Assignee
HIMORI SHINJI
JP·10 granted patents·4 pending applications·45 citations·filing 2005–2012
Top patents by PatentIndex Score
14 records- 0193US8070911B2Capacitive coupling plasma processing apparatusHIMORI SHINJI·Filed 2006·Granted Dec 6, 2011·16 cites·20 claims
- 0288US9245776B2Plasma processing apparatusHIMORI SHINJI·Filed 2010·Granted Jan 26, 2016·9 cites·18 claims
- 0376US8512511B2Mounting table and plasma processing apparatusHIMORI SHINJI·Filed 2009·Granted Aug 20, 2013·5 cites·21 claims
- 0475US9859146B2Semiconductor manufacturing device and processing methodHIMORI SHINJI·Filed 2012·Granted Jan 2, 2018·3 cites·3 claims
- 0575US8284538B2Electrostatic chuck deviceHIMORI SHINJI·Filed 2007·Granted Oct 9, 2012·5 cites·15 claims
- 0674US9038566B2Capacitive coupling plasma processing apparatusHIMORI SHINJI·Filed 2011·Granted May 26, 2015·2 cites·17 claims
- 0773US9275836B2Plasma processing apparatus and plasma processing methodHIMORI SHINJI·Filed 2010·Granted Mar 1, 2016·3 cites·1 claims
- 0868US9202675B2Plasma processing apparatus and electrode for sameHIMORI SHINJI·Filed 2010·Granted Dec 1, 2015·2 cites·22 claims
- 0949US2012247677A1Substrate processing methodHIMORI SHINJI·Filed 2012·Application pending·0 cites
- 1045US2008062609A1Electrostatic chuck deviceHIMORI SHINJI·Filed 2007·Application pending·0 cites
- 1144US2008062610A1Electrostatic chuck deviceHIMORI SHINJI·Filed 2007·Application pending·0 cites
- 1243US2006081337A1Capacitive coupling plasma processing apparatusHIMORI SHINJI·Filed 2005·Application pending·0 cites
- 1341US8888951B2Plasma processing apparatus and electrode for sameHIMORI SHINJI·Filed 2010·Granted Nov 18, 2014·0 cites·20 claims
- 1439US10147633B2Transfer apparatus and plasma processing systemHIMORI SHINJI·Filed 2012·Granted Dec 4, 2018·0 cites·9 claims
Join the waitlist — get patent alerts
Get an alert when HIMORI SHINJI files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →