Assignee
WANG ZIYUN
US·7 granted patents·1 pending application·40 citations·filing 2007–2012
Top patents by PatentIndex Score
8 records- 0195US8802882B2Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride filmsWANG ZIYUN·Filed 2010·Granted Aug 12, 2014·15 cites·20 claims
- 0295US8242032B2Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the sameWANG ZIYUN·Filed 2011·Granted Aug 14, 2012·7 cites·8 claims
- 0394US8236097B2Composition and method for low temperature deposition of silicon-containing filmsWANG ZIYUN·Filed 2011·Granted Aug 7, 2012·13 cites·5 claims
- 0481US8541318B2Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the sameWANG ZIYUN·Filed 2012·Granted Sep 24, 2013·1 cites·20 claims
- 0581US8153833B2Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideWANG ZIYUN·Filed 2011·Granted Apr 10, 2012·3 cites·20 claims
- 0671US8101788B2Silicon precursors and method for low temperature CVD of silicon-containing filmsWANG ZIYUN·Filed 2007·Granted Jan 24, 2012·1 cites·2 claims
- 0755US8227358B2Silicon precursors and method for low temperature CVD of silicon-containing filmsWANG ZIYUN·Filed 2011·Granted Jul 24, 2012·0 cites·10 claims
- 0855US2012178267A1Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitrideWANG ZIYUN·Filed 2012·Application pending·0 cites
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