Assignee
RYOO MAN-HYOUNG
KR·1 granted patent·1 pending application·2 citations·filing 2010–2011
Top patents by PatentIndex Score
2 records- 0167US8193047B2Semiconductor device having sufficient process margin and method of forming sameRYOO MAN-HYOUNG·Filed 2010·Granted Jun 5, 2012·2 cites·20 claims
- 0245US2011156159A1Semiconductor device having sufficient process margin and method of forming sameRYOO MAN-HYOUNG·Filed 2011·Application pending·0 cites
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