Inventor

SUBRAMANI ANANTHA K

US53 patents

⚠️ This page may combine multiple inventors who share the name “SUBRAMANI ANANTHA K”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SUBRAMANI ANANTHA K

APPLIED MATERIALS INC

Selectable dual position magnetron

Rotatable heated electrostatic chuck

Wafer processing deposition shielding components

Symmetric plasma source to generate pie shaped treatment

Magnetron having continuously variable radial position

Electroformed sputtering target

Partially filling copper seed layer

Diffusion enhanced ion plating for copper fill

Showerhead with interlaced gas feed and removal and methods of use

Plasma source for rotating susceptor

Shaped electrodes for improved plasma exposure from vertical plasma source

Sputtering showerhead

Biasable rotatable electrostatic chuck

In-situ temperature measurement in a noisy environment

In-situ temperature measurement in a noisy environment

Off-angled heating of the underside of a substrate using a lamp assembly

Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability

Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool

Lateral plasma/radical source

Seamless electrical conduit

Method of depositing metals using high frequency plasma

Symmetric plasma source to generate pie-shaped treatment

UHV in-situ cryo-cool chamber

Deposition system with multi-cathode and method of manufacture thereof

Plasma source for rotating susceptor

Shaped electrodes for improved plasma exposure from vertical plasma source

Deposition system with multi-cathode and method of manufacture thereof

Process kit for multi-cathode processing chamber

Methods and apparatus for multi-cathode substrate processing

Extension of PVD chamber with multiple reaction gases, high bias power, and high power impulse source for deposition, implantation, and treatment

Methods and apparatus for processing a substrate

Fabricating a recursive flow gas distribution stack using multiple layers

Internally divisible process chamber using a shutter disk assembly

Internally divisible process chamber using a shutter disk assembly

Methods and apparatus for co-sputtering multiple targets

Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling

Showerhead assembly with heated showerhead

Multiple sequential linear powder dispensers for additive manufacturing

Single oxide metal deposition chamber

Dual-feed tunable plasma source

Isolation valve

Sputter source for semiconductor process chambers

RF return path for reduction of parasitic plasma

Methods and apparatus for producing low angle depositions

Methods and apparatus for co-sputtering multiple targets

GOEL ASHISH

Deposition chamber cover ring

Deposition chamber liner

MILLER KEITH A

Mechanism for continuously varying radial position of a magnetron

EWERT MAURICE E

Off-angled heating of the underside of a substrate using a lamp assembly

SUBRAMANI ANANTHA K

Reflective deposition rings and substrate processing chambers incorporating same