Assignee
TOKYO OHKA KOGYO CO LTD
JP·997 granted patents·440 pending applications·10,114 citations·filing 1976–2025
Top patents by PatentIndex Score
1,437 records- 0198US7713679B2Resist composition, method of forming resist pattern, novel compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted May 11, 2010·57 cites·11 claims
- 0298US7323287B2Positive type resist composition and resist pattern formation method using sameTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 29, 2008·77 cites·1 claims
- 0397US7682772B2Resist composition, method of forming resist pattern, novel compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Mar 23, 2010·20 cites·16 claims
- 0497US7371510B2Material for forming resist protecting film for use in liquid immersion lithography process, composite film, and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted May 13, 2008·44 cites·10 claims
- 0597US7074543B2Positive resist composition and method of forming resist pattern from the sameTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Jul 11, 2006·151 cites·20 claims
- 0697US5714625ACyanooxime sulfonate compoundTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Feb 3, 1998·143 cites·6 claims
- 0797US4245154AApparatus for treatment with gas plasmaTOKYO OHKA KOGYO CO LTD·Filed 1978·Granted Jan 13, 1981·93 cites·9 claims
- 0896US9851637B2Resist composition, method of forming resist pattern, compound, and acid diffusion control agentTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Dec 26, 2017·7 cites·10 claims
- 0996US9244347B2Resist composition, compound, polymeric compound and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jan 26, 2016·19 cites·18 claims
- 1096US9052592B2Resist composition and resist pattern forming methodTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Jun 9, 2015·16 cites·15 claims
- 1196US7482108B2Polymer compound, acid generator, positive resist composition, and method for formation of resist patternsTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jan 27, 2009·92 cites·18 claims
- 1296US6153733A(Disulfonyl diazomethane compounds)TOKYO OHKA KOGYO CO LTD·Filed 1999·Granted Nov 28, 2000·254 cites·6 claims
- 1396US5795702APhotoresist stripping liquid compositions and a method of stripping photoresists using the sameTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Aug 18, 1998·165 cites·18 claims
- 1496US4385086AMethod for preventing leaching of contaminants from solid surfacesTOKYO OHKA KOGYO CO LTD·Filed 1979·Granted May 24, 1983·75 cites·8 claims
- 1595US11275307B2Resist composition, method of forming resist pattern, polymeric compound, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Mar 15, 2022·9 cites·8 claims
- 1695US10908502B2Resist composition, method of forming resist pattern, polymeric compound, and compoundTOKYO OHKA KOGYO CO LTD·Filed 2018·Granted Feb 2, 2021·8 cites·13 claims
- 1795US9017924B2Resist composition, method of forming resist pattern, polymeric compound and compoundTOKYO OHKA KOGYO CO LTD·Filed 2014·Granted Apr 28, 2015·24 cites·19 claims
- 1895US7879529B2Material for formation of resist protection film and method of forming resist pattern therewithTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Feb 1, 2011·37 cites·20 claims
- 1995USD552565SSupporting plateTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Oct 9, 2007·69 cites·1 claims
- 2095US6388101B1Chemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted May 14, 2002·42 cites·4 claims
- 2195US5945517AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted Aug 31, 1999·305 cites·9 claims
- 2295US5792274ARemover solution composition for resist and method for removing resist using the sameTOKYO OHKA KOGYO CO LTD·Filed 1996·Granted Aug 11, 1998·121 cites·7 claims
- 2394US10649330B2Resist composition, method of forming resist pattern, compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted May 12, 2020·6 cites·7 claims
- 2494US7846637B2Material for forming resist protective film for use in liquid immersion lithography process and method for forming resist pattern using the protective filmTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Dec 7, 2010·40 cites·10 claims
- 2594US7709179B2Negative resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted May 4, 2010·22 cites·11 claims
- 2694US7504196B2Positive resist composition, method for resist pattern formation and compoundTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Mar 17, 2009·21 cites·5 claims
- 2794US7264918B2Resist composition for liquid immersion exposure process and method of forming resist pattern therewithTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Sep 4, 2007·69 cites·24 claims
- 2894US6063953AChemical-sensitization photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 1999·Granted May 16, 2000·90 cites·6 claims
- 2994US6010824APhotosensitive resin composition containing a triazine compound and a pre-sensitized plate using the same, and photosensitive resin composition containing acridine and triazine compounds and a color filter and a pre-sensitized plate using the sameTOKYO OHKA KOGYO CO LTD·Filed 1997·Granted Jan 4, 2000·109 cites·24 claims
- 3094US4318767AApparatus for the treatment of semiconductor wafers by plasma reactionTOKYO OHKA KOGYO CO LTD·Filed 1980·Granted Mar 9, 1982·112 cites·7 claims
- 3194US4045231APhotosensitive resin composition for flexographic printing platesTOKYO OHKA KOGYO CO LTD·Filed 1976·Granted Aug 30, 1977·102 cites·10 claims
- 3293US11372329B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Jun 28, 2022·4 cites·18 claims
- 3393US11221557B2Resist composition, method of forming resist pattern, compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Jan 11, 2022·8 cites·37 claims
- 3493US10394122B2Resist composition, method for forming resist pattern, compound, and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2017·Granted Aug 27, 2019·6 cites·11 claims
- 3593US9766541B2Positive-type resist composition, method for forming resist pattern, photo-reactive quencher, and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Sep 19, 2017·10 cites·16 claims
- 3693US8795948B2Resist composition, method of forming resist pattern and polymeric compoundTOKYO OHKA KOGYO CO LTD·Filed 2013·Granted Aug 5, 2014·12 cites·3 claims
- 3793US6444397B2Negative-working photoresist compositionTOKYO OHKA KOGYO CO LTD·Filed 2001·Granted Sep 3, 2002·39 cites·15 claims
- 3893US5022979AElectrode for use in the treatment of an object in a plasmaTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted Jun 11, 1991·58 cites·7 claims
- 3993US5006220AElectrode for use in the treatment of an object in a plasmaTOKYO OHKA KOGYO CO LTD·Filed 1990·Granted Apr 9, 1991·89 cites·2 claims
- 4093US4833067ADeveloping solution for positive-working photoresist comprising tmah and non-ionic surfactantTOKYO OHKA KOGYO CO LTD·Filed 1988·Granted May 23, 1989·75 cites·1 claims
- 4193US4740451APhotosensitive compositions and a method of patterning using the sameTOKYO OHKA KOGYO CO LTD·Filed 1987·Granted Apr 26, 1988·73 cites·7 claims
- 4292US11256169B2Resist composition, and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2019·Granted Feb 22, 2022·7 cites·31 claims
- 4392US10101658B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2016·Granted Oct 16, 2018·6 cites·20 claims
- 4492US7960091B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Jun 14, 2011·15 cites·13 claims
- 4592US7776510B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Aug 17, 2010·14 cites·12 claims
- 4692USD544452SSupporting plateTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jun 12, 2007·50 cites·1 claims
- 4792US6811817B2Method for reducing pattern dimension in photoresist layerTOKYO OHKA KOGYO CO LTD·Filed 2002·Granted Nov 2, 2004·47 cites·4 claims
- 4892US6638899B1Photoresist stripping solution and a method of stripping photoresists with the sameTOKYO OHKA KOGYO CO LTD·Filed 2000·Granted Oct 28, 2003·62 cites·16 claims
- 4992US5905063ARemover solution composition for resist and method for removing resist using the sameTOKYO OHKA KOGYO CO LTD·Filed 1998·Granted May 18, 1999·81 cites·7 claims
- 5092US5584647AObject handling devicesTOKYO OHKA KOGYO CO LTD·Filed 1993·Granted Dec 17, 1996·146 cites·4 claims
Showing the top 50 of 1,437 patent records by PatentIndex Score.
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