2015·Granted Jan 7, 2020·2 cites·11 claims
- 0867US9951435B2Coating packaged chamber parts for semiconductor plasma apparatusADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2017·Granted Apr 24, 2018·0 cites·18 claims
- 0967US9851151B2Apparatus and method for controlling heating of base within chemical vapour deposition chamberADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Granted Dec 26, 2017·1 cites·13 claims
- 1065US10685814B2Processing chamber, combination of processing chamber and loadlock, and system for processing substratesADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2015·Granted Jun 16, 2020·1 cites·21 claims
- 1163US2014116338A1Coating for performance enhancement of semiconductor apparatusADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Application pending·0 cites
- 1260US10822721B2Method to improve MOCVD reaction process by forming protective filmADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2018·Granted Nov 3, 2020·0 cites·18 claims
- 1360US10281215B2Apparatus and method for controlling heating of base within chemical vapour deposition chamberADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2017·Granted May 7, 2019·0 cites·18 claims
- 1455US9431216B2ICP source design for plasma uniformity and efficiency enhancementADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Granted Aug 30, 2016·0 cites·8 claims
- 1555US2014083452A1Method for in situ cleaning of mocvd reaction chamberADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Application pending·0 cites
- 1652US2016240726A1Process component and method to improve mocvd reaction processADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2016·Application pending·0 cites
- 1748US2016322205A1Icp source design for plasma uniformity and efficiency enhancementADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2016·Application pending·0 cites
- 1845US2017186592A1Multi-zone active-matrix temperature control system and temperature control method, and electrostatic chuck and plasma processing apparatus apply thereofADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2016·Application pending·0 cites
- 1945US2014083451A1Method for in situ cleaning of mocvd reaction chamberADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Application pending·0 cites
- 2045US2014083453A1Method for in situ cleaning of mocvd reaction chamberADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Application pending·0 cites
- 2143US2017130331A1Method for mocvd gas showerhead pretreatmentADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2016·Application pending·0 cites
- 2241US2014117120A1Coating packaged showerhead performance enhancement for semiconductor apparatusADVANCED MICRO FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Application pending·0 cites
- 2337US9443715B2Method and device for measuring temperature of substrate in vacuum processing apparatusADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2013·Granted Sep 13, 2016·0 cites·20 claims
- 2436US2017154780A1Substrate processing method and apparatus thereofADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2016·Application pending·0 cites
- 2535US2017186585A1Electrode structure for icp etcherADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2016·Application pending·0 cites
- 2632US9696209B2Method for measuring temperature of film in reaction chamberADVANCED MICRO-FABRICATION EQUIPMENT INC SHANGHAI·Filed 2014·Granted Jul 4, 2017·0 cites·12 claims
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