Assignee
YOSHIKAWA WATARU
JP·2 granted patents·1 pending application·10 citations·filing 2010–2011
Top patents by PatentIndex Score
3 records- 0182US8988012B2Dielectric window for plasma processing apparatus, plasma processing apparatus and method for mounting dielectric window for plasma processing apparatusYOSHIKAWA WATARU·Filed 2011·Granted Mar 24, 2015·6 cites·15 claims
- 0239USD672377SDielectric window for plasma processing deviceYOSHIKAWA WATARU·Filed 2010·Granted Dec 11, 2012·4 cites·1 claims
- 0333US2012211165A1Sample table and microwave plasma processing apparatusYOSHIKAWA WATARU·Filed 2010·Application pending·0 cites
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