Assignee
FUJIWARA TOMOHARU
JP·6 granted patents·2 pending applications·4 citations·filing 2005–2012
Top patents by PatentIndex Score
8 records- 0173US8922754B2Immersion exposure apparatus and device fabricating method with two substrate stages and metrology stationFUJIWARA TOMOHARU·Filed 2008·Granted Dec 30, 2014·2 cites·12 claims
- 0271US10317346B2Method and device for inspecting spatial light modulator, and exposure method and deviceFUJIWARA TOMOHARU·Filed 2012·Granted Jun 11, 2019·2 cites·10 claims
- 0353US8456608B2Maintenance method, maintenance device, exposure apparatus, and device manufacturing methodFUJIWARA TOMOHARU·Filed 2010·Granted Jun 4, 2013·0 cites·40 claims
- 0452US8330939B2Immersion exposure apparatus and device manufacturing method with a liquid recovery port provided on at least one of a first stage and second stageFUJIWARA TOMOHARU·Filed 2005·Granted Dec 11, 2012·0 cites·43 claims
- 0551US2011317139A1Exposure apparatus and exposure method, and device manufacturing methodFUJIWARA TOMOHARU·Filed 2011·Application pending·0 cites
- 0647US8179517B2Exposure apparatus and method, maintenance method for exposure apparatus, and device manufacturing methodFUJIWARA TOMOHARU·Filed 2006·Granted May 15, 2012·0 cites·28 claims
- 0743US8654308B2Method for determining exposure condition, exposure method, exposure apparatus, and method for manufacturing deviceFUJIWARA TOMOHARU·Filed 2005·Granted Feb 18, 2014·0 cites·16 claims
- 0841US2008137056A1Method for Processing Substrate, Exposure Method, Exposure Apparatus, and Method for Producing DeviceFUJIWARA TOMOHARU·Filed 2005·Application pending·0 cites
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