Inventor
IMORI TORU
JP43 patents
⚠️ This page may combine multiple inventors who share the name “IMORI TORU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIPPON MINING CO
11 patentsUS7217310B2May 15, 2007
Metal powder for powder metallurgy and iron-based sintered compact
NIPPON MINING CO24 citations91
US7347969B2Mar 25, 2008
Iron-based sintered compact and method for production thereof
NIPPON MINING CO13 citations84
US7713340B2May 11, 2010
Pretreating agent for electroless plating, method of electroless plating using the same and product of electroless plating
NIPPON MINING CO11 citations83
US5284977AFeb 8, 1994
Process for producing high-purity organic phosphine
NIPPON MINING CO6 citations68
US7727639B2Jun 1, 2010
Iron-based sintered compact and method for production thereof
NIPPON MINING CO3 citations63
US8043705B2Oct 25, 2011
Resin substrate material, electronic component substrate material manufactured by electroless plating on the same, and method for manufacturing electronic component substrate material
NIPPON MINING CO2 citations61
US7968150B2Jun 28, 2011
Method of surface treatment using imidazole compound
NIPPON MINING CO2 citations61
US7867564B2Jan 11, 2011
Metal plating method and pretreatment agent
NIPPON MINING CO4 citations61
US7691172B2Apr 6, 2010
Metallic powder for powder metallurgy whose main component is iron and iron-based sintered body
NIPPON MINING CO3 citations61
US7666245B2Feb 23, 2010
Metallic powder for powder metallurgy whose main component is iron and iron-based sintered body
NIPPON MINING CO3 citations61
US8004082B2Aug 23, 2011
Electronic component formed with barrier-seed layer on base material
NIPPON MINING CO0 citations51
JX NIPPON MINING & METALS CORP
7 patentsUS10400342B2Sep 3, 2019
High purity tin and method for manufacturing same
JX NIPPON MINING & METALS CORP2 citations73
US12129529B2Oct 29, 2024
Oxidation-resistant metallic tin
JX NIPPON MINING & METALS CORP0 citations62
US11572632B2Feb 7, 2023
Method for manufacturing high purity tin, electrowinning apparatus for high purity tin and high purity tin
JX NIPPON MINING & METALS CORP0 citations62
US11136680B2Oct 5, 2021
High purity tin and method for manufacturing same
JX NIPPON MINING & METALS CORP0 citations62
US11118276B2Sep 14, 2021
High purity tin and method for producing same
JX NIPPON MINING & METALS CORP0 citations61
US9823362B2Nov 21, 2017
Radiation detector UBM electrode structure body, radiation detector, and method of manufacturing same
JX NIPPON MINING & METALS CORP0 citations50
US10781024B2Sep 22, 2020
Method for vacuum packing high-purity tin and vacuum-packed high purity tin
JX NIPPON MINING & METALS CORP0 citations48
ITO JUNICHI
4 patentsUS8736057B2May 27, 2014
Substrate and manufacturing method therefor
ITO JUNICHI0 citations51
US8395264B2Mar 12, 2013
Substrate comprising alloy film of metal element having barrier function and metal element having catalytic power
ITO JUNICHI0 citations51
US8283051B2Oct 9, 2012
Plated product having copper thin film formed thereon by electroless plating
ITO JUNICHI1 citations51
US8247301B2Aug 21, 2012
Substrate and manufacturing method therefor
ITO JUNICHI0 citations51
NIKKO MATERIALS CO LTD
3 patentsUS6780467B2Aug 24, 2004
Plating pretreatment agent and metal plating method using the same
NIKKO MATERIALS CO LTD24 citations92
US7179741B2Feb 20, 2007
Electroless plating method and semiconductor wafer on which metal plating layer is formed
NIKKO MATERIALS CO LTD9 citations72
US6809138B2Oct 26, 2004
Adhesion accelerator for bonding rubber to metal and rubber composition
NIKKO MATERIALS CO LTD1 citations51
IMORI TORU
3 patentsUS8182873B2May 22, 2012
Method for electroless plating and metal-plated article
IMORI TORU2 citations56
US8318313B2Nov 27, 2012
Method for supporting metal nanoparticles and metal nanoparticles-carrying substrate
IMORI TORU0 citations49
US8814997B2Aug 26, 2014
Electroless plating pretreatment agent, electroless plating method using same, and electroless plated object
IMORI TORU0 citations46
SEKIGUCHI JUNNOSUKE
3 patentsUS8089154B2Jan 3, 2012
Electronic component formed with barrier-seed layer on base material
SEKIGUCHI JUNNOSUKE1 citations49
US8390123B2Mar 5, 2013
ULSI micro-interconnect member having ruthenium electroplating layer on barrier layer
SEKIGUCHI JUNNOSUKE0 citations47
US8333834B2Dec 18, 2012
High-purity aqueous copper sulfonate solution and method of producing same
SEKIGUCHI JUNNOSUKE0 citations46
YABE ATSUSHI
3 patentsUS8404035B2Mar 26, 2013
Electroless copper plating solution
YABE ATSUSHI0 citations46
US8394508B2Mar 12, 2013
Plated article having metal thin film formed by electroless plating
YABE ATSUSHI0 citations39
US8163400B2Apr 24, 2012
Plated article having metal thin film formed by electroless plating, and manufacturing method thereof
YABE ATSUSHI0 citations39