Exposure apparatus and exposure method, and device manufacturing method

Abstract

An exposure apparatus includes: a supply port through which a liquid is supplied to an optical path space of exposure light; and a supply passage in which the liquid flows and which is in fluid communication with the supply port. An amount of a predetermined substance mixed into the liquid in the supply passage is set to be not greater than a predetermined value.

1 - 41 . (canceled) 
     
     
         42 . An exposure method, comprising:
 supplying a liquid between an optical element of an exposure apparatus and a substrate via a supply passage; and   irradiating an exposure light onto the substrate via the liquid,   wherein an amount of boron or an anion contained in the liquid in the supply passage is set to be not greater than a predetermined value.   
     
     
         43 . An exposure method, comprising:
 supplying a liquid between an optical element of exposure apparatus and a substrate via a supply passage; and   irradiating an exposure light onto the substrate via the liquid,   wherein an amount of a metal contained in the liquid in the supply passage is set to be not greater than 1 ppt.   
     
     
         44 . The exposure method according to  claim 42 , wherein an amount of the boron contained in the liquid is set to be not greater than 5 ppt. 
     
     
         45 . The exposure method according to  claim 42 , wherein an amount of the anion contained in the liquid is set to be not greater than 5 ppt. 
     
     
         46 . The exposure method according to  claim 42 , wherein a gas component is contained in the liquid in the supply passage. 
     
     
         47 . The exposure method according to  claim 46 , wherein an amount of the gas component contained in the liquid is set to be not greater than 10 ppb. 
     
     
         48 . The exposure method according to  claim 42 , wherein the liquid in the supply passage contains both the boron and the anion, and wherein an amount of the boron contained in the liquid is set to be not greater than 5 ppt and an amount of the anion contained in the liquid is set to be not greater than 5 ppt. 
     
     
         49 . The exposure method according to  claim 43 , wherein the liquid in the supply passage further contains boron or an anion, and wherein an amount of the boron or the anion contained in the liquid in the supply passage is set to be not greater than a predetermined value. 
     
     
         50 . An exposure apparatus that exposes a substrate, comprising:
 a supply port through which a liquid is supplied to an optical path space of exposure light; and   a supply passage in which the liquid flows and which is in fluid communication with the supply port,   wherein an amount of boron or an anion contained in the liquid in the supply passage is set to be not greater than a predetermined value.   
     
     
         51 . An exposure apparatus that exposes a substrate, comprising:
 a supply port through which a liquid is supplied to an optical path space of exposure light; and   a supply passage in which the liquid flows and which is in fluid communication with the supply port,   wherein an amount of a metal contained in the liquid in the supply passage is set to be not greater than 1 ppt.   
     
     
         52 . The exposure apparatus according to  claim 50 , wherein an amount of the boron contained in the liquid is set to be not greater than 5 ppt. 
     
     
         53 . The exposure apparatus according to  claim 52 , wherein an amount of the anion contained in the liquid is set to be not greater than 5 ppt. 
     
     
         54 . The exposure apparatus according to  claim 50 , wherein a gas component is contained in the liquid in the supply passage. 
     
     
         55 . The exposure apparatus according to  claim 54 , wherein an amount of the gas component contained in the liquid is set to be not greater than 10 ppb. 
     
     
         56 . The exposure apparatus according to  claim 50 , wherein a member that forms the supply passage comprises a fluoroplastic material. 
     
     
         57 . The exposure apparatus according to  claim 50 , wherein a member that forms the supply passage comprises a titanium material. 
     
     
         58 . The exposure apparatus according to  claim 50 , wherein the liquid in the supply passage contains both the boron and the anion, and wherein an amount of the boron contained in the liquid is set to be not greater than 5 ppt and an amount of the anion contained in the liquid is set to be not greater than 5 ppt. 
     
     
         59 . The exposure apparatus according to  claim 51 , wherein the liquid in the supply passage further contains boron or an anion, and wherein an amount of the boron or the anion contained in the liquid in the supply passage is set to be not greater than a predetermined value.