Assignee
CHUDZIK MICHAEL P
US·15 granted patents·1 pending application·83 citations·filing 2008–2012
Top patents by PatentIndex Score
16 records- 0198US8138037B2Method and structure for gate height scaling with high-k/metal gate technologyCHUDZIK MICHAEL P·Filed 2010·Granted Mar 20, 2012·43 cites·16 claims
- 0286US8227870B2Method and structure for gate height scaling with high-k/metal gate technologyCHUDZIK MICHAEL P·Filed 2012·Granted Jul 24, 2012·7 cites·10 claims
- 0381US8901706B2Thermally stable high-K tetragonal HFO2 layer within high aspect ratio deep trenchesCHUDZIK MICHAEL P·Filed 2012·Granted Dec 2, 2014·4 cites·14 claims
- 0480US9059211B2Oxygen scavenging spacer for a gate electrodeCHUDZIK MICHAEL P·Filed 2011·Granted Jun 16, 2015·4 cites·18 claims
- 0579US8643115B2Structure and method of Tinv scaling for high κ metal gate technologyCHUDZIK MICHAEL P·Filed 2011·Granted Feb 4, 2014·4 cites·16 claims
- 0676US8436427B2Dual metal and dual dielectric integration for metal high-K FETsCHUDZIK MICHAEL P·Filed 2011·Granted May 7, 2013·4 cites·20 claims
- 0775US8735244B2Semiconductor device devoid of an interfacial layer and methods of manufactureCHUDZIK MICHAEL P·Filed 2011·Granted May 27, 2014·3 cites·22 claims
- 0875US8492290B2Fabrication of silicon oxide and oxynitride having sub-nanometer thicknessCHUDZIK MICHAEL P·Filed 2011·Granted Jul 23, 2013·3 cites·20 claims
- 0975US8232606B2High-K dielectric and metal gate stack with minimal overlap with isolation regionCHUDZIK MICHAEL P·Filed 2011·Granted Jul 31, 2012·3 cites·7 claims
- 1072US8753936B2Changing effective work function using ion implantation during dual work function metal gate integrationCHUDZIK MICHAEL P·Filed 2008·Granted Jun 17, 2014·4 cites·14 claims
- 1171US8120144B2Method for forming dual high-K metal gate using photoresist mask and structures thereofCHUDZIK MICHAEL P·Filed 2011·Granted Feb 21, 2012·2 cites·12 claims
- 1265US9099461B2Method of manufacturing scaled equivalent oxide thickness gate stacks in semiconductor devices and related design structureCHUDZIK MICHAEL P·Filed 2012·Granted Aug 4, 2015·1 cites·15 claims
- 1362US8138041B2In-situ silicon cap for metal gate electrodeCHUDZIK MICHAEL P·Filed 2008·Granted Mar 20, 2012·1 cites·9 claims
- 1451US8728925B2Method and structure for work function engineering in transistors including a high dielectric constant gate insulator and metal gate (HKMG)CHUDZIK MICHAEL P·Filed 2012·Granted May 20, 2014·0 cites·6 claims
- 1548US9236314B2High-K/metal gate stack using capping layer methods, IC and related transistorsCHUDZIK MICHAEL P·Filed 2012·Granted Jan 12, 2016·0 cites·8 claims
- 1646US2013277765A1Semiconductor device including graded gate stack, related method and design structureCHUDZIK MICHAEL P·Filed 2012·Application pending·0 cites
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