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Dielectric window for plasma processing device

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Assignee: YOSHIKAWA WATARUPriority: Mar 31, 2010Filed: Sep 10, 2010Granted: Dec 11, 2012
Est. expiryMar 31, 2030(~3.7 yrs left)· nominal 20-yr term from priority
Inventors:Wataru YoshikawaNaoki MatsumotoJun Yoshikawa
39
PatentIndex Score
4
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1
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Claims

exact text as granted — not AI-modified
The ornamental design for a dielectric window for plasma processing device, as shown and described.

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