Assignee
ZEISS CARL SEMICONDUCTOR MFG
DE·23 granted patents·5 pending applications·490 citations·filing 2001–2006
Top patents by PatentIndex Score
28 records- 0196US6774984B2Optical imaging system with polarizer and a crystalline-quartz plate for use therewithZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Aug 10, 2004·67 cites·12 claims
- 0293US6646718B2Projection objective having adjacently mounted aspheric lens surfacesZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Nov 11, 2003·49 cites·11 claims
- 0391US6728043B2Microlithographic illumination method and a projection lens for carrying out the methodZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Apr 27, 2004·44 cites·53 claims
- 0488US6788471B2Projection exposure apparatus for microlithographyZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Sep 7, 2004·34 cites·14 claims
- 0588US6784977B2Projection exposure system as well as a process for compensating image defects occuring in the projection optics of a projection exposure system, in particular for microlithographyZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Aug 31, 2004·43 cites·12 claims
- 0688US6728036B2Diffractive optical element and also optical arrangement comprising a diffractive optical elementZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Apr 27, 2004·35 cites·10 claims
- 0787US6733369B1Method and apparatus for polishing or lapping an aspherical surface of a work pieceZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted May 11, 2004·39 cites·12 claims
- 0887US6717746B2Catadioptric reduction lensZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Apr 6, 2004·30 cites·24 claims
- 0985US6788387B2Lithographic objective having a first lens group including only lenses having a positive refractive powerZEISS CARL SEMICONDUCTOR MFG·Filed 2001·Granted Sep 7, 2004·23 cites·14 claims
- 1084US6864988B2Optical system with isolated measuring structureZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Mar 8, 2005·24 cites·23 claims
- 1179US7006595B2Illumination system particularly for microlithographyZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Feb 28, 2006·15 cites·22 claims
- 1275US6594093B2Adjusting apparatus for an optical element in a lens systemZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Jul 15, 2003·23 cites·24 claims
- 1371US6862137B2Method for adjusting a lamp relative to an illuminating beam path of a microscope and a microscope suitable for carrying out the methodZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Mar 1, 2005·14 cites·9 claims
- 1471US6611574B2Illumination system with reduced heat loadZEISS CARL SEMICONDUCTOR MFG·Filed 2001·Granted Aug 26, 2003·10 cites·18 claims
- 1570US6733165B2Optical integrator for an illumination deviceZEISS CARL SEMICONDUCTOR MFG·Filed 2001·Granted May 11, 2004·13 cites·42 claims
- 1665US6734970B2Method and a device for determining the radiation-damage resistance of an optical materialZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted May 11, 2004·6 cites·11 claims
- 1763US6809871B2Geometric beamsplitter and method for its fabricationZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Oct 26, 2004·10 cites·28 claims
- 1860US6707537B2Projection exposure systemZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Mar 16, 2004·6 cites·23 claims
- 1954US6937394B2Device and method for changing the stress-induced birefringence and/or the thickness of an optical componentZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Aug 30, 2005·4 cites·11 claims
- 2049US7289279B2Lithographic objective having a first lens group including only lenses having a positive refractive powerZEISS CARL SEMICONDUCTOR MFG·Filed 2006·Granted Oct 30, 2007·0 cites·9 claims
- 2147US7154678B2Projection objective having adjacently mounted aspheric lens surfacesZEISS CARL SEMICONDUCTOR MFG·Filed 2005·Granted Dec 26, 2006·0 cites·19 claims
- 2247US6744574B2Mount for an optical element in an optical imaging deviceZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Granted Jun 1, 2004·1 cites·14 claims
- 2345US7023627B2Lithographic objective having a first lens group including only lenses having a positive refractive powerZEISS CARL SEMICONDUCTOR MFG·Filed 2004·Granted Apr 4, 2006·0 cites·22 claims
- 2441US2002114880A1Coating of optical elements, in particular for use with ultraviolet lightZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Application pending·0 cites
- 2540US2005117210A1Method for adjusting a lamp relative to an illuminating beam path of a microscope and a microscope suitable for carrying out the methodZEISS CARL SEMICONDUCTOR MFG·Filed 2005·Application pending·0 cites
- 2640US2002191310A1Attenuating filter for ultraviolet lightZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Application pending·0 cites
- 2736US2003067611A1Point-diffraction interferometerZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Application pending·0 cites
- 2830US2006109559A1Catadioptric multi-mirror systems for projection lithographyZEISS CARL SEMICONDUCTOR MFG·Filed 2002·Application pending·0 cites
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