Assignee
KOJUNDO CHEMICAL LABORATORY CO LTD
JP·7 granted patents·5 pending applications·0 citations·filing 2018–2025
Top patents by PatentIndex Score
12 records- 0178US2025283217A1Vapor deposition source material used in production of film containing indium and one or more of the other metals, and the method of producing film containing indium and one or more of the other metalsKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2025·Application pending·0 cites
- 0272US12410514B2Vapor deposition source material used in production of film containing indium and one or more of the other metals, and the method of producing film containing indium and one or more of the other metalsKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2021·Granted Sep 9, 2025·0 cites·3 claims
- 0368US2024060180A1Atomic layer deposition method for metal thin filmsKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2023·Application pending·0 cites
- 0457US12571099B2Bis(ethylcyclopentadienyl)tin, precursor for chemical vapor deposition, method of producing tin-containing thin film, and method of producing tin oxide thin filmKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2020·Granted Mar 10, 2026·0 cites·3 claims
- 0557US10752992B2Atomic layer deposition method of metal-containing thin filmKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2018·Granted Aug 25, 2020·0 cites·3 claims
- 0654US2024318310A1Container for volatile raw materials, and solid gasification and supply systemKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2022·Application pending·0 cites
- 0753US11807939B2Atomic layer deposition method for metal thin filmsKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2018·Granted Nov 7, 2023·0 cites·1 claims
- 0851US11566326B2Vaporizable source material container and solid vaporization/supply system using the sameKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2020·Granted Jan 31, 2023·0 cites·9 claims
- 0949US11655538B2Precursor for chemical vapor deposition, and light-blocking container containing precursor for chemical vapor deposition and method for producing the sameKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2018·Granted May 23, 2023·0 cites·8 claims
- 1046US2023160051A1Method for manufacturing crystalline gallium nitride thin filmKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2021·Application pending·0 cites
- 1144US11613809B2Solid vaporization/supply system of metal halide for thin film depositionKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2020·Granted Mar 28, 2023·0 cites·7 claims
- 1243US2021163519A1Bis(alkyltetramethylcyclopentadienyl)zinc, precursor for chemical vapor deposition, and production method for zinc-containing thin filmKOJUNDO CHEMICAL LABORATORY CO LTD·Filed 2019·Application pending·0 cites
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