Assignee
PIXELLIGENT TECHNOLOGIES LLC
US·17 granted patents·9 pending applications·195 citations·filing 1998–2016
Top patents by PatentIndex Score
26 records- 0192US6291110B1Methods for transferring a two-dimensional programmable exposure pattern for photolithographyPIXELLIGENT TECHNOLOGIES LLC·Filed 1998·Granted Sep 18, 2001·71 cites·35 claims
- 0291US8383316B2Resists for lithographyPIXELLIGENT TECHNOLOGIES LLC·Filed 2007·Granted Feb 26, 2013·16 cites·109 claims
- 0388US9202688B2Synthesis, capping and dispersion of nanocrystalsPIXELLIGENT TECHNOLOGIES LLC·Filed 2014·Granted Dec 1, 2015·5 cites·39 claims
- 0487US8344053B2Highly conductive compositesPIXELLIGENT TECHNOLOGIES LLC·Filed 2010·Granted Jan 1, 2013·5 cites·40 claims
- 0587US7649615B2Advanced exposure techniques for programmable lithographyPIXELLIGENT TECHNOLOGIES LLC·Filed 2007·Granted Jan 19, 2010·8 cites·4 claims
- 0686US6888616B2Programmable photolithographic mask system and methodPIXELLIGENT TECHNOLOGIES LLC·Filed 2003·Granted May 3, 2005·19 cites·21 claims
- 0781US7050155B2Advanced exposure techniques for programmable lithographyPIXELLIGENT TECHNOLOGIES LLC·Filed 2002·Granted May 23, 2006·16 cites·4 claims
- 0880US6879376B2Method and apparatus for exposing photoresists using programmable masksPIXELLIGENT TECHNOLOGIES LLC·Filed 2002·Granted Apr 12, 2005·19 cites·8 claims
- 0978US9359689B2Synthesis, capping and dispersion of nanocrystalsPIXELLIGENT TECHNOLOGIES LLC·Filed 2012·Granted Jun 7, 2016·1 cites·25 claims
- 1077US10753012B2Synthesis, capping and dispersion of nanocrystalsPIXELLIGENT TECHNOLOGIES LLC·Filed 2016·Granted Aug 25, 2020·2 cites·8 claims
- 1175US8993221B2Block co-polymer photoresistPIXELLIGENT TECHNOLOGIES LLC·Filed 2013·Granted Mar 31, 2015·3 cites·13 claims
- 1272US9328432B2Synthesis, capping and dispersion of nanocrystalsPIXELLIGENT TECHNOLOGIES LLC·Filed 2014·Granted May 3, 2016·1 cites·42 claims
- 1371US6480261B2Photolithographic system for exposing a wafer using a programmable maskPIXELLIGENT TECHNOLOGIES LLC·Filed 2001·Granted Nov 12, 2002·8 cites·35 claims
- 1465US7524616B2Applications of semiconductor nano-sized particles for photolithographyPIXELLIGENT TECHNOLOGIES LLC·Filed 2004·Granted Apr 28, 2009·6 cites·25 claims
- 1557US6600551B2Programmable photolithographic mask system and methodPIXELLIGENT TECHNOLOGIES LLC·Filed 2002·Granted Jul 29, 2003·3 cites·22 claims
- 1656US2009239161A1Applications of semiconductor nano-sized particles for photolithographyPIXELLIGENT TECHNOLOGIES LLC·Filed 2009·Application pending·0 cites
- 1755US2013136897A1Resists for lithographyPIXELLIGENT TECHNOLOGIES LLC·Filed 2013·Application pending·0 cites
- 1852US2015185616A1Resists for lithographyPIXELLIGENT TECHNOLOGIES LLC·Filed 2015·Application pending·0 cites
- 1950US2006098181A1Advanced exposure techniques for programmable lithographyPIXELLIGENT TECHNOLOGIES LLC·Filed 2005·Application pending·0 cites
- 2047US7605390B2Programmable photolithographic mask based on semiconductor nano-particle optical modulatorsPIXELLIGENT TECHNOLOGIES LLC·Filed 2003·Granted Oct 20, 2009·6 cites·2 claims
- 2147US7510818B2Reversible photobleachable materials based on nano-sized semiconductor particles and their optical applicationsPIXELLIGENT TECHNOLOGIES LLC·Filed 2003·Granted Mar 31, 2009·6 cites·72 claims
- 2245US2015380239A1Block co-polymer photoresistPIXELLIGENT TECHNOLOGIES LLC·Filed 2015·Application pending·0 cites
- 2344US2015168842A1Block co-polymer photoresistPIXELLIGENT TECHNOLOGIES LLC·Filed 2015·Application pending·0 cites
- 2441US2011056841A1System and method for direct conversion of solar energy to chemical energyPIXELLIGENT TECHNOLOGIES LLC·Filed 2010·Application pending·0 cites
- 2536US2009220756A1Reversible photo bleachable materials based on nano sized semiconductor particles and their optical applicationsPIXELLIGENT TECHNOLOGIES LLC·Filed 2009·Application pending·0 cites
- 2635US2002061472A1Three-dimensional lithography by multiple two-dimensional pattern projectionPIXELLIGENT TECHNOLOGIES LLC·Filed 2001·Application pending·0 cites
Counts cover granted patents and pending applications in the PatentIndex corpus. How scoring works →