Assignee
AIXTRON SE
DE·64 granted patents·36 pending applications·94 citations·filing 2006–2025
Top patents by PatentIndex Score
100 records- 0192US10544519B2Method and apparatus for surface preparation prior to epitaxial depositionAIXTRON SE·Filed 2017·Granted Jan 28, 2020·8 cites·20 claims
- 0292US9721759B1System and method for distributing RF power to a plasma sourceAIXTRON SE·Filed 2016·Granted Aug 1, 2017·14 cites·16 claims
- 0387US9159608B2Method for forming TiSiN thin film layer by using atomic layer depositionAIXTRON SE·Filed 2013·Granted Oct 13, 2015·16 cites·7 claims
- 0485US10329668B2Device and method for exhaust gas treatment on CVD reactorAIXTRON SE·Filed 2015·Granted Jun 25, 2019·11 cites·4 claims
- 0583US11479851B2Substrate holder arrangement with mask supportAIXTRON SE·Filed 2018·Granted Oct 25, 2022·2 cites·20 claims
- 0683US9942946B2Device for generating vapor from solid or liquid starting material for CVD or PVD apparatusAIXTRON SE·Filed 2015·Granted Apr 10, 2018·3 cites·15 claims
- 0781US11746419B2Shield plate for a CVD reactorAIXTRON SE·Filed 2019·Granted Sep 5, 2023·2 cites·6 claims
- 0881US9443702B2Methods for plasma processingAIXTRON SE·Filed 2015·Granted Sep 13, 2016·2 cites·17 claims
- 0980US11396697B2Device for separating a structured layer on a substrate, and method for setting up the deviceAIXTRON SE·Filed 2018·Granted Jul 26, 2022·2 cites·14 claims
- 1080US9822451B2Device and method for manufacturing nanostructures consisting of carbonAIXTRON SE·Filed 2014·Granted Nov 21, 2017·2 cites·12 claims
- 1179US11702740B2Closure element for closing a loading opening of an inner housing of a CVD reactorAIXTRON SE·Filed 2018·Granted Jul 18, 2023·4 cites·9 claims
- 1279US9988712B2Substrate holding deviceAIXTRON SE·Filed 2015·Granted Jun 5, 2018·6 cites·11 claims
- 1379US2025382707A1Devices for depositing a coating in a cvd reactorAIXTRON SE·Filed 2025·Application pending·0 cites
- 1478US10501847B2Apparatus and method for generating a vapor for a CVD or PVD deviceAIXTRON SE·Filed 2015·Granted Dec 10, 2019·2 cites·14 claims
- 1576US12584222B2Methods for thermal treatment of substratesAIXTRON SE·Filed 2023·Granted Mar 24, 2026·0 cites·12 claims
- 1674US11713505B2Device and method for controlling the ceiling temperature of a CVD reactorAIXTRON SE·Filed 2019·Granted Aug 1, 2023·1 cites·16 claims
- 1774US11441223B2Susceptor for a CVD reactorAIXTRON SE·Filed 2018·Granted Sep 13, 2022·1 cites·16 claims
- 1874US8349081B2Gas distributor with pre-chambers arranged in planesAIXTRON SE·Filed 2006·Granted Jan 8, 2013·2 cites·14 claims
- 1971US9831466B2Method for depositing a multi-layer moisture barrier on electronic devices and electronic devices protected by a multi-layer moisture barrierAIXTRON SE·Filed 2014·Granted Nov 28, 2017·2 cites·29 claims
- 2070US12084768B2Method for using shield plate in a CVD reactorAIXTRON SE·Filed 2023·Granted Sep 10, 2024·0 cites·11 claims
- 2170US10260147B2Device for depositing nanotubesAIXTRON SE·Filed 2015·Granted Apr 16, 2019·1 cites·3 claims
- 2270US10221482B2Gas distributor for a CVD reactorAIXTRON SE·Filed 2014·Granted Mar 5, 2019·1 cites·10 claims
- 2369US11168410B2Susceptor for a chemical vapour deposition reactorAIXTRON SE·Filed 2017·Granted Nov 9, 2021·2 cites·18 claims
- 2469US10526708B2Methods for forming thin protective and optical layers on substratesAIXTRON SE·Filed 2018·Granted Jan 7, 2020·1 cites·20 claims
- 2569US9970106B2CVD system having particle separatorAIXTRON SE·Filed 2014·Granted May 15, 2018·7 cites·14 claims
- 2667US2022310986A1Method and device for forming bundles of nanofilamentsAIXTRON SE·Filed 2022·Application pending·0 cites
- 2763US2025019823A1Method and device for depositing a layer containing a group five element in a process chamber and subsequent cleaning of the process chamberAIXTRON SE·Filed 2022·Application pending·0 cites
- 2861US10267768B2Device and method for determining the concentration of a vapor by means of an oscillating body sensorAIXTRON SE·Filed 2015·Granted Apr 23, 2019·1 cites·14 claims
- 2960US2024102164A1Cvd reactor comprising a process chamber floor rising in a feeder zoneAIXTRON SE·Filed 2022·Application pending·0 cites
- 3059US12577670B2CVD reactor having means for locally influencing the susceptor temperatureAIXTRON SE·Filed 2020·Granted Mar 17, 2026·0 cites·13 claims
- 3159US2025066917A1Cover plate for covering the susceptor side facing the process chamber of a device for depositing sic layersAIXTRON SE·Filed 2024·Application pending·0 cites
- 3259US2022403519A1Method for depositing a two-dimensional coating and cvd reactorAIXTRON SE·Filed 2020·Application pending·0 cites
- 3358US10438823B2Substrate treatment deviceAIXTRON SE·Filed 2014·Granted Oct 8, 2019·1 cites·11 claims
- 3457US12577674B2Method for identifying substrates which are faulty or have been incorrectly inserted into a CVD reactorAIXTRON SE·Filed 2021·Granted Mar 17, 2026·0 cites·7 claims
- 3557US10323322B2Gas inlet element of a CVD reactor with weight-reduced gas outlet plateAIXTRON SE·Filed 2014·Granted Jun 18, 2019·0 cites·15 claims
- 3656US12098462B2Method for producing a component part of a CVD reactorAIXTRON SE·Filed 2019·Granted Sep 24, 2024·0 cites·12 claims
- 3756US2016068961A1Method and Apparatus For Growing Binary, Ternary and Quaternary Materials on a SubstrateAIXTRON SE·Filed 2014·Application pending·0 cites
- 3855US2024263310A1Gas-inlet element for a cvd reactorAIXTRON SE·Filed 2022·Application pending·0 cites
- 3955US2014186527A1Device and method for processing strip-type substratesAIXTRON SE·Filed 2013·Application pending·0 cites
- 4054US11851762B2Coating device having coated transmitter coilAIXTRON SE·Filed 2018·Granted Dec 26, 2023·0 cites·13 claims
- 4154US2021296628A1Electrode for a lithium-ion battery and device and method for producing said electrodeAIXTRON SE·Filed 2017·Application pending·0 cites
- 4253US12084767B2Gas-inlet element for a CVD reactorAIXTRON SE·Filed 2020·Granted Sep 10, 2024·0 cites·15 claims
- 4353US2025389484A1Device and method for treating a substrateAIXTRON SE·Filed 2023·Application pending·0 cites
- 4453US2023323537A1Gas inlet element of a cvd reactor with two infeed pointsAIXTRON SE·Filed 2021·Application pending·0 cites
- 4552US12012654B2Device for coating a substrate with a carbon-containing coatingAIXTRON SE·Filed 2019·Granted Jun 18, 2024·0 cites·7 claims
- 4652US11959190B2Device for connecting a susceptor to a drive shaftAIXTRON SE·Filed 2019·Granted Apr 16, 2024·0 cites·17 claims
- 4751US11187676B2Device and method for determining the concentration of a vaporAIXTRON SE·Filed 2018·Granted Nov 30, 2021·0 cites·10 claims
- 4851US2023332292A1Cvd reactor with temperature-controllable gas inlet regionAIXTRON SE·Filed 2021·Application pending·0 cites
- 4951US2025333844A1Method and assembly for providing process gas to a cvd reactorAIXTRON SE·Filed 2022·Application pending·0 cites
- 5050US11286566B2Apparatus for deposition of a III-V semiconductor layerAIXTRON SE·Filed 2019·Granted Mar 29, 2022·0 cites·9 claims
Showing the top 50 of 100 patent records by PatentIndex Score.
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